To provide a composition for powder coating material capable of forming a coating film having excellent water and oil repellency, capable of maintaining excellent water and oil repellency even when the surface is rubbed or when used in an environment in contact with water, and having excellent resistance to adhesion of organisms such that organisms such as mold, algae, etc. are less likely to adhere thereto; a powder coating material; and a coated article. The composition for powder coating material comprises polymer (A) composed of at least one member selected from polymer (A1) and polyvinylidene fluoride, and polymer (B). The polymer (A1) is a fluorinated non-block copolymer having units based on a fluoroolefin and units based on a monomer having a crosslinkable group. The polymer (B) is a fluorinated block copolymer having a segment (α) in which the content of fluorine atoms is at least 20 mass %, and a segment (β) in which the content of fluorine atoms is less than 20 mass %, wherein the difference in the numerical value of the content of the fluorine atoms represented by mass %, between in the segment (α) and in the segment (β) is at least 10, and at least one of the segment (α) and the segment (β) has a hydroxy group.

The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R″ represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.

##STR00001##

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R″ represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.

##STR00001##

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.

Polymer particles having a multi-block vinylic polymer attached to their surface are disclosed. The particles can be used in a variety of purification and detection methods.

A pattern-forming method includes forming on one face side of a substrate, a directed self-assembling film, and removing a part of the directed self-assembling film. The directed self-assembling film is formed from a composition including a block copolymer and a solvent. The block copolymer includes a first block composed of a first repeating unit that includes a silicon atom, a second block composed of a second repeating unit that does not include a silicon atom, and a first group that bonds to at least one end of a main chain and links to the first block. The first group is a monovalent group that forms a compound having ClogP of no less than 2.4 provided that a methyl group is bonded to an atom on a side of the main chain. The first group does not comprise a hetero atom.

A pattern-forming method includes forming on one face side of a substrate, a directed self-assembling film, and removing a part of the directed self-assembling film. The directed self-assembling film is formed from a composition including a block copolymer and a solvent. The block copolymer includes a first block composed of a first repeating unit that includes a silicon atom, a second block composed of a second repeating unit that does not include a silicon atom, and a first group that bonds to at least one end of a main chain and links to the first block. The first group is a monovalent group that forms a compound having ClogP of no less than 2.4 provided that a methyl group is bonded to an atom on a side of the main chain. The first group does not comprise a hetero atom.