The present invention relates to a hydrochromic polydiacetylene composite composition, a hydrochromic thin film using same, and a use thereof, and more specifically, to a hydrochromic polydiacetylene composite composition reacting sensitively to moisture, providing the hydrochromic thin film using same, and to applying same to biorecognition or fingerprint recognition. According to the present invention, moisture secreted from a fingerprint or pores on the skin can be detected with high sensitivity. Thus, the position of pores unique to a fingerprint of an organism can be amplified and displayed through selective color change and fluorescent change patterns exhibited when moisture is absorbed.

The present invention provides a compound for forming an organic film which has a minimum complex viscosity of 10 Pa.Math.s or less when the complex viscosity is measured within a range of 50 C. to 300 C. This compound for forming an organic film can provide an organic film composition having high filling and planarizing properties.

The present invention provides a compound for forming an organic film which has a minimum complex viscosity of 10 Pa.Math.s or less when the complex viscosity is measured within a range of 50 C. to 300 C. This compound for forming an organic film can provide an organic film composition having high filling and planarizing properties.

A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

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A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

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Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

An aqueous inkjet ink comprises a compound functionalized with at least two functional groups selected from the group consisting of a primary amine and a secondary amine, a colorant and a polymeric particle comprising an oligomer or polymer having at least 3 repeating units comprising a functional group according to general formula I, II or III general formula I general formula II general formula III ##STR00001##

An aqueous inkjet ink comprises a compound functionalized with at least two functional groups selected from the group consisting of a primary amine and a secondary amine, a colorant and a polymeric particle comprising an oligomer or polymer having at least 3 repeating units comprising a functional group according to general formula I, II or III general formula I general formula II general formula III ##STR00001##