Porous polymeric resins, reaction mixtures and methods that can be used to prepare the porous polymeric resins, and uses of the porous polymeric resin are described. More specifically, the polymeric resins typically have a hierarchical porous structure plus reactive groups that can be used to interact with or react with a variety of different target compounds. The reactive groups can be selected from an acidic group or a salt thereof, an amino group or salt thereof, a hydroxyl group, an azlactone group, a glycidyl group, or a combination thereof.

Porous polymeric resins, reaction mixtures and methods that can be used to prepare the porous polymeric resins, and uses of the porous polymeric resin are described. More specifically, the polymeric resins typically have a hierarchical porous structure plus reactive groups that can be used to interact with or react with a variety of different target compounds. The reactive groups can be selected from an acidic group or a salt thereof, an amino group or salt thereof, a hydroxyl group, an azlactone group, a glycidyl group, or a combination thereof.

An object of the present disclosure is to provide a method for producing a fluorine-containing polymer and a composition containing the fluorine-containing polymer.

The present disclosure provides a composition comprising (A) a fluorine-containing polymer comprising as a main component a structural unit containing a fluorine-containing aliphatic ring, and (B) an aprotic solvent, wherein the fluorine-containing aliphatic ring of the fluorine-containing polymer (A) contains one, two, or three etheric oxygen atoms as a ring-constituting atom; when the fluorine-containing aliphatic ring contains a plurality of etheric oxygen atoms, the etheric oxygen atoms are not adjacent to each other; and the fluorine-containing polymer (A) is present in an amount of 20 mass % or more based on the mass of the composition.

The invention relates to an electrical device (1, 20, 30) comprising a semi-conductive cross-linked layer (3, 4, 5, 21, 22, 23, 31, 32) produced from a polymer composition comprising: at least one polymer A comprising at least one epoxy function, and a cross-linking agent B comprising at least one reactive function that can react with the epoxy function of said polymer A in order to allow the cross-linking of said polymer A, characterised in that the polymer composition also comprises an electrically conductive filler having a specific surface area BET of at least 100 m2/g according to the ASTM standard D 6556.

The invention relates to an electrical device (1, 20, 30) comprising a semi-conductive cross-linked layer (3, 4, 5, 21, 22, 23, 31, 32) produced from a polymer composition comprising: at least one polymer A comprising at least one epoxy function, and a cross-linking agent B comprising at least one reactive function that can react with the epoxy function of said polymer A in order to allow the cross-linking of said polymer A, characterised in that the polymer composition also comprises an electrically conductive filler having a specific surface area BET of at least 100 m2/g according to the ASTM standard D 6556.

A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.

A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.

Provided are an ink jet ink composition containing a monomer A represented by formula (A), a monomer B that is a radical-polymerizable monomer including an alicyclic structure and not including a heterocyclic structure, and a monomer C that is a radical-polymerizable monomer including a heterocyclic structure, the total content of the monomer A, the monomer B, and the monomer C being 60 mass % or more relative to the total amount of the composition, and applications thereof. R.sup.1 to R.sup.4 each independently represent a hydrogen atom or an organic group having 1 to 10 carbon atoms, and n represents an integer of 1 to 3. When n is 2 or 3, two or three R's may be the same or different, and two or three R.sup.4's may be the same or different.

##STR00001##

Provided are an ink jet ink composition containing a monomer A represented by formula (A), a monomer B that is a radical-polymerizable monomer including an alicyclic structure and not including a heterocyclic structure, and a monomer C that is a radical-polymerizable monomer including a heterocyclic structure, the total content of the monomer A, the monomer B, and the monomer C being 60 mass % or more relative to the total amount of the composition, and applications thereof. R.sup.1 to R.sup.4 each independently represent a hydrogen atom or an organic group having 1 to 10 carbon atoms, and n represents an integer of 1 to 3. When n is 2 or 3, two or three R's may be the same or different, and two or three R.sup.4's may be the same or different.

##STR00001##

A curable composition can comprise a polymerizable material and an initiator. The polymerizable material can comprise a first monomer and a second monomer, wherein the second monomer is soluble in the first monomer, and the second monomer includes a ring structure selected from a maleimide ring, a pyrone ring, or a 2-furanone rings. The curable composition can have a viscosity of not greater than 10 mPa.Math.s, a fast curing kinetic, low shrinkage during curing, and is suitable for use in inkjet adaptive planarization.