Patent classifications
C09D1/00
SYSTEMS AND METHODS FOR DETECTING WINDSHIELD CRACKS
Systems and methods are disclosed for detecting a crack in an automotive windshield and alerting a user of the same. This can allow the user to repair the crack before the user might otherwise detect the crack by his/her own visual inspection. The windshield can be provided with emitters configured to emit signals (e.g., sound, light, etc.) and corresponding detectors configured to detect the emitted signals. Signal profiles or signatures can be stored that represent normal measurements when there is no crack. Upon detecting a signal signature that deviates from the stored normal signal signatures, the system can notify the user of a potential crack in the windshield. The system can also determine the location of the crack based upon which of the detectors detect a change in the detected signal.
SYSTEMS AND METHODS FOR DETECTING WINDSHIELD CRACKS
Systems and methods are disclosed for detecting a crack in an automotive windshield and alerting a user of the same. This can allow the user to repair the crack before the user might otherwise detect the crack by his/her own visual inspection. The windshield can be provided with emitters configured to emit signals (e.g., sound, light, etc.) and corresponding detectors configured to detect the emitted signals. Signal profiles or signatures can be stored that represent normal measurements when there is no crack. Upon detecting a signal signature that deviates from the stored normal signal signatures, the system can notify the user of a potential crack in the windshield. The system can also determine the location of the crack based upon which of the detectors detect a change in the detected signal.
AMORPHOUS SILICON FORMING COMPOSITION AND METHOD FOR PRODUCING AMORPHOUS SILICON FILM USING SAME
To provide an amorphous silicon forming composition, which has high affinity with a substrate. An amorphous silicon forming composition comprising a polysilane having an amino group; and a solvent.
AMORPHOUS SILICON FORMING COMPOSITION AND METHOD FOR PRODUCING AMORPHOUS SILICON FILM USING SAME
To provide an amorphous silicon forming composition, which has high affinity with a substrate. An amorphous silicon forming composition comprising a polysilane having an amino group; and a solvent.
Method of Forming and Controlling Morphology of Cracks in Silicon Dioxide Film
Methods for forming and controlling morphology cracks in silicon dioxide (SiO.sub.2) film comprising: preparing SiO.sub.2precursor solution comprising solvent, precursor of SiO.sub.2, precursor of metal oxide nanocrystals, water, and acid; coating the solution onto substrate; drying the solution atop the substrate at a temperature between about 20° C. to 100° C. between 1 minute to 24 hours to form SiO.sub.2 film having uniformly dispersed metal oxide nanocrystals, wherein shorter drying times yield substantially spherical shaped metal oxide nanocrystals and longer drying times yield rod and disc shaped metal oxide nanocrystals; and thermally treating the SiO.sub.2 film between about 60° C. to 500° C. between 1 minute to 24 hours to form cracked mesh SiO.sub.2 film, wherein two cracks initiate from rod shaped metal oxide nanocrystals, three to four cracks initiate from spherical shaped metal oxide nanocrystals, and four or more cracks initiate from disc shaped metal oxide nanocrystals. Other embodiments are described and claimed.
Method of Forming and Controlling Morphology of Cracks in Silicon Dioxide Film
Methods for forming and controlling morphology cracks in silicon dioxide (SiO.sub.2) film comprising: preparing SiO.sub.2precursor solution comprising solvent, precursor of SiO.sub.2, precursor of metal oxide nanocrystals, water, and acid; coating the solution onto substrate; drying the solution atop the substrate at a temperature between about 20° C. to 100° C. between 1 minute to 24 hours to form SiO.sub.2 film having uniformly dispersed metal oxide nanocrystals, wherein shorter drying times yield substantially spherical shaped metal oxide nanocrystals and longer drying times yield rod and disc shaped metal oxide nanocrystals; and thermally treating the SiO.sub.2 film between about 60° C. to 500° C. between 1 minute to 24 hours to form cracked mesh SiO.sub.2 film, wherein two cracks initiate from rod shaped metal oxide nanocrystals, three to four cracks initiate from spherical shaped metal oxide nanocrystals, and four or more cracks initiate from disc shaped metal oxide nanocrystals. Other embodiments are described and claimed.
MXENE COMPOSITIONS FEATURING FIVE ATOMIC LAYERS
Provided are 5-layered MXene materials having the formulas M.sub.5X.sub.4T.sub.x; (M′aM″b)X.sub.4T.sub.x (where a+b=5); and (M′.sub.aM″.sub.b).sub.5X.sub.4T.sub.x (where a+b=1). Also provided are related methods, compositions, and applications.
MXENE COMPOSITIONS FEATURING FIVE ATOMIC LAYERS
Provided are 5-layered MXene materials having the formulas M.sub.5X.sub.4T.sub.x; (M′aM″b)X.sub.4T.sub.x (where a+b=5); and (M′.sub.aM″.sub.b).sub.5X.sub.4T.sub.x (where a+b=1). Also provided are related methods, compositions, and applications.
BISMUTH COMPOSITIONS FOR METAL PRETREATMENT APPLICATIONS
Provided are bismuth conversion coating compositions that deposit bismuth conversion coatings on a variety of metal substrates, methods of making bismuth conversion coating compositions, methods of depositing bismuth conversion coatings on metal substrates and articles of manufacture having metal surfaces comprising a bismuth conversion coating.
BISMUTH COMPOSITIONS FOR METAL PRETREATMENT APPLICATIONS
Provided are bismuth conversion coating compositions that deposit bismuth conversion coatings on a variety of metal substrates, methods of making bismuth conversion coating compositions, methods of depositing bismuth conversion coatings on metal substrates and articles of manufacture having metal surfaces comprising a bismuth conversion coating.