Patent classifications
C08L71/00
POLYMER COMPOSITION FOR WATERPROOF-BREATHABLE FILMS
The invention relates to a composition consisting of 75 to 98 wt %, relative to the weight of the composition, of at least one hydrophilic elastomeric thermoplastic polymer (TPE) A selected from (a1) copolymers containing polyester blocks and polyether blocks, (a2) copolymers containing polyurethane blocks and polyether blocks or polyester blocks and/or mixtures thereof; 2 to 15% by weight, relative to the weight of the composition, of at least one copolymer B comprising units derived from ethylene, from an alkyl (meth)acrylate and from a comonomer comprising at least one acid, anhydride or epoxide function; and 0 to 10% by weight, relative to the weight of the composition, of at least one additive. The invention further relates to a process for manufacturing a film and to said film.
POLYMER COMPOSITION FOR WATERPROOF-BREATHABLE FILMS
The invention relates to a composition consisting of 75 to 98 wt %, relative to the weight of the composition, of at least one hydrophilic elastomeric thermoplastic polymer (TPE) A selected from (a1) copolymers containing polyester blocks and polyether blocks, (a2) copolymers containing polyurethane blocks and polyether blocks or polyester blocks and/or mixtures thereof; 2 to 15% by weight, relative to the weight of the composition, of at least one copolymer B comprising units derived from ethylene, from an alkyl (meth)acrylate and from a comonomer comprising at least one acid, anhydride or epoxide function; and 0 to 10% by weight, relative to the weight of the composition, of at least one additive. The invention further relates to a process for manufacturing a film and to said film.
IMPLANTABLE MEDICAL DEVICE WITH THERMOPLASTIC COMPOSITE BODY AND METHOD FOR FORMING THERMOPLASTIC COMPOSITE BODY
An implantable medical device is disclosed comprising a thermoplastic composite body having anterior, first lateral, second lateral, posterior, superior, and inferior surfaces, and at least one dense portion and at least one porous portion which are integrally formed. The at least one dense portion is formed of a first thermoplastic polymer matrix that is essentially non-porous, and which is continuous through a thickness dimension from the superior surface to the inferior surface. The at least one porous portion is formed of a porous thermoplastic polymer scaffold having a second thermoplastic polymer matrix which is continuous through the thickness dimension. A method for forming the thermoplastic composite body is disclosed comprising disposing a first powder mixture in a first portion of a mold, disposing a second powder mixture in a second portion of the mold, simultaneously molding the first powder mixture and the second powder mixture, and leaching porogen.
IMPLANTABLE MEDICAL DEVICE WITH THERMOPLASTIC COMPOSITE BODY AND METHOD FOR FORMING THERMOPLASTIC COMPOSITE BODY
An implantable medical device is disclosed comprising a thermoplastic composite body having anterior, first lateral, second lateral, posterior, superior, and inferior surfaces, and at least one dense portion and at least one porous portion which are integrally formed. The at least one dense portion is formed of a first thermoplastic polymer matrix that is essentially non-porous, and which is continuous through a thickness dimension from the superior surface to the inferior surface. The at least one porous portion is formed of a porous thermoplastic polymer scaffold having a second thermoplastic polymer matrix which is continuous through the thickness dimension. A method for forming the thermoplastic composite body is disclosed comprising disposing a first powder mixture in a first portion of a mold, disposing a second powder mixture in a second portion of the mold, simultaneously molding the first powder mixture and the second powder mixture, and leaching porogen.
COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS
The object is to provide a composition capable of forming a surface layer with excellent abrasion resistance, a substrate with a surface layer, and a method for producing a substrate with a surface layer. It is also an object to provide new compounds and their production methods.
The composition of the invention comprises a first component made of a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group, and at least one type of second component selected from compound (A) (R.sup.fa—(OX.sup.a).sub.m1-L.sup.a-CZ.sup.a1═CH.sub.2) and compound (B) (CH.sub.2═CZ.sup.b2-L.sup.b2-(OX.sup.b).sub.m2-L.sup.b1-CZ.sup.b1═CH.sub.2), where R.sup.fa is a fluoroalkyl group, X.sup.a and X.sup.b are fluoroalkylene groups, L.sup.a is a single bond or a divalent linking group (but excluding (OX.sup.a).sub.na), L.sup.b1 and L.sup.b2 are single bonds or divalent linking groups (but excluding (OX.sup.b).sub.nb), Z.sup.a1, Z.sup.b1 and Z.sup.b2 are fluorine atoms or trifluoromethyl groups, and m1 and m2 are integers of 2 or more.
COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS
The object is to provide a composition capable of forming a surface layer with excellent abrasion resistance, a substrate with a surface layer, and a method for producing a substrate with a surface layer. It is also an object to provide new compounds and their production methods.
The composition of the invention comprises a first component made of a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group, and at least one type of second component selected from compound (A) (R.sup.fa—(OX.sup.a).sub.m1-L.sup.a-CZ.sup.a1═CH.sub.2) and compound (B) (CH.sub.2═CZ.sup.b2-L.sup.b2-(OX.sup.b).sub.m2-L.sup.b1-CZ.sup.b1═CH.sub.2), where R.sup.fa is a fluoroalkyl group, X.sup.a and X.sup.b are fluoroalkylene groups, L.sup.a is a single bond or a divalent linking group (but excluding (OX.sup.a).sub.na), L.sup.b1 and L.sup.b2 are single bonds or divalent linking groups (but excluding (OX.sup.b).sub.nb), Z.sup.a1, Z.sup.b1 and Z.sup.b2 are fluorine atoms or trifluoromethyl groups, and m1 and m2 are integers of 2 or more.
Resist underlayer composition, and method of forming patterns using the composition
A resist underlayer composition and a method of forming patterns using a resist underlayer composition, the resist underlayer composition including a polymer, the polymer including a structural unit that is a reaction product of an isocyanurate compound, the isocyanurate compound having at least one thiol group thereon, and a solvent.
Resist underlayer composition, and method of forming patterns using the composition
A resist underlayer composition and a method of forming patterns using a resist underlayer composition, the resist underlayer composition including a polymer, the polymer including a structural unit that is a reaction product of an isocyanurate compound, the isocyanurate compound having at least one thiol group thereon, and a solvent.
Poly(arylene ether) compositions and articles incorporating the same
Compositions including a poly(arylene ether), and compaction rollers for an automated fiber placement machine incorporating the composition are provided. The poly(arylene ether) may be a reaction product of at least one disubstituted benzophenone and at least one polyol. The at least one polyol may include at least one fluorinated diol. The composition may have a thermal conductivity of from about 0.2 to about 50 Watts per meter Kelvin (Wm.sup.−1K.sup.−1).
Poly(arylene ether) compositions and articles incorporating the same
Compositions including a poly(arylene ether), and compaction rollers for an automated fiber placement machine incorporating the composition are provided. The poly(arylene ether) may be a reaction product of at least one disubstituted benzophenone and at least one polyol. The at least one polyol may include at least one fluorinated diol. The composition may have a thermal conductivity of from about 0.2 to about 50 Watts per meter Kelvin (Wm.sup.−1K.sup.−1).