C08G69/00

STABILIZED POLYAMIDE
20200190262 · 2020-06-18 · ·

An article may include a polyamide composition comprising at least one modified polyamide produced by polymerizing polyamide precursors in a polymerization reactor to form a polyamide and adding, before, during, or at the end of polymerization, a polyhydric alcohol comprising at least three hydroxyl groups to the precursors and/or polyamide in the polymerization reactor.

Substrates comprising nano-patterning surfaces and methods of preparing thereof

Substrates comprising a functionalizable layer, a polymer layer comprising a plurality of micro-scale or nano-scale patterns, or combinations thereof, and a backing layer and the preparation thereof by using room-temperature UV nano-embossing processes are disclosed. The substrates can be prepared by a roll-to-roll continuous process. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.

Substrates comprising nano-patterning surfaces and methods of preparing thereof

Substrates comprising a functionalizable layer, a polymer layer comprising a plurality of micro-scale or nano-scale patterns, or combinations thereof, and a backing layer and the preparation thereof by using room-temperature UV nano-embossing processes are disclosed. The substrates can be prepared by a roll-to-roll continuous process. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.

POLYAMIDE RESIN MEMBER AND PRODUCTION METHOD THEREFOR

The present invention achieves higher performance (improvement in, for example, heat resistance, durability, and mechanical characteristics) of polyamide resin by a method which is not dependent on a combination with fibers. According to an embodiment of a polyamide resin member of the present invention, the polyamide resin member contains nano-oriented crystals of polyamide 66, and has a high heatproof temperature (T.sub.h278 C.) and a high melting point (T.sub.m282 C.).

Polymers with antimicrobial functionalities

Techniques regarding polymers with antimicrobial functionality are provided. For example, one or more embodiments described herein can regard a polymer, which can comprise a repeating ionene unit. The repeating ionene unit can comprise a cation distributed along a degradable backbone. The degradable backbone can comprise a terephthalamide structure. Further, the repeating ionene unit can have antimicrobial functionality.

Polymers with antimicrobial functionalities

Techniques regarding polymers with antimicrobial functionality are provided. For example, one or more embodiments described herein can regard a polymer, which can comprise a repeating ionene unit. The repeating ionene unit can comprise a cation distributed along a degradable backbone. The degradable backbone can comprise a terephthalamide structure. Further, the repeating ionene unit can have antimicrobial functionality.

RESIN, RESIN COMPOSITION, NONWOVEN FABRIC USING SAME, FIBER PRODUCT, SEPARATOR, SECONDARY BATTERY AND ELECTRIC DOUBLE LAYER CAPACITOR, AND METHOD FOR PRODUCING NONWOVEN FABRIC
20200131366 · 2020-04-30 · ·

A problem addressed by the present invention is to provide a resin out of which a heat-resistant non-woven fabric having a fine fiber diameter can be made by an electrospinning method. A main object of the present invention is to provide a resin, including a structure(s) represented by at least one selected from the group consisting of the following general formulae (1) to (3), wherein an end of the main-chain of the resin has at least one selected from alkyl groups having 10 or more carbon atoms and fluoroalkyl groups having 4 or more carbon atoms;

##STR00001##

(wherein, in the general formula (1), X independently represents a single bond or NR.sup.3; R.sup.1 and R.sup.2 independently represent a C.sub.4-C.sub.30 bivalent organic group; R.sup.3 represents a hydrogen atom or a C.sub.1-C.sub.10 monovalent organic group; in the general formula (2), R.sup.4 represents a C.sub.4-C.sub.30 bivalent organic group; R.sup.5 represents a C.sub.4-C.sub.30 tetravalent organic group; in the general formula (3), R.sup.6 represents a C.sub.4-C.sub.30 bivalent organic group; R.sup.7 represents a C.sub.4-C.sub.30 trivalent organic group; l, m, and n are each an integer of 0 or greater with the proviso that l+m+n=10 or greater; and wherein the structures represented by the general formulae (1) to (3) do not necessarily need to be consecutively present.)

Composition for interfacial polymerization of polyamide and method for manufacturing reverse osmosis membrane using same

The present specification provides a composition for interfacial polymerization of polyamide including at least one of an amine compound and an acyl halide compound; a surfactant; and a compound represented by Chemical Formula 1, and a method for preparing a reverse osmosis membrane using the same.

Composition for interfacial polymerization of polyamide and method for manufacturing reverse osmosis membrane using same

The present specification provides a composition for interfacial polymerization of polyamide including at least one of an amine compound and an acyl halide compound; a surfactant; and a compound represented by Chemical Formula 1, and a method for preparing a reverse osmosis membrane using the same.

Stabilized polyamide

The present invention relates to the use of a polyhydric alcohol in a polyamide polymerization process for giving the modified polyamide obtained increased stability toward heat, light and/or bad weather. The invention also relates to a polyamide modified in this way, and also to polyamide compositions that may be used for the preparation of specific articles liable to be subjected to high temperatures.