Patent classifications
C08F293/00
SURFACE MODIFYING COMPOSITION, MODIFIED PRODUCT, AND METHOD OF PRODUCING MODIFIED PRODUCT
A surface modifying composition for modifying a surface of a formed product made of high-density polyethylene or ultra-high molecular weight polyethylene, the composition comprising: a copolymer having a unit of a first monomer having an aliphatic group having 10 or more carbon atoms and a unit of a second monomer having any of an amino group, an epoxy group, and an ether group, and a solvent having a boiling point of 100° C. or more and being at least one selected from the group consisting of a halogen-based solvent, an alkane solvent, a cycloalkane solvent, a dicycloalkane solvent, an aromatic solvent, and a nitro-based solvent.
CYCLIC POLYACETYLENE AND METHODS OF PREPARING THE SAME
Provided herein are trans-cyclic polyacetylenes and methods of preparing the trans-cyclic polyacetylenes.
CYCLIC POLYACETYLENE AND METHODS OF PREPARING THE SAME
Provided herein are trans-cyclic polyacetylenes and methods of preparing the trans-cyclic polyacetylenes.
Selective liquiphobic surface modification of substrates
Materials and methods for modifying semiconducting substrate surfaces in order to dramatically change surface energy are provided. Preferred materials include perfluorocarbon molecules or polymers with various functional groups. The functional groups (carboxylic acids, hydroxyls, epoxies, aldehydes, and/or thiols) attach materials to the substrate surface by physical adsorption or chemical bonding, while the perfluorocarbon components contribute to low surface energy. Utilization of the disclosed materials and methods allows rapid transformation of surface properties from hydrophilic to hydrophobic (water contact angle 120° and PGMEA contact angle) 70°. Selective liquiphobic modifications of copper over Si/SiOx, TiOx over Si/SiOx, and SiN over SiOx are also demonstrated.
Associative copolymers with hydrophobic quaternized (meth)acrylamide and (meth)acrylic acid derivatives
The present invention relates to a process for the preparation of a water-soluble copolymer comprising the step of reacting a monomer (a) of formula (I), (1) wherein Q.sup.1, Q.sup.2, R.sup.1 to R.sup.7 and X have the meaning as indicated in the description and claims with at least one monoethylenically unsaturated, anionic monomer (b), preferably representing a monoethylenically unsaturated monomer comprising at least one carboxy, phosphonate or sulfonate group and salts thereof, preferably their ammonium salts or alkaline-earth metal salts or alkali metal salts; and at least one monoethylenically unsaturated, non-ionic monomer (c). The present invention further relates to a copolymer obtainable by said process and its use in enhanced oil recovery (EOR), a formulation comprising said copolymer and a method of oil production uses said formulation.
Capped dual-headed organoaluminum compositions
The present disclosure relates to a capped dual-headed organoaluminum composition having the formula (I) and processes to prepare the same. In at least one aspect, the capped dual-headed organoaluminum compositions can be used in olefin polymerization.
Preparation method of patterned substrate
A method for preparing a patterned substrate includes selectively etching any one segment block of a self-assembled block copolymer from a laminate having a substrate; wherein a block copolymer membrane is formed on the substrate and the substrate contains the self-assembled block copolymer. According to the method, the self-assembled pattern of the block copolymer can be efficiently and accurately transferred on the substrate to prepare a patterened substate.
Polymer composition
Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.
(Meth)acrylic block copolymer and active energy ray curable composition containing the same
Provided are a (meth)acrylic block copolymer exhibiting good active energy ray curability, in particular, curability of a blend thereof with an acrylate monomer, and an active energy ray curable composition comprising the (meth)acrylic block copolymer. The (meth)acrylic block copolymer includes a methacrylic polymer block (A) having an active energy ray curable group including a partial structure represented by the general formula (1) below wherein R.sup.1 denotes a hydrocarbon group having 1 to 10 carbon atoms, and W denotes a saturated hydrocarbon group having 1 to 10 carbon atoms, and an acrylic polymer block (B) having no active energy ray curable groups. ##STR00001##
(Meth)acrylic block copolymer and active energy ray curable composition containing the same
Provided are a (meth)acrylic block copolymer exhibiting good active energy ray curability, in particular, curability of a blend thereof with an acrylate monomer, and an active energy ray curable composition comprising the (meth)acrylic block copolymer. The (meth)acrylic block copolymer includes a methacrylic polymer block (A) having an active energy ray curable group including a partial structure represented by the general formula (1) below wherein R.sup.1 denotes a hydrocarbon group having 1 to 10 carbon atoms, and W denotes a saturated hydrocarbon group having 1 to 10 carbon atoms, and an acrylic polymer block (B) having no active energy ray curable groups. ##STR00001##