The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

The invention relates to a novel polyphosphorus-based chain-end thiol-functionalized polymer, the polymer chain of which comprises units bearing at least one pendant phosphonate function and/or at least one pendant phosphonic function along the chain. This novel polymer is quite particularly suited to participating in a thiol-ene coupling reaction, which affords the possibility of grafting the polyphosphorus-based polymers onto diene polymers, for example.

Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

To provide an adhesive excellent in adhesion to a thermoplastic resin and an ethylene/vinyl alcohol copolymer. An adhesive comprising a hydrolyzate of a resin composition containing a thermoplastic resin (A), a copolymer (B) of ethylene and a vinyl ester and/or an acrylic acid ester having a vinyl ester and/or acrylic acid ester content higher by at least 5 mol % than (A); and a modified product having (A) grafted by (B), and an adhesive resin composition comprising it.

A pH-responsive hybrid hydrogel, namely poly(Methacrylic acid-grafted-Ethylene Glycol) P(MAA-g-EG) cross-linked with Styrene-Butadiene-Styrene (SBS) polymer and photopolymerized by visible light. The resulting polymer turned out to have better integrities, high swelling ratios, pH-responsive and biocompatible character. Also the visible-light-induced synthesis of these pH-responsive composite wherein eosin Y is used as photoinitiator and triethanolamine is used as a co-initiator is also disclosed in the invention.

Provided are: a composition for forming an underlayer film for imprinting, which contains a high-molecular-weight compound having a polymerizable group, a chelating agent, and a solvent, and a method for producing the same; a kit including the composition for forming an underlayer film; a pattern producing method using the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.

Provided are: a composition for forming an underlayer film for imprinting, which contains a high-molecular-weight compound having a polymerizable group, a chelating agent, and a solvent, and a method for producing the same; a kit including the composition for forming an underlayer film; a pattern producing method using the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.

A latex of a styrene-based block copolymer includes a styrene-based block copolymer and water. The styrene-based block copolymer includes a toluene insoluble content of 30 to 95 wt %. The latex of the styrene-based block copolymer is superior in the processability and can provide a molded film such as a dip-molded product having the high tear strength, the high stress retention and the soft texture.