Patent classifications
C09D169/00
Solvent free textile coating
The description relates to solvent free films and textiles that receive the solvent free films.
SINTERABLE METAL PASTE FOR USE IN ADDITIVE MANFACTURING
A material and method are disclosed such that the material can be used to form functional metal pieces by producing an easily sintered layered body of dried metal paste. On a microstructural level, when dried, the metal paste creates a matrix of porous metal scaffold particles with infiltrant metal particles, which are positioned interstitially in the porous scaffold's interstitial voids. For this material to realize mechanical and processing benefits, the infiltrant particles are chosen such that they pack in the porous scaffold piece in a manner which does not significantly degrade the packing of the scaffold particles and so that they can also infiltrate the porous scaffold on heating. The method of using this paste provides a technique deposition/removal process.
SINTERABLE METAL PASTE FOR USE IN ADDITIVE MANFACTURING
A material and method are disclosed such that the material can be used to form functional metal pieces by producing an easily sintered layered body of dried metal paste. On a microstructural level, when dried, the metal paste creates a matrix of porous metal scaffold particles with infiltrant metal particles, which are positioned interstitially in the porous scaffold's interstitial voids. For this material to realize mechanical and processing benefits, the infiltrant particles are chosen such that they pack in the porous scaffold piece in a manner which does not significantly degrade the packing of the scaffold particles and so that they can also infiltrate the porous scaffold on heating. The method of using this paste provides a technique deposition/removal process.
Powder bed fusion material and method
##STR00001##
A particulate material for powder bed fusion has specific particle size characteristics and includes a thermoplastic and a sulfonate salt having the structure (A), wherein Z is a phosphorus atom or a nitrogen atom; each occurrence of X is independently halogen or hydrogen provided that at least one X is halogen; b, d, and e are integers from zero to 12; c is 0 or 1 provided that when c is 1, d and e are not both zero; R.sup.11_13 are each independently C.sub.1-C.sub.12 hydrocarbyl; R.sup.14 is C.sub.1-C.sub.18 hydrocarbyl; and Y is selected from (B)—wherein R.sup.15 is hydrogen or C.sub.1-C.sub.12 hydrocarbyl. Also described is a method of powder bed fusion utilizing the particulate material.
Powder bed fusion material and method
##STR00001##
A particulate material for powder bed fusion has specific particle size characteristics and includes a thermoplastic and a sulfonate salt having the structure (A), wherein Z is a phosphorus atom or a nitrogen atom; each occurrence of X is independently halogen or hydrogen provided that at least one X is halogen; b, d, and e are integers from zero to 12; c is 0 or 1 provided that when c is 1, d and e are not both zero; R.sup.11_13 are each independently C.sub.1-C.sub.12 hydrocarbyl; R.sup.14 is C.sub.1-C.sub.18 hydrocarbyl; and Y is selected from (B)—wherein R.sup.15 is hydrogen or C.sub.1-C.sub.12 hydrocarbyl. Also described is a method of powder bed fusion utilizing the particulate material.
Coating composition excellent in abrasion resistance
The present invention is a coating composition containing (A) a fluorine-containing copolymer and (B) a polycarbonate diol.
ANTIBACTERIAL AND/OR ANTIFOULING POLYMERS
The present disclosure provides a copolymer comprising monomer units represented by formulas (I) and/or (II) as disclosed and defined herein which are useful in antibacterial and/or antifouling coatings. The present disclosure further provides methods of synthesizing said copolymers.
ANTIBACTERIAL AND/OR ANTIFOULING POLYMERS
The present disclosure provides a copolymer comprising monomer units represented by formulas (I) and/or (II) as disclosed and defined herein which are useful in antibacterial and/or antifouling coatings. The present disclosure further provides methods of synthesizing said copolymers.
THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK COPOLYMERS
A high-chi diblock copolymer (BCP) for self-assembly comprises a first block comprising repeat units of trimethylsilyl styrene (TMSS) and styrene, and a second block comprising an aliphatic carbonate repeat unit. The blocks are linked together by a fluorinated junction group L′ in which none of the fluorines of L′ are covalently bound to an atomic center of the polymer backbone. A top-coat free film layer comprising the BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented lamellar domain pattern on an underlayer that is preferential or non-preferential to the domains of the block copolymer. The domain pattern can be selectively etched to provide a relief pattern comprising a remaining domain. The relief pattern having good critical dimensional uniformity compared to an otherwise identical polymer lacking the silicon.
THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK COPOLYMERS
A high-chi diblock copolymer (BCP) for self-assembly comprises a first block comprising repeat units of trimethylsilyl styrene (TMSS) and styrene, and a second block comprising an aliphatic carbonate repeat unit. The blocks are linked together by a fluorinated junction group L′ in which none of the fluorines of L′ are covalently bound to an atomic center of the polymer backbone. A top-coat free film layer comprising the BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented lamellar domain pattern on an underlayer that is preferential or non-preferential to the domains of the block copolymer. The domain pattern can be selectively etched to provide a relief pattern comprising a remaining domain. The relief pattern having good critical dimensional uniformity compared to an otherwise identical polymer lacking the silicon.