A polymer comprising a plurality of repeat units of formula (I)

##STR00001##

or formula (IV)

##STR00002##

wherein each Ar.sup.1 and Ar.sup.4 is a unit comprising two or more aromatic groups; Ar.sup.1 comprises at least one cross-linkable group; Ar.sup.4 comprises a substituent selected from SO.sub.3H, CO.sub.2H, PO.sub.3H.sub.2, and salts thereof; R.sup.1 and R.sup.2, and R.sup.7 and R.sup.8, are independently selected from C.sub.1-6 alkyl, C.sub.1-6 haloalkyl, C.sub.3-10 cycloalkyl, C.sub.3-10 heterocycloalkyl, aryl, and heteroaryl, each optionally substituted, or R.sup.1 and R.sup.2, or R.sup.7 and R.sup.8, together with the carbon atom to which they are attached, form a carbocycle or heterocycle, provided that at least one of R.sup.7 and R.sup.8 contains an amide group or at least one geminal pair of R.sup.7 and R.sup.8, together with the carbon atom to which they are attached, forms a carbocycle or heterocycle that contains an amide group; and membranes and membrane electrode assemblies including same.

A polymer comprising a plurality of repeat units of formula (I)

##STR00001##

or formula (IV)

##STR00002##

wherein each Ar.sup.1 and Ar.sup.4 is a unit comprising two or more aromatic groups; Ar.sup.1 comprises at least one cross-linkable group; Ar.sup.4 comprises a substituent selected from SO.sub.3H, CO.sub.2H, PO.sub.3H.sub.2, and salts thereof; R.sup.1 and R.sup.2, and R.sup.7 and R.sup.8, are independently selected from C.sub.1-6 alkyl, C.sub.1-6 haloalkyl, C.sub.3-10 cycloalkyl, C.sub.3-10 heterocycloalkyl, aryl, and heteroaryl, each optionally substituted, or R.sup.1 and R.sup.2, or R.sup.7 and R.sup.8, together with the carbon atom to which they are attached, form a carbocycle or heterocycle, provided that at least one of R.sup.7 and R.sup.8 contains an amide group or at least one geminal pair of R.sup.7 and R.sup.8, together with the carbon atom to which they are attached, forms a carbocycle or heterocycle that contains an amide group; and membranes and membrane electrode assemblies including same.

The present invention relates to a polyaromatic polymer that comprises multifunctional aromatic moieties MA, cationic groups CG and bifunctional aromatic moieties BA, wherein one or more CG and one or more BA form a linear unit L, and MA is connected to 3 to 6 linear units L. MA, CG and BA are defined as described in the specification. Furthermore, the present invention relates to a neutral precursor of the polyaromatic polymer and to an anion exchange membrane that comprises a polyaromatic polymer according to the invention.

Embodiments of the invention relate to a novel class of polymers with superior mechanical properties and chemical stability, as compared to known polymers. These polymers are particularly well suited for use in anion exchange membranes (AEMs), including those employed in fuel cells. Novel methods for the manufacture of these polymers are also described.

Embodiments of the invention relate to a novel class of polymers with superior mechanical properties and chemical stability, as compared to known polymers. These polymers are particularly well suited for use in anion exchange membranes (AEMs), including those employed in fuel cells. Novel methods for the manufacture of these polymers are also described.

The present disclosure to an electrolyte membrane containing a polyfluorene-based ionomer, and more particularly, to an electrolyte membrane containing a polyfluorene-based ionomer which has a fluorene main chain composed of only a carbon-carbon bond and a side chain composed of a perfluorosulfonic acid group. The electrolyte membrane containing the polyfluorene-based ionomer has high proton conductivity, excellent chemical durability, excellent mechanical property, and excellent volume stability.

Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

This disclosure refers to a method for the synthesis of polymers with weight average molecular weights greater than 50,000 g/mol, chemically inert, with a minimum decomposition temperature of 425 C., and a main chain composed only of carbon-carbon bonds, which contain structures of the type of naphthalene, phenanthrene, anthracene, pyrene, carbazole or any other where two or more aromatic rings of six carbon atoms of the benzene-type are fused, which may or may not contain aromatic heterocycles. In addition, the polymers obtained from the present disclosure may or may not contain fluorine atoms in their structure. The synthesis described here is carried out by means of polycondensation between a polycyclic aromatic compound and a compound with a carbonyl group in its structure in a strong acid medium.

This disclosure refers to a method for the synthesis of polymers with weight average molecular weights greater than 50,000 g/mol, chemically inert, with a minimum decomposition temperature of 425 C., and a main chain composed only of carbon-carbon bonds, which contain structures of the type of naphthalene, phenanthrene, anthracene, pyrene, carbazole or any other where two or more aromatic rings of six carbon atoms of the benzene-type are fused, which may or may not contain aromatic heterocycles. In addition, the polymers obtained from the present disclosure may or may not contain fluorine atoms in their structure. The synthesis described here is carried out by means of polycondensation between a polycyclic aromatic compound and a compound with a carbonyl group in its structure in a strong acid medium.

An anitrogen-containing multicomponent copolymer is provided, and includes at least two of a chain segment I, a chain segment II, and a chain segment III. A structural formula of the chain segment I is represented by

##STR00001##

where Ar.sub.1 is an aryl structural unit. A structural formula of the chain segment II is represented by

##STR00002##

where Ar.sub.2 is an aryl structural unit. A structural formula of the chain segment III is represented by

##STR00003##

where Ar.sub.3 is an aryl structural unit.