The present application relates to a polymer, a method for manufacturing the same, and an electrolyte membrane including the same.

The present invention describes chemical systems and methods for silylating aromatic organic substrates, said system or method comprising or consisting essentially of a mixture of (a) at least one organosilane and (b) at least one strong base, the definition of strong base now also including KOH, said system being preferably, but not necessarily substantially free of a transition-metal compound, and said methods comprising contacting a quantity of the organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.

A method for washing a polyarylene sulfide with a washing solution that contains a carefully controlled solvent content is provided. More particularly, the washing solution typically contains water (e.g., deionized water) in an amount of from about 30 wt. % to about 70 wt. % and an aprotic organic solvent in an amount of from about 30 wt. % to about 70 wt. %. Within such carefully controlled ranges, the present inventors have discovered that the polyarylene sulfide can retain a relatively high oligomer content, which in turn, helps minimize the melt viscosity.

Compositions comprising thiol-terminated sulfur-containing prepolymers, curing agents reactive with the thiol-terminated sulfur-containing prepolymers, and ionic liquid catalysts, useful in aerospace sealant applications are disclosed. The use of ionic liquid catalysts provides curable sealant compositions having an extended working time and a rapid cure rate.

A method for forming a conjugated heteroaromatic polymer is described, wherein at least one compound of formula (1) is polymerized using an acid as a catalyst, ##STR00001##
wherein X is selected from S, O, Se, Te, PR.sup.2 and NR.sup.2, Y is hydrogen (H) or a precursor of a good leaving group Y.sup.− whose conjugate acid (HY) has a pK.sub.a of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HZ) has a pK.sub.a of less than 30, b is 0, 1 or 2, each R.sup.1 is a substituent, and the at least one compound of formula (1) being polymerized includes at least one compound of formula (1) with Z=H and Y≠H.

A method for forming a conjugated heteroaromatic polymer is described, wherein at least one compound of formula (1) is polymerized using an acid as a catalyst, ##STR00001##
wherein X is selected from S, O, Se, Te, PR.sup.2 and NR.sup.2, Y is hydrogen (H) or a precursor of a good leaving group Y.sup.− whose conjugate acid (HY) has a pK.sub.a of less than 30, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HZ) has a pK.sub.a of less than 30, b is 0, 1 or 2, each R.sup.1 is a substituent, and the at least one compound of formula (1) being polymerized includes at least one compound of formula (1) with Z=H and Y≠H.

A method for preparing a conjugated polymer involves a DHAP polymerization of a 3,4-dioxythiophene, 3,4-dioxyfuran, or 3,4-dioxypyrrole and, optionally, at least one second conjugated monomer in the presence of a Pd or Ni comprising catalyst, an aprotic solvent, a carboxylic acid at a temperature in excess of 120° C. At least one of the monomers is substituted with hydrogen reactive functionalities and at least one of the monomers is substituted with a Cl, Br, and/or I. The polymerization can be carried out at temperature of 140° C. or more, and the DHAP polymerization can be carried out without a phosphine ligand or a phase transfer agent. The resulting polymer can display dispersity less than 2 and have a degree of polymerization in excess of 10.

A method for preparing a conjugated polymer involves a DHAP polymerization of a 3,4-dioxythiophene, 3,4-dioxyfuran, or 3,4-dioxypyrrole and, optionally, at least one second conjugated monomer in the presence of a Pd or Ni comprising catalyst, an aprotic solvent, a carboxylic acid at a temperature in excess of 120° C. At least one of the monomers is substituted with hydrogen reactive functionalities and at least one of the monomers is substituted with a Cl, Br, and/or I. The polymerization can be carried out at temperature of 140° C. or more, and the DHAP polymerization can be carried out without a phosphine ligand or a phase transfer agent. The resulting polymer can display dispersity less than 2 and have a degree of polymerization in excess of 10.

The invention pertains to a polymer composition possessing improved resistance towards degradation and discolouring phenomena induced by UV radiation, said composition comprising at least one aromatic sulfone polymer; at least one organic UV absorber and at least one basic compound selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid, and to methods for its manufacture and to shaped articles obtained therefrom.

The present invention relates to a process for the production of a polyaryl ether sulfone polymer (P), comprising the following steps: (I) provision of a solution (PL) which comprises the polyaryl ether sulfone polymer (P) and comprises an aprotic polar solvent (L), (II) separation of the solution (PL) into droplets, (III) transfer of the droplets into a precipitation bath (F) which comprises water, with the result that the polyaryl ether sulfone polymer (P) is obtained in the form of particles, and (IV) isolation of the polyaryl ether sulfone polymer (P)
where the temperature of the solution (PL) in step (II) is in the range from 50 to <80° C.