A sol-gel mixture for overcoating surface-relief structures includes at least a first Titanium(IV) precursor and a second Titanium(IV) precursor. The first Titanium(IV) precursor includes a sulfate or phosphate ligand. The second Titanium(IV) precursor includes a carboxylate ligand. The first Titanium(IV) precursor and the second Titanium(IV) precursor are dissolved or suspended in a solvent.

Aqueous solutions of halogenides (oxyhalides) of zirconium and hafnium (M) with values of α=X/M near one, for X=Cl, Br and I form amorphous solids or glasses, designated as M,X, in contrast to important crystalline oxyhalide end members with α=2 (designated as MOX). The present disclosure describes methods for producing amorphous thin films comprising halogenides upon evaporation, and provides some measured physical properties, with attention to compositions for α<2. The value of a below which only glasses are formed is about one for oxychlorides and oxybromides of both Zr and Hf. The chemical formulas for all the halogenide thin films prepared as noted above can be written as a function of the single parameter α, according to M(OH).sub.4-αX.sub.α.(4α-1)H.sub.2O. This is valid for e.g., crystalline zirconium oxychloride octahydrate, and for the glassy solids found for α<2 and down to the onset of hydrolysis, α≈0.5. Thin films made by the disclosed methods are highly dense (90% of theoretical crystal density), extremely smooth (rms<0.4 nm), and highly transparent in the visible spectrum, >90%. Such thin films are useful as alkali diffusion barriers.

Aqueous solutions of halogenides (oxyhalides) of zirconium and hafnium (M) with values of α=X/M near one, for X=Cl, Br and I form amorphous solids or glasses, designated as M,X, in contrast to important crystalline oxyhalide end members with α=2 (designated as MOX). The present disclosure describes methods for producing amorphous thin films comprising halogenides upon evaporation, and provides some measured physical properties, with attention to compositions for α<2. The value of a below which only glasses are formed is about one for oxychlorides and oxybromides of both Zr and Hf. The chemical formulas for all the halogenide thin films prepared as noted above can be written as a function of the single parameter α, according to M(OH).sub.4-αX.sub.α.(4α-1)H.sub.2O. This is valid for e.g., crystalline zirconium oxychloride octahydrate, and for the glassy solids found for α<2 and down to the onset of hydrolysis, α≈0.5. Thin films made by the disclosed methods are highly dense (90% of theoretical crystal density), extremely smooth (rms<0.4 nm), and highly transparent in the visible spectrum, >90%. Such thin films are useful as alkali diffusion barriers.

Methods for plasma enhanced chemical vapor deposition (PECVD) of silicon carbonitride films are described. A flowable silicon carbonitride film is formed on a substrate surface by exposing the substrate surface to a precursor and a reactant, the precursor having a structure of general formula (I) or general formula (II) ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, and R.sup.12 are independently selected from hydrogen (H), substituted or unsubstituted alkyl, substituted or unsubstituted alkoxy, substituted or unsubstituted vinyl, silane, substituted or unsubstituted amine, or halide; purging the processing chamber of the silicon precursor, and then exposing the substrate to an ammonia plasma.

Methods for plasma enhanced chemical vapor deposition (PECVD) of silicon carbonitride films are described. A flowable silicon carbonitride film is formed on a substrate surface by exposing the substrate surface to a precursor and a reactant, the precursor having a structure of general formula (I) or general formula (II) ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, and R.sup.12 are independently selected from hydrogen (H), substituted or unsubstituted alkyl, substituted or unsubstituted alkoxy, substituted or unsubstituted vinyl, silane, substituted or unsubstituted amine, or halide; purging the processing chamber of the silicon precursor, and then exposing the substrate to an ammonia plasma.

The invention relates to an optical article comprising an anti-reflective edge coating, and to processes for coating an edge an surface of optical article, such as an optical lens, with an anti-reflective coating. The anti-reflective edge coating of optical article according to the invention is suitable for reducing and/or cancelling the visibility of at least one myopia ring and/or white ring.

The invention relates to an optical article comprising an anti-reflective edge coating, and to processes for coating an edge an surface of optical article, such as an optical lens, with an anti-reflective coating. The anti-reflective edge coating of optical article according to the invention is suitable for reducing and/or cancelling the visibility of at least one myopia ring and/or white ring.

The invention relates to the use of coatings of nanoscale SiO.sub.2 particles in water-carrying cooling systems to prevent abrasive corrosion and depositions as well as to a method for the production of such a coating.

The invention relates to the use of coatings of nanoscale SiO.sub.2 particles in water-carrying cooling systems to prevent abrasive corrosion and depositions as well as to a method for the production of such a coating.

A method of increasing water repellency of an organic porous substrate, such as wood, is provided. The method comprises applying a dispersion of inorganic nanoparticles in a liquid carrier onto a surface of the substrate. The liquid carrier is selected to evaporate substantially entirely at room temperature. For example, the liquid carrier may be selected so that at least 95% of the liquid carrier will evaporate at room temperature, preferably in a 24 hour period following application to the substrate surface.