Patent classifications
C08F297/00
Process for producing thermoplastic elastomer, and thermoplastic elastomer
A method for producing a thermoplastic elastomer includes forming a first block by copolymerizing a C4-C7 isoolefin monomer and alkylstyrene in the presence of a polymerization initiator; and forming a second block by polymerizing aromatic vinyl monomers. The thermoplastic elastomer comprises the first block and the second block. An amount of unreacted portion of the alkylstyrene during the formation of the first block is maintained at a molar ratio of not more than 1/90 relative to a total amount of the isoolefin monomer. The alkylstyrene is represented by the general formula (1), and the polymerization initiator is represented by the general formula (2).
Process for producing thermoplastic elastomer, and thermoplastic elastomer
A method for producing a thermoplastic elastomer includes forming a first block by copolymerizing a C4-C7 isoolefin monomer and alkylstyrene in the presence of a polymerization initiator; and forming a second block by polymerizing aromatic vinyl monomers. The thermoplastic elastomer comprises the first block and the second block. An amount of unreacted portion of the alkylstyrene during the formation of the first block is maintained at a molar ratio of not more than 1/90 relative to a total amount of the isoolefin monomer. The alkylstyrene is represented by the general formula (1), and the polymerization initiator is represented by the general formula (2).
BLOCK COPOLYMERS INCLUDING HIGH VINYL SEGMENTS
A method for the preparation of block copolymers including at least one high vinyl segment, the method comprising (i) charging into a reactor a diene monomer in a hydrocarbon solvent, a catalytically effective amount of anionic initiator, and an oligomeric oxolanyl propane, whereby the reactor is optionally cooled; (ii) allowing the diene monomer to polymerize at a peak polymerization temperature of at least about 18 C. and less than about 60 C. to form a first block where the vinyl content is at least about 50 percent by weight; (iii) after step (ii), charging into the reactor a vinyl aromatic monomer, whereby the reactor is optionally heated to a temperature up to about 60 C.; (iv) allowing the vinyl aromatic monomer to polymerize to form a second block; and (v) optionally charging into the reactor a quenching agent.
BLOCK COPOLYMERS INCLUDING HIGH VINYL SEGMENTS
A method for the preparation of block copolymers including at least one high vinyl segment, the method comprising (i) charging into a reactor a diene monomer in a hydrocarbon solvent, a catalytically effective amount of anionic initiator, and an oligomeric oxolanyl propane, whereby the reactor is optionally cooled; (ii) allowing the diene monomer to polymerize at a peak polymerization temperature of at least about 18 C. and less than about 60 C. to form a first block where the vinyl content is at least about 50 percent by weight; (iii) after step (ii), charging into the reactor a vinyl aromatic monomer, whereby the reactor is optionally heated to a temperature up to about 60 C.; (iv) allowing the vinyl aromatic monomer to polymerize to form a second block; and (v) optionally charging into the reactor a quenching agent.
Component for head mounted display
Provided is a component for head mounted display comprising a thermoplastic resin composition having a glass-transition temperature (Tg) of 120 C. or higher, having an absolute value of in-plane phase difference of 30 nm or less in terms of 3 mm thickness.
Component for head mounted display
Provided is a component for head mounted display comprising a thermoplastic resin composition having a glass-transition temperature (Tg) of 120 C. or higher, having an absolute value of in-plane phase difference of 30 nm or less in terms of 3 mm thickness.
Block copolymers including high vinyl segments
A method for the preparation of block copolymers including at least one high vinyl segment, the method comprising (i) charging into a reactor a diene monomer in a hydrocarbon solvent, a catalytically effective amount of anionic initiator, and an oligomeric oxolanyl propane, whereby the reactor is optionally cooled; (ii) allowing the diene monomer to polymerize at a peak polymerization temperature of at least about 18 C. and less than about 60 C. to form a first block where the vinyl content is at least about 50 percent by weight; (iii) after step (ii), charging into the reactor a vinyl aromatic monomer, whereby the reactor is optionally heated to a temperature up to about 60 C.; (iv) allowing the vinyl aromatic monomer to polymerize to form a second block; and (v) optionally charging into the reactor a quenching agent.
Block copolymers including high vinyl segments
A method for the preparation of block copolymers including at least one high vinyl segment, the method comprising (i) charging into a reactor a diene monomer in a hydrocarbon solvent, a catalytically effective amount of anionic initiator, and an oligomeric oxolanyl propane, whereby the reactor is optionally cooled; (ii) allowing the diene monomer to polymerize at a peak polymerization temperature of at least about 18 C. and less than about 60 C. to form a first block where the vinyl content is at least about 50 percent by weight; (iii) after step (ii), charging into the reactor a vinyl aromatic monomer, whereby the reactor is optionally heated to a temperature up to about 60 C.; (iv) allowing the vinyl aromatic monomer to polymerize to form a second block; and (v) optionally charging into the reactor a quenching agent.
Pattern forming method, self-organization material, and method of manufacturing semiconductor apparatus
According to one embodiment, a pattern forming method includes supplying, onto an under layer, a self-organization material including a block copolymer which includes a first polymer and a second polymer, and a third polymer having a molecular structure with oxygen attached to a cyclic structure, wherein the third polymer is bonded to the first polymer, and phase-separating the block copolymer to form a phase-separation pattern on the under layer.
Substrate treatment method, computer storage medium and substrate treatment system
A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polymer separating step, and at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of circular patterns of hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern is set so that the first hydrophilic polymers and the second hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in a plan view.