A composition includes a polythiol having more than one thiol group, a polyepoxide having more than one epoxide group, an amine catalyst, and conductive filler. The conductive filler is at least one of thermally conductive or electrically conductive. The conductive filler is present in an amount to provide a thermal conductivity of at least 0.95 W/m′K, and/or the conductive filler is present in an amount of greater than 80 percent by weight, based on the total weight of the composition. A polymer network, which can be prepared from the composition, and a method for making the polymer network are also disclosed.

Elastomeric copolymer with a high sulfur content, comprising sulfur in a quantity higher than or equal to 40% by weight, preferably ranging from 55% by weight to 90% by weight, with respect to the total weight of said elastomeric copolymer, and at least one monomer having general formula (I): CH.sub.2═CH—(CH.sub.2).sub.y-(X).sub.n-(X).sub.m-(CH.sub.2).sub.x—CH═CH.sub.2 (I) wherein: X represents a sulfur atom, a selenium atom, a tellurium atom, preferably a sulfur atom, a selenium atom; y and x, equal to or different from one another, are a whole number ranging from 0 to 4; n and m, equal to or different from one another, are a whole number ranging from 0 to 3, at least one of n and m being equal to 1; said monomer being present in a quantity lower than or equal to 60% by weight, preferably ranging from 10% by weight to 45% by weight, with respect to the total weight of said elastomeric copolymer; provided that, in the case wherein in said general formula (I) X is sulfur, y and x are 1, at least one of n and m must be different from 1 and the sum of n+m must be different from 1. Said elastomeric copolymer with a high sulfur content can be advantageously used in a great many applications such as, for example, thermal insulation, conveyor

The present invention relates to a powdered material (M) containing at least one poly(arylene sulfide) (PAS) polymer, comprising recurring units p, q and r according of formula (I) wherein n.sub.p, n.sub.q and n.sub.r are respectively the mole % of each recurring units p, q and r; recurring units p, q and r are arranged in blocks, in alternation or randomly; 2≤(n.sub.q+n.sub.r)/(n.sub.p+n.sub.q+n.sub.r)≤9; nq is ≥0% and nr is ≥0%; j is zero or an integer varying between 1 and 4; R.sup.1 is selected from the group consisting of halogen atoms, C.sub.1-C.sub.12 alkyl groups, C.sub.7-C.sub.24 alkylaryl groups, C.sub.7-C.sub.24 aralkyl groups, C.sub.6-C.sub.24 arylene groups, C.sub.1-C.sub.12 alkoxy groups, and C.sub.6-C.sub.18 aryloxy groups.

##STR00001##

The invention pertains to a polymer composition possessing improved resistance towards degradation and discolouring phenomena induced by UV radiation, said composition comprising at least one aromatic sulfone polymer; at least one organic UV absorber and at least one basic compound selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid, and to methods for its manufacture and to shaped articles obtained therefrom.

The invention pertains to a polymer composition possessing improved resistance towards degradation and discolouring phenomena induced by UV radiation, said composition comprising at least one aromatic sulfone polymer; at least one organic UV absorber and at least one basic compound selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid, and to methods for its manufacture and to shaped articles obtained therefrom.

Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (IV) wherein each instance of R.sup.9 is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and ether. Each instance of R.sup.28 and R.sup.29 of Formula (IV) is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, and aryl. Each instance of R.sup.33 of Formula (IV) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R.sup.41 of Formula (IV) is independently —NH— or a bond and each instance of R.sup.40 is independently —NH— or —NH—NH—. Each instance of R.sup.42 of Formula (IV) is independently —NH— or a bond and each instance of R.sup.43 is independently —NH— or —NH—NH—.

Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (IV) wherein each instance of R.sup.9 is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and ether. Each instance of R.sup.28 and R.sup.29 of Formula (IV) is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, and aryl. Each instance of R.sup.33 of Formula (IV) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R.sup.41 of Formula (IV) is independently —NH— or a bond and each instance of R.sup.40 is independently —NH— or —NH—NH—. Each instance of R.sup.42 of Formula (IV) is independently —NH— or a bond and each instance of R.sup.43 is independently —NH— or —NH—NH—.

Compositions that are curable to polythioether polymers are provided, comprising: a) a dithiol monomer; b) a diene monomer; c) a radical cleaved photoinitiator; d) a peroxide; and e) an amine; where the peroxide and amine together are a peroxide-amine redox initiator. In some embodiments, the amine is a tertiary amine. In some embodiments, the amine is selected from the group consisting of dihydroxyethyl-p-toluidine, N,N-diisopropylethylamine, and N, N, N′, N″, N″-pentamethyl-diethylenetriamine. In some embodiments, the peroxide is selected from the group consisting of di-tert-butyl peroxide, methyl ethyl ketone peroxide, and benzoyl peroxide. In some embodiments, the composition may additionally comprise a polythiol monomer having three or more thiol groups.

Compositions that are curable to polythioether polymers are provided, comprising: a) a dithiol monomer; b) a diene monomer; c) a radical cleaved photoinitiator; d) a peroxide; and e) an amine; where the peroxide and amine together are a peroxide-amine redox initiator. In some embodiments, the amine is a tertiary amine. In some embodiments, the amine is selected from the group consisting of dihydroxyethyl-p-toluidine, N,N-diisopropylethylamine, and N, N, N′, N″, N″-pentamethyl-diethylenetriamine. In some embodiments, the peroxide is selected from the group consisting of di-tert-butyl peroxide, methyl ethyl ketone peroxide, and benzoyl peroxide. In some embodiments, the composition may additionally comprise a polythiol monomer having three or more thiol groups.

The present invention provides a process for preparing sulfur-containing branched organosilane polymers comprising: reacting sulfur with a vinyl silane compound in a solvent and in the presence of a catalytic amount of an accelerator at an elevated temperature of at least 40° C. The process, and the organosilane polymers obtained by using the process, are very suitable for application in battery technologies.