The present invention relates to a composition for use as a plasticizer composition in a formulation for a tire or a technical rubber good or for use as an extender oil for decreasing the mooney-viscosity and/or the glass transition temperature (T.sub.g) of a polymer composition and its corresponding use. The invention also relates to the use of one or more than one ester as well as a process of preparing a formulation for making a tire or a technical rubber good or making a tire or a technical rubber good or preparing a polymer composition having a decreased mooney-viscosity. Moreover, the invention also relates to a formulation for making a tire or a technical rubber good and a corresponding tire or to technical rubber good.

The present invention relates to a composition for use as a plasticizer composition in a formulation for a tire or a technical rubber good or for use as an extender oil for decreasing the mooney-viscosity and/or the glass transition temperature (T.sub.g) of a polymer composition and its corresponding use. The invention also relates to the use of one or more than one ester as well as a process of preparing a formulation for making a tire or a technical rubber good or making a tire or a technical rubber good or preparing a polymer composition having a decreased mooney-viscosity. Moreover, the invention also relates to a formulation for making a tire or a technical rubber good and a corresponding tire or to technical rubber good.

A resist composition includes a base material component and a fluorine additive component. The fluorine additive component contains a fluororesin component having a structural unit containing a base dissociable group. The base material component contains a structural unit containing an acid-decomposable group in an amount of 30 mol % or more and an amount of 10 mol % or more of a resin component having a structural unit represented by formula (a10-1):

##STR00001##

where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Ya.sup.x1 is a single bond or a divalent linking group, Wa.sup.x1 is a (n.sub.ax1+1) valent aromatic hydrocarbon group, and na.sub.x1 is an integer of 1 to 3.

A resist composition includes a base material component and a fluorine additive component. The fluorine additive component contains a fluororesin component having a structural unit containing a base dissociable group. The base material component contains a structural unit containing an acid-decomposable group in an amount of 30 mol % or more and an amount of 10 mol % or more of a resin component having a structural unit represented by formula (a10-1):

##STR00001##

where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Ya.sup.x1 is a single bond or a divalent linking group, Wa.sup.x1 is a (n.sub.ax1+1) valent aromatic hydrocarbon group, and na.sub.x1 is an integer of 1 to 3.

A radiation-sensitive or actinic ray-sensitive resin composition contains a polymer compound (A) including a structural part (a) that is decomposed by irradiation with actinic rays or radiation to generate an acid anion on a side chain and a repeating unit (b) that is represented by the following Formula (I), in the formula, R.sub.3 represents a hydrogen atom, an organic group, or a halogen atom, A.sub.1 represents an aromatic ring group or an alicyclic group. R.sub.1 and R.sub.2 each independently represent an alkyl group, a cycloalkyl group, or an aryl group, at least two of A.sub.1, R.sub.1, or R.sub.2 may be bonded to each other to form a ring. B.sub.1 and L.sub.1 each independently represent a single bond or a divalent linking group, X represents a hydrogen atom or an organic group, n represents an integer of 1 or greater.

##STR00001##

A radiation-sensitive or actinic ray-sensitive resin composition contains a polymer compound (A) including a structural part (a) that is decomposed by irradiation with actinic rays or radiation to generate an acid anion on a side chain and a repeating unit (b) that is represented by the following Formula (I), in the formula, R.sub.3 represents a hydrogen atom, an organic group, or a halogen atom, A.sub.1 represents an aromatic ring group or an alicyclic group. R.sub.1 and R.sub.2 each independently represent an alkyl group, a cycloalkyl group, or an aryl group, at least two of A.sub.1, R.sub.1, or R.sub.2 may be bonded to each other to form a ring. B.sub.1 and L.sub.1 each independently represent a single bond or a divalent linking group, X represents a hydrogen atom or an organic group, n represents an integer of 1 or greater.

##STR00001##