C08F224/00

Silicone-modified polybenzoxazole resin and making method

A silicone-modified polybenzoxazole resin comprising repeating units of formulae (1a) and (1b) is prepared by addition polymerization. R.sup.1 to R.sup.4 are a C.sub.1-C.sub.8 monovalent hydrocarbon group, m and n are integers of 0-300, R.sup.5 is C.sub.1-C.sub.8 alkylene or phenylene, a and b are positive numbers of less than 1, a+b=1, and X.sup.1 is a divalent linker of formula (2). The resin is flexible, soluble in organic solvents, and easy to use. ##STR00001##

Silicone-modified polybenzoxazole resin and making method

A silicone-modified polybenzoxazole resin comprising repeating units of formulae (1a) and (1b) is prepared by addition polymerization. R.sup.1 to R.sup.4 are a C.sub.1-C.sub.8 monovalent hydrocarbon group, m and n are integers of 0-300, R.sup.5 is C.sub.1-C.sub.8 alkylene or phenylene, a and b are positive numbers of less than 1, a+b=1, and X.sup.1 is a divalent linker of formula (2). The resin is flexible, soluble in organic solvents, and easy to use. ##STR00001##

(Meth)acrylate composition

Provided is a (meth)acrylate composition containing: (A) at least one (meth)acrylate compound selected from the group consisting of a (meth)acrylate-modified silicone oil, a (meth)acrylate having a long-chain aliphatic hydrocarbon group, and a polyalkylene glycol (meth)acrylate having number-average molecular weight of not less than 400; (B) a (meth)acrylate compound to which an alicyclic hydrocarbon group having 6 or more carbon atoms is ester-linked; (C) (meth)acrylic acid or a (meth)acrylate compound having a polar group; (D) a radical polymerization initiator; and (E) a white pigment.

(Meth)acrylate composition

Provided is a (meth)acrylate composition containing: (A) at least one (meth)acrylate compound selected from the group consisting of a (meth)acrylate-modified silicone oil, a (meth)acrylate having a long-chain aliphatic hydrocarbon group, and a polyalkylene glycol (meth)acrylate having number-average molecular weight of not less than 400; (B) a (meth)acrylate compound to which an alicyclic hydrocarbon group having 6 or more carbon atoms is ester-linked; (C) (meth)acrylic acid or a (meth)acrylate compound having a polar group; (D) a radical polymerization initiator; and (E) a white pigment.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Tagging agents, anti-scalant polymer compositions, and methods

Tagging agents, including fluorescent monomers, which may be polymerized. Anti-scalant polymer compositions that include a copolymer of a tagging agent and an anti-scalant monomer. Methods for synthesizing tagging agents, anti-scalant polymer compositions, and detecting an anti-scalant polymer composition.