C08G4/00

LITHIUM SELECTIVE ORGANOGELS

The present disclosure relates to strapped calixpyrrole compounds, polymer monomers and polymers comprising strapped calixpyrrole substructures, and compositions thereof. Also provided herein are methods of use of said strapped calixpyrrole compounds, polymer monomers, and polymers, such as for the selective extraction of specific salts.

LITHIUM SELECTIVE ORGANOGELS

The present disclosure relates to strapped calixpyrrole compounds, polymer monomers and polymers comprising strapped calixpyrrole substructures, and compositions thereof. Also provided herein are methods of use of said strapped calixpyrrole compounds, polymer monomers, and polymers, such as for the selective extraction of specific salts.

RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING

A composition for forming resist underlayer film for nanoimprinting includes novolac resin that has a repeating unit structure represented by formula (1). In formula (1), group A represents organic group having an aromatic ring, a condensed aromatic ring, or a condensed aromatic heterocycle, group B represents organic group having an aromatic ring or a condensed aromatic ring, group E represents a single bond or a branched or straight-chain C1-10 alkylene group that may be substituted and may include an ether bond and/or a carbonyl group, group D represents organic group that has 1 to 15 carbon atoms and is represented by formula (2) (in which R.sup.1, R.sup.2, and R.sup.3 each independently represent a fluorine atom, or a straight-chain, branched-chain, or cyclic alkyl group, and any two of R.sup.1, R.sup.2, and R.sup.3 may be bonded to one another to form a ring), and n represents a number from 1 to 5.

RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING

A composition for forming resist underlayer film for nanoimprinting includes novolac resin that has a repeating unit structure represented by formula (1). In formula (1), group A represents organic group having an aromatic ring, a condensed aromatic ring, or a condensed aromatic heterocycle, group B represents organic group having an aromatic ring or a condensed aromatic ring, group E represents a single bond or a branched or straight-chain C1-10 alkylene group that may be substituted and may include an ether bond and/or a carbonyl group, group D represents organic group that has 1 to 15 carbon atoms and is represented by formula (2) (in which R.sup.1, R.sup.2, and R.sup.3 each independently represent a fluorine atom, or a straight-chain, branched-chain, or cyclic alkyl group, and any two of R.sup.1, R.sup.2, and R.sup.3 may be bonded to one another to form a ring), and n represents a number from 1 to 5.

ENCAPSULATION RESIN

An object of the present disclosure is to provide an encapsulation resin in which the occurrence of cracks is suppressed when the resin is used for encapsulation of ultraviolet light-emitting elements. Another object of the present disclosure is to provide an encapsulation resin composition for supplying the encapsulation resin. The present disclosure relates to an encapsulation resin for light-emitting elements, comprising a fluoropolymer, wherein the fluoropolymer comprises, as a main component, a monomer unit represented by formula (1):

##STR00001##

wherein R.sup.1 to R.sup.4 are each independently a fluorine atom, a fluoroalkyl group, or a fluoroalkoxy group.

ENCAPSULATION RESIN

An object of the present disclosure is to provide an encapsulation resin in which the occurrence of cracks is suppressed when the resin is used for encapsulation of ultraviolet light-emitting elements. Another object of the present disclosure is to provide an encapsulation resin composition for supplying the encapsulation resin. The present disclosure relates to an encapsulation resin for light-emitting elements, comprising a fluoropolymer, wherein the fluoropolymer comprises, as a main component, a monomer unit represented by formula (1):

##STR00001##

wherein R.sup.1 to R.sup.4 are each independently a fluorine atom, a fluoroalkyl group, or a fluoroalkoxy group.

Polyvinyl ester formulations, methods of making the same roofing materials and roofing systems including the same
11649350 · 2023-05-16 · ·

Some embodiments of the present disclosure relate to a method comprising obtaining a mixture comprising at least one vinyl polymer, at least one organic acid, and at least one hydronium ion donor. In some embodiments, the method comprises reacting an —OH group of the B polymer chain segment with the at least one organic acid in the presence of the at least one hydronium ion donor, so as to form at least one polyvinyl ester. Some embodiments of the present disclosure relate to a roofing material comprising at least one reinforcement material and at least one polyvinyl ester.

Polyvinyl ester formulations, methods of making the same roofing materials and roofing systems including the same
11649350 · 2023-05-16 · ·

Some embodiments of the present disclosure relate to a method comprising obtaining a mixture comprising at least one vinyl polymer, at least one organic acid, and at least one hydronium ion donor. In some embodiments, the method comprises reacting an —OH group of the B polymer chain segment with the at least one organic acid in the presence of the at least one hydronium ion donor, so as to form at least one polyvinyl ester. Some embodiments of the present disclosure relate to a roofing material comprising at least one reinforcement material and at least one polyvinyl ester.

PROCESSES FOR INCREASING DENSITY OF POLYMER FLAKES AND POWDERS
20170306075 · 2017-10-26 ·

The present disclosure is directed to improved poly(arylene ether ketone) powders for use in laser sintering, powder coating, compression molding, or transfer molding.

PROCESSES FOR INCREASING DENSITY OF POLYMER FLAKES AND POWDERS
20170306075 · 2017-10-26 ·

The present disclosure is directed to improved poly(arylene ether ketone) powders for use in laser sintering, powder coating, compression molding, or transfer molding.