Patent classifications
C08L41/00
Skin-contact product having moisture and microclimate control
Skin-contact products with a transpiration function such as medical devices or medicinal products, of which face masks, aspirators, ventilators, breast pumps or wound dressings are examples are described especially a skin-contact product with a transpiration function with an improved microclimate at a patient interface material-skin contact area. In an embodiment a material system is described that comprises a hydrophobic silicone base material and a hydrophilic silicone material that is combined with the hydrophobic base material.
Purifying aqueous solutions
Provided is a process for purifying an aqueous solution, wherein the aqueous solution comprises one or more sugars and additionally comprises furfural, hydroxymethylfurfural, or a mixture thereof; wherein the process comprises passing the aqueous solution through a collection of resin particles; and wherein the resin particles comprise covalently bound acid functional groups.
Methods of making and using a high temperature wellbore servicing fluid
A method of servicing a wellbore penetrating a subterranean formation, comprising: placing a wellbore servicing fluid (WSF) into the wellbore, wherein the WSF comprises a first polymer, a second polymer, and water, wherein the first polymer is formed by polymerizing monomers comprising three of 2-Acrylamido-2-methyl propane sulfonic acid (AMPS), N,N-dimethylacrylamide (NNDMA), acrylamide, N-vinylacetamide, allyloxy-2-hydroxy propane sulfonic acid (AHPS), acrylic acid (AA), 2-acrylamido-2-tert.-butyl sulfonic acid (ATBS), or N,N-Dimethylaniline, and the second polymer is formed by polymerizing monomers and/or crosslinkers comprising AMPS, vinylpyrrolidinone, pentaerythritol allyl ether, and methylenebisacrylamide, wherein in the vinylpyrrolidinone, the 2-Pyrrolidone group can be substituted by a heterocyclic group, comprising one or more Z membered rings with Y heteroatoms, wherein Z is equal to or greater than three, and wherein Y is equal to or greater than one.
Methods of making and using a high temperature wellbore servicing fluid
A method of servicing a wellbore penetrating a subterranean formation, comprising: placing a wellbore servicing fluid (WSF) into the wellbore, wherein the WSF comprises a first polymer, a second polymer, and water, wherein the first polymer is formed by polymerizing monomers comprising three of 2-Acrylamido-2-methyl propane sulfonic acid (AMPS), N,N-dimethylacrylamide (NNDMA), acrylamide, N-vinylacetamide, allyloxy-2-hydroxy propane sulfonic acid (AHPS), acrylic acid (AA), 2-acrylamido-2-tert.-butyl sulfonic acid (ATBS), or N,N-Dimethylaniline, and the second polymer is formed by polymerizing monomers and/or crosslinkers comprising AMPS, vinylpyrrolidinone, pentaerythritol allyl ether, and methylenebisacrylamide, wherein in the vinylpyrrolidinone, the 2-Pyrrolidone group can be substituted by a heterocyclic group, comprising one or more Z membered rings with Y heteroatoms, wherein Z is equal to or greater than three, and wherein Y is equal to or greater than one.
ELASTOMERIC TERPOLYMERS WITH A HIGH SULFUR CONTENT AND PROCESS FOR THEIR PREPARATION
Elastomeric terpolymer with a high sulfur content comprising:sulfur in a quantity higher than or equal to 40% by weight, preferably ranging from 55% by weight to 90% by weight, with respect to the total weight of said elastomeric terpolymer;a first monomer selected from aromatic vinyl compounds, preferably from styrene, divinylbenzene, vinyl toluene, tert-butylstyrene, p-methylstyrene, -methylstyrene, -methylstyrene, vinylnaphthalene;a second monomer selected from:aromatic vinyl compounds, preferably from styrene, divinylbenzene, vinyl toluene, tert-butylstyrene, p-methylstyrene, -methylstyrene, -methylstyrene, vinyl-naphthalene;monomers having general formula (I): CH.sub.2CH(CH.sub.2).sub.y(X).sub.n(X).sub.m(CH.sub.2).sub.xCHCH.sub.2, wherein:X represents a sulfur atom, a selenium atom, a tellurium atom, preferably a sulfur atom, a selenium atom;y and x, equal to or different from one another, are a whole number ranging from 0 to 4;n and m, equal to or different from one another, are a whole number ranging from 0 to 3, at least one of n and m being equal to 1; said first monomer and said second monomer being present in a quantity lower than or equal to 60% by weight, preferably ranging from 10% by weight to 45% by weight, with respect to the total weight of said elastomeric terpolymer; said first monomer and said second monomer being different from one another. Said elastomeric terpolymer with a high sulfur content may be advantageously used in various applications such as, for example, thermal insulation, conveyor belts, transmission belts, flexible hoses and, in particular, in elastomeric compositions for tyres.
Polymer system for fluid loss control
A combination of three polymers including a crosslinked acrylamide-TBAS copolymers in inverse emulsion form, N-vinyl pyrrolidone-acrylamide-TBAS terpolymer, and crosslinked N-vinyl pyrrolidone-acrylamide-TBAS acts as high temperature, high pressure fluid loss control additives for water-based drilling fluids systems. The combination is particularly useful for high salt, high density drilling fluids, and high temperature applications.
Polymer system for fluid loss control
A combination of three polymers including a crosslinked acrylamide-TBAS copolymers in inverse emulsion form, N-vinyl pyrrolidone-acrylamide-TBAS terpolymer, and crosslinked N-vinyl pyrrolidone-acrylamide-TBAS acts as high temperature, high pressure fluid loss control additives for water-based drilling fluids systems. The combination is particularly useful for high salt, high density drilling fluids, and high temperature applications.
Resist composition and patterning process
A resist composition is provided comprising a base polymer containing an iodized polymer, and an acid generator containing a sulfonium salt and/or iodonium salt of iodized benzene ring-containing fluorosulfonic acid. When processed by lithography, the resist composition exhibits a high sensitivity, low LWR and improved CDU independent of whether it is of positive tone or negative tone.
Resist composition and patterning process
A resist composition is provided comprising a base polymer containing an iodized polymer, and an acid generator containing a sulfonium salt and/or iodonium salt of iodized benzene ring-containing fluorosulfonic acid. When processed by lithography, the resist composition exhibits a high sensitivity, low LWR and improved CDU independent of whether it is of positive tone or negative tone.
AQUEOUS INK COMPOSITION, INK SET, AND IMAGE-FORMING METHOD
An aqueous ink composition including: an aqueous medium and resin fine particles, in which a proportion of a high-boiling solvent occupied in the aqueous medium is 3% by mass or less, and a resin constituting the resin fine particle contains constitutional units represented by General Formula (1) or (2).
##STR00001##
In the formulae, R.sup.1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, A.sup.1 represents O, NH, or N(L.sup.2-Y.sup.2), and L.sup.1 and L.sup.2 each are represent a specific divalent group such as an alkylene group or the like.
Y.sup.1 and Y.sup.2 each represent OH, OR.sup.2, NH.sub.2, NR.sup.2H, NR.sup.2R.sup.3, SH, S(O).sub.2OM, or OP(O)(OM).sub.2. R.sup.2 and R.sup.3 each represent a specific substituent, and M represents a hydrogen atom, an alkali metal ion, or an ammonium ion.