C08F38/00

Perflouoro-t-butoxy allyl and propargyl ethers

Perfluoro-t-butoxyallyl ether and perfluoro-t-butoxypropargyl ether and methods for their synthesis are disclosed. Also disclosed are methods for making polymers from the perfluoro-t-butoxyallyl ether and perfluoro-t-butoxypropargyl ether.

USE OF PARTICULAR POLYMERS AS CHARGE STORAGE MEANS

The present invention relates to polymers and to the use thereof in the form of active electrode material or in an electrode slurry as electrical charge storage means, the electrical charge storage means especially being secondary batteries. The secondary batteries are especially notable for high cell voltages, even when undergoing several charging and discharging cycles, and simple and scalable processing and production methods (for example by means of screen printing).

Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound

The composition contains: a compound which has a group represented by formula (1); and a solvent. In the formula (1), R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; R.sup.3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; and * denotes a bonding site to a part other than the group represented by the following formula (1) in the compound. ##STR00001##

Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound

A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R.sup.1, R.sup.2 and R.sup.3 each independently represent a group represented by the formula (a). In the formula (a), R.sup.A represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. R.sup.B represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring. ##STR00001##

Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound

A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R.sup.1, R.sup.2 and R.sup.3 each independently represent a group represented by the formula (a). In the formula (a), R.sup.A represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. R.sup.B represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring. ##STR00001##

RESIN COMPOSITION SUITABLE FOR PRINTING AND PRINTING METHOD UTILIZING THE SAME

The present invention relates to a resin composition, in particular suitable for printing, a kit comprising the components of the resin composition, a printing method utilizing the resin composition, a polymer obtained by the printing method, an article comprising or formed from the polymer, and uses thereof. The resin composition may be in particular suitable for printing and comprises at least one compound C1 having (i) at least one terminal alkyne functional group, and (ii) at least one functional group selected from the group consisting of a carbonate, a carbamate, and an ether; and at least one compound C2 having at least two thiol functional groups.

Optically active poly(diphenylacetylene) compound, preparation method therefor, and use thereof as optical isomer separating agent

The present invention provides an optically active poly(diphenylacetylene) compound represented by the following formula (I): ##STR00001##
[wherein each symbol is as described in the DESCRIPTION], and a production method thereof, an optical isomer separating agent containing the poly(diphenylacetylene) compound, and a packing material for a chiral column, containing the optical isomer separating agent coated on a carrier. According to the present invention, a practical optical isomer separation agent having a high optical resolution ability for a wide variety of racemic compounds and an optical isomer separation method can be provided.

Optically active poly(diphenylacetylene) compound, preparation method therefor, and use thereof as optical isomer separating agent

The present invention provides an optically active poly(diphenylacetylene) compound represented by the following formula (I): ##STR00001##
[wherein each symbol is as described in the DESCRIPTION], and a production method thereof, an optical isomer separating agent containing the poly(diphenylacetylene) compound, and a packing material for a chiral column, containing the optical isomer separating agent coated on a carrier. According to the present invention, a practical optical isomer separation agent having a high optical resolution ability for a wide variety of racemic compounds and an optical isomer separation method can be provided.

Material for forming organic film, patterning process, and polymer

A material for forming an organic film contains (A) a polymer having a repeating unit shown by the following general formula (1), and (B) an organic solvent. In the general formula (1), AR1, AR2, AR3, and AR4 each represent a benzene ring or a naphthalene ring; W1 represents a tetravalent organic group having 6 to 70 carbon atoms and at least one or more aromatic rings; and W2 represents a divalent organic group having 1 to 50 carbon atoms. An object of the present invention is to provide: a material for forming an organic film to enable high etching resistance and excellent twisting resistance without impairing the resin-derived carbon content; a patterning process using this material; and a polymer suitable for such a material for forming an organic film. ##STR00001##

Material for forming organic film, patterning process, and polymer

A material for forming an organic film contains (A) a polymer having a repeating unit shown by the following general formula (1), and (B) an organic solvent. In the general formula (1), AR1, AR2, AR3, and AR4 each represent a benzene ring or a naphthalene ring; W1 represents a tetravalent organic group having 6 to 70 carbon atoms and at least one or more aromatic rings; and W2 represents a divalent organic group having 1 to 50 carbon atoms. An object of the present invention is to provide: a material for forming an organic film to enable high etching resistance and excellent twisting resistance without impairing the resin-derived carbon content; a patterning process using this material; and a polymer suitable for such a material for forming an organic film. ##STR00001##