Patent classifications
C09D137/00
Coating agents and coated articles
The invention describes novel coating agents that include a polymer, one or more latent reactive groups and one or more noncovalent linking groups, the noncovalent linking groups selected to interact with a substrate to which the coating agent is applied.
Film and substrate having surface covered with same
An object of the present disclosure is to provide a film that has high water slidability, and a substrate having a surface covered with the film. The present disclosure provides a film having the properties of a sliding velocity of 150 mm/s or more at an inclination angle of 30 and an average surface roughness (Ra) of 1 m or less, and further provides a substrate having a surface covered with the film.
Film and substrate having surface covered with same
An object of the present disclosure is to provide a film that has high water slidability, and a substrate having a surface covered with the film. The present disclosure provides a film having the properties of a sliding velocity of 150 mm/s or more at an inclination angle of 30 and an average surface roughness (Ra) of 1 m or less, and further provides a substrate having a surface covered with the film.
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS
The onium salt can be used for a chemically amplified resist composition. The resist composition exhibits a high sensitivity, high resolution, having improved lithography properties such as LWR of line patterns, CDU of hole patterns, exposure latitude (EL), and depth of focus (DOF), and capable of suppressing collapse of resist patterns in photolithography using high-energy radiation such as a far ultraviolet ray, EUV, or an electron beam (EB) independent of whether it is of positive or negative tone, and to provide a pattern forming process. The onium salt having the formula (1).
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ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS
The onium salt can be used for a chemically amplified resist composition. The resist composition exhibits a high sensitivity, high resolution, having improved lithography properties such as LWR of line patterns, CDU of hole patterns, exposure latitude (EL), and depth of focus (DOF), and capable of suppressing collapse of resist patterns in photolithography using high-energy radiation such as a far ultraviolet ray, EUV, or an electron beam (EB) independent of whether it is of positive or negative tone, and to provide a pattern forming process. The onium salt having the formula (1).
##STR00001##
ANTENNA COVER BASE MATERIAL
An object of the present disclosure is to provide an antenna cover base material that is coated with a fluoropolymer-containing film and that has excellent durability of water sliding. The present disclosure pertains to an antenna cover base material coated with a fluoropolymer-containing film, the film having the properties of a water sliding velocity of 150 mm/s or more at an inclination angle of 30, and an average surface roughness (Ra) of 1 m or less.
ANTENNA COVER BASE MATERIAL
An object of the present disclosure is to provide an antenna cover base material that is coated with a fluoropolymer-containing film and that has excellent durability of water sliding. The present disclosure pertains to an antenna cover base material coated with a fluoropolymer-containing film, the film having the properties of a water sliding velocity of 150 mm/s or more at an inclination angle of 30, and an average surface roughness (Ra) of 1 m or less.
Binder polymer obtainable by copolymerizing a monomer mixture comprising a vinyl monomer and a butenolide monomer
The invention relates to a binder polymer obtainable by copolymerizing a monomer mixture comprising a vinyl monomer M1 and a butenolide monomer M2, wherein the vinyl monomer M1 is a vinyl ether, a vinyl ester, or a combination thereof, and the butenolide monomer M2 is a 5-alkoxy-2(5H)-furanone. The invention further relates to a coating composition comprising such binder polymer and to a substrate coated with a coating deposited from such coating composition.
Binder polymer obtainable by copolymerizing a monomer mixture comprising a vinyl monomer and a butenolide monomer
The invention relates to a binder polymer obtainable by copolymerizing a monomer mixture comprising a vinyl monomer M1 and a butenolide monomer M2, wherein the vinyl monomer M1 is a vinyl ether, a vinyl ester, or a combination thereof, and the butenolide monomer M2 is a 5-alkoxy-2(5H)-furanone. The invention further relates to a coating composition comprising such binder polymer and to a substrate coated with a coating deposited from such coating composition.
CONDUCTIVE INK AND PREPARATION METHOD AND APPLICATION THEREOF
A conductive ink, a preparation method and application thereof are provided and relate to the field of conductive ink technology. The conductive ink includes the following components in weight percentage, based on a total weight of the conductive ink being 100%: 1% to 85% of an organic conductive material, and 15% to 99% of a solvent. The solvent has a boiling point lower than or equal to 150 C. The conductive ink provided in the present application includes the organic conductive material and the solvent. Since the solvent having a boiling point lower than or equal to 150 C., the conductive ink of the present application not only dries quickly during coating and has high production efficiency, but also forms a transparent conductive film layer that is uniform, flat, and dense, and has good product quality.