Embodiments of the invention relate to a resin composition, in particular suitable for printing, a kit comprising components of the resin composition, printing methods, a polymer obtained by the printing methods, an article comprising or formed from the polymer, uses thereof, and a composition. The resin composition comprises at least one compound C1 having at least one terminal alkyne functional group; at least one compound C2 having at least two thiol functional groups; at least one compound C3 having at least one carbon-carbon double bond; at least one photoinitiator; and at least one stabilizer.

Embodiments of the invention relate to a resin composition, in particular suitable for printing, a kit comprising components of the resin composition, printing methods, a polymer obtained by the printing methods, an article comprising or formed from the polymer, uses thereof, and a composition. The resin composition comprises at least one compound C1 having at least one terminal alkyne functional group; at least one compound C2 having at least two thiol functional groups; at least one compound C3 having at least one carbon-carbon double bond; at least one photoinitiator; and at least one stabilizer.

A hydrogel comprising water, a gel strength improving agent, and a polymer matrix containing the water and the gel strength improving agent, in which the polymer matrix includes a copolymer of a monofunctional monomer having one ethylenically unsaturated group and a polyfunctional monomer having 2 to 6 ethylenically unsaturated groups, the copolymer has a hydrophilic group binding to its main chain, and the hydrogel has a breaking strength of 5 kPa or more and a breaking elongation of 200% or more in a tensile test.

A hydrogel comprising water, a gel strength improving agent, and a polymer matrix containing the water and the gel strength improving agent, in which the polymer matrix includes a copolymer of a monofunctional monomer having one ethylenically unsaturated group and a polyfunctional monomer having 2 to 6 ethylenically unsaturated groups, the copolymer has a hydrophilic group binding to its main chain, and the hydrogel has a breaking strength of 5 kPa or more and a breaking elongation of 200% or more in a tensile test.

Described are polymerizable high energy light absorbing compounds of formula I: ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, and X are as described herein. The compounds absorb various wavelengths of ultraviolet and/or high energy visible light and are suitable for incorporation in various products, such as biomedical devices and ophthalmic devices.

Described are polymerizable high energy light absorbing compounds of formula I: ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, and X are as described herein. The compounds absorb various wavelengths of ultraviolet and/or high energy visible light and are suitable for incorporation in various products, such as biomedical devices and ophthalmic devices.

The present invention relates to an ampholytic polymeric system obtainable by a process comprising the copolymerization of (i) a monomer according to Formula (1), (ii) an ethylenically unsaturated cationic monomer and (iii) a (co)polymer comprising an ethylenically unsaturated anionic monomer which comprises a sulfonate group: (1) wherein X is O or NR.sup.2, R.sup.1 and R.sup.2 are independently selected from the group consisting of hydrogen and C1-C6 alkyl groups or wherein R.sup.1 and R.sup.2 form together a (CR.sup.1R.sup.2)n- chain, wherein n is 3 to 12, and wherein R.sup.3 is independently selected from the group consisting of hydrogen and CH.sub.3. The present invention further relates to the use of ampholytic polymeric system in separation processes. ##STR00001##

A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).

A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer. ##STR00001##

A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer. ##STR00001##