C08G16/00

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

High temperature melt processable semi-crystalline poly(aryl ether ketone) containing a (4-hydroxyphenyl)phthalazin-1(2h)-one comonomer unit
10364352 · 2019-07-30 · ·

Compositions and methods for a melt processable semicrystalline poly(aryl ether ketone) incorporating phthalazinone and 4,4-biphenol as comonomer units are described herein. The polymers are resistant to and insoluble in common organic solvents and liquids as well as in aggressive organic solvents such as chloroform and chlorinated liquids. The polymers are melt processable via techniques such as extrusion, injection molding, and compression molding. The semicrystalline poly(aryl ether ketone) containing phthalazinone comonomer units have properties which make them suitable for manufacturing high temperature resistant molded systems and other articles.

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

A compound or a resin represented by the following formula (1). ##STR00001##
(in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R.sup.1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R.sup.2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R.sup.2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2).

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

A compound or a resin represented by the following formula (1). ##STR00001##
(in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R.sup.1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R.sup.2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R.sup.2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2).

Isatin copolymers having intrinsic microporosity

A copolymer including a repeating unit represented by Formula I: wherein: L is a divalent hydrocarbon group comprising from 1 to 12 carbon atoms; and L is optional and when present is represented by Formula II: wherein: Y, Y and Y if present, are independently selected from: a carboxylic acid, sulfonic acid, phosphorous acid and phosphoric acid and their corresponding salt or ester; imino, amide, nitrile, hydrogen, hydroxyl and alkyl comprising from 1 to 6 carbon atoms; and A, A and A if present, are independently selected from an arylene moiety, with the proviso one or both Y and A may not be present. ##STR00001##

Isatin copolymers having intrinsic microporosity

A copolymer including a repeating unit represented by Formula I: wherein: L is a divalent hydrocarbon group comprising from 1 to 12 carbon atoms; and L is optional and when present is represented by Formula II: wherein: Y, Y and Y if present, are independently selected from: a carboxylic acid, sulfonic acid, phosphorous acid and phosphoric acid and their corresponding salt or ester; imino, amide, nitrile, hydrogen, hydroxyl and alkyl comprising from 1 to 6 carbon atoms; and A, A and A if present, are independently selected from an arylene moiety, with the proviso one or both Y and A may not be present. ##STR00001##

POLYKETONE COMPOSITION INCLUDING EPOXY COMPOUND, CURED POLYKETONE, OPTICAL ELEMENT, AND IMAGE DISPLAY DEVICE

A polyketone composition includes: (A) a polyketone having, in a main chain, a structural unit represented by the following Formula (I); and (B) an epoxy compound. In Formula (I), X represents a bivalent group that has from 1 to 50 carbon atoms and that may have a substituent group, Y represents a bivalent hydrocarbon group that has from 1 to 30 carbon atoms and that may have a substituent group, and n represents an integer from 1 to 1500.

##STR00001##

Isatin copolymers having intrinsic microporosity

A copolymer including a repeating unit represented by (I) wherein: Y is selected from: a carboxylic acid, sulfonic, phosphorous acid and phosphoric acid and their corresponding salt or ester; imino, amide, nitrile, hydrogen, hydroxyl and alkyl comprising from 1 to 6 carbon atoms; and R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are independently selected from: hydrogen, alkyl groups comprising from 1 to 6 carbon atoms, and R.sub.1 and R.sub.2 may collectively form a ketone group or a 9, 9-fluorene group, and R.sub.3 and R.sub.4 may collectively form a ketone group or a 9, 9-fluorene group; R.sub.5 and R.sub.6 are independently selected from: a bond and an alkylene group comprising from 1 to 6 carbon atoms; R.sub.7 is selected from: hydrogen, alkyl, aryl, aralkyl and heteroaryl groups comprising from 1 to 8 carbon atoms which may be unsubstituted or substituted with carboxylic acid, sulfonic acid and phosphoric acid and their corresponding salt or ester, imino and amide; and X and X are independently selected from: a carboxylic acid, sulfonic acid and phosphoric acid and their corresponding salt or ester, imino and amide; nitrile, hydrogen, alkyl having from 1 to 6 carbon atoms and alkoxy having from 1 to 6 carbon atoms. ##STR00001##

Carbohydrate binders and materials made therewith

A binder comprising a polymeric binder comprising the products of a carbohydrate reactant and nucleophile is disclosed. The binder is useful for consolidating loosely assembled matter, such as fibers. Fibrous products comprising fibers in contact with a carbohydrate reactant and a nucleophile are also disclosed. The binder composition may be cured to yield a fibrous product comprising fibers bound by a cross-linked polymer. Further disclosed are methods for binding fibers with the carbohydrate reactant and polyamine based binder.