The present invention provides a composition capable of forming a film having high etching resistance, as well as a method for forming a resist pattern and a method for forming an insulating film, using the composition.

A composition comprising a base material (A) and a polyphenol compound (B), wherein the mass ratio between the base material (A) and the polyphenol compound (B) is 5:95 to 95:5.

A method for forming an insulating film, comprising the step of: developing the photoresist layer after the radiation irradiation.

Provided is a photosensitive composition including a pigment, a compound which is represented by Formula (1) (A.sup.1-L.sup.1-Z.sup.1) and has 3000 L.Math.mol.sup.1.Math.cm.sup.1 or less of a maximum value of a molar light absorption coefficient in a wavelength range of 400 to 700 nm, a polymerizable compound, and an oxime-based photopolymerization initiator. In Formula (1), A.sup.1 represents a group including an aromatic ring, L.sup.1 represents a single bond or a divalent linking group, and Z.sup.1 represents a group represented by Formula (Z1).

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Provided is a photosensitive composition including a pigment, a compound which is represented by Formula (1) (A.sup.1-L.sup.1-Z.sup.1) and has 3000 L.Math.mol.sup.1.Math.cm.sup.1 or less of a maximum value of a molar light absorption coefficient in a wavelength range of 400 to 700 nm, a polymerizable compound, and an oxime-based photopolymerization initiator. In Formula (1), A.sup.1 represents a group including an aromatic ring, L.sup.1 represents a single bond or a divalent linking group, and Z.sup.1 represents a group represented by Formula (Z1).

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A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.

A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.

A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

A curable composition can comprise a polymerizable material and an initiator. The polymerizable material can comprise a first monomer and a second monomer, wherein the second monomer is soluble in the first monomer, and the second monomer includes a ring structure selected from a maleimide ring, a pyrone ring, or a 2-furanone rings. The curable composition can have a viscosity of not greater than 10 mPa.Math.s, a fast curing kinetic, low shrinkage during curing, and is suitable for use in inkjet adaptive planarization.

A curable composition can comprise a polymerizable material and an initiator. The polymerizable material can comprise a first monomer and a second monomer, wherein the second monomer is soluble in the first monomer, and the second monomer includes a ring structure selected from a maleimide ring, a pyrone ring, or a 2-furanone rings. The curable composition can have a viscosity of not greater than 10 mPa.Math.s, a fast curing kinetic, low shrinkage during curing, and is suitable for use in inkjet adaptive planarization.

A resin composition for a display device includes: a (meth)acrylic monomer having at least one (meth)acryloyl group; a urethane acrylate oligomer having a weight average molecular weight of about 27,000 to about 50,000; and at least one photoinitiator.