Patent classifications
C08G69/00
SUBSTRATES COMPRISING NANO-PATTERNING SURFACES AND METHODS OF PREPARING THEREOF
Substrates comprising a functionalizable layer, a polymer layer comprising a plurality of micro-scale or nano-scale patterns, or combinations thereof, and a backing layer and the preparation thereof by using room-temperature UV nano-embossing processes are disclosed. The substrates can be prepared by a roll-to-roll continuous process. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.
SUBSTRATES COMPRISING NANO-PATTERNING SURFACES AND METHODS OF PREPARING THEREOF
Substrates comprising a functionalizable layer, a polymer layer comprising a plurality of micro-scale or nano-scale patterns, or combinations thereof, and a backing layer and the preparation thereof by using room-temperature UV nano-embossing processes are disclosed. The substrates can be prepared by a roll-to-roll continuous process. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.
Polyarylene ether sulfone comprising naphthalic acid anhydride endgroups
A polyarylene ether sulfone comprising endgroups of formula (I), a process for its manufacture, a molding composition comprising the polyarylene ether sulfone, use of the molding composition and fiber, film or shaped article produced using the molding composition. ##STR00001##
Polyamide resin member and production method therefor
The present invention achieves higher performance (improvement in, for example, heat resistance, durability, and mechanical characteristics) of polyamide resin by a method which is not dependent on a combination with fibers. According to an embodiment of a polyamide resin member of the present invention, the polyamide resin member contains nano-oriented crystals of polyamide 66, and has a high heatproof temperature (T.sub.h≈278° C.) and a high melting point (T.sub.m≈282° C.).
POLYAMIDE RESIN COMPOSITION
The present invention is a polyamide resin composition containing 50 to 90% by mass of a crystalline polyamide resin (A) and 9 to 49% by mass of a talc (B), and preferably further containing a coupling agent (C) and a fatty acid metal salt (D), in which an average particle size of secondary particles of the talc (B) in the polyamide resin composition is greater than 30 μm. The polyamide resin composition is less likely to cause a poor appearance of a molded article or occurrence of sink marks, and can stably provide characteristics within desired ranges.
POLYAMIDE RESIN COMPOSITION
The present invention is a polyamide resin composition containing 50 to 90% by mass of a crystalline polyamide resin (A) and 9 to 49% by mass of a talc (B), and preferably further containing a coupling agent (C) and a fatty acid metal salt (D), in which an average particle size of secondary particles of the talc (B) in the polyamide resin composition is greater than 30 μm. The polyamide resin composition is less likely to cause a poor appearance of a molded article or occurrence of sink marks, and can stably provide characteristics within desired ranges.
COMPOSITIONS, METHODS, AND ARTICLES RELATING TO IN-SITU CROSSLINKING OF POLYAMIDES DURING ADDITIVE MANUFACTURING
Particles may be produced that comprise an unsaturated polyamide and an initiator. Said particles may be used in additive manufacturing methods that comprise: depositing the particles optionally in combination with other thermoplastic polymer particles upon a surface; and once deposited, heating at least a portion of the particles to promote consolidation thereof and crosslinking of the unsaturated polyamide, thereby forming a consolidated body comprising a crosslinked polyamide.
Polymers with antimicrobial functionalities
Techniques regarding polymers with antimicrobial functionality are provided. For example, one or more embodiments described herein can regard a polymer, which can comprise a repeating ionene unit. The repeating ionene unit can comprise a cation distributed along a degradable backbone. The degradable backbone can comprise a terephthalamide structure. Further, the repeating ionene unit can have antimicrobial functionality.
Polymers with antimicrobial functionalities
Techniques regarding polymers with antimicrobial functionality are provided. For example, one or more embodiments described herein can regard a polymer, which can comprise a repeating ionene unit. The repeating ionene unit can comprise a cation distributed along a degradable backbone. The degradable backbone can comprise a terephthalamide structure. Further, the repeating ionene unit can have antimicrobial functionality.
Polyamide compound
Provided is a polyamide compound excellent in various properties such as heat resistance and impact resistance. The polyamide compound contains a dicarboxylic acid unit represented by the general formula (1) and a diamine unit having a 9,9-bisarylfluorene skeleton. This polyamide compound is excellent in heat resistance and impact resistance. ##STR00001##