A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.

A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.

A water-based ink for ink-jet recording includes: a pigment; water; a first resin containing at least one of methacrylic acid and acylic acid as a monomer; and a second resin, wherein the second resin is an ABA-type triblock copolymer which has a polymer block A composed only of methyl methacrylate and methacrylic acid and a polymer block B composed only of benzyl methacrylate and methacrylic acid; which has a weight average molecular weight of 3,000 to 30,000; which has an acid value of 90 mgKOH/g to 200 mgKOH/g; and which is partially or completely neutralized.

A water-based ink for ink-jet recording includes: a self-dispersible pigment having an anionic group; water; a water-soluble resin; and an anionic surfactant, wherein the water-soluble resin is an ABA-type triblock copolymer which has a polymer block A composed only of methyl methacrylate and methacrylic acid and a polymer block B composed only of benzyl methacrylate and methacrylic acid; which has a weight average molecular weight of 3,000 to 30,000; which has an acid value of 90 mgKOH/g to 200 mgKOH/g; and which is partially or completely neutralized.

A water-based ink for ink-jet recording includes: a pigment; water; oligoethylene glycol monoalkyl ether; and a water-soluble resin. The water-soluble resin is an ABA-type triblock copolymer which has a polymer block A composed only of methyl methacrylate and methacrylic acid and a polymer block B composed only of benzyl methacrylate and methacrylic acid; which has a weight average molecular weight of 3,000 to 30,000; which has an acid value of 90 mgKOH/g to 200 mgKOH/g; and which is partially or completely neutralized.

This invention relates to a continuous process for making a polymer polyol, the polymer polyol produced according to the said process and its applications.

This invention relates to a continuous process for making a polymer polyol, the polymer polyol produced according to the said process and its applications.

A metal-clad laminate includes an insulating layer that contains a cured product of a resin composition containing a polymer having a structural unit represented by Formula (1) in a molecule and a metal foil that is laminated on the insulating layer and is a metal foil in which a nickel element amount on a surface on a side in contact with the insulating layer and a nickel element amount on the surface when the surface is sputtered for 1 minute at 3 nm/min in terms of SiO.sub.2 are each 4.5 at % or less with respect to the total element amount on each surface. ##STR00001## In Formula (1), Z represents an arylene group, R.sub.1-R.sub.3 each independently represent a hydrogen atom or an alkyl group, and R.sub.4-R.sub.6 each independently represent a hydrogen atom or an alkyl group having 1-6 carbon atoms.