A polarizing film, comprising a polarizer, and a transparent protective film laminated on/over at least one surface of the polarizer to interpose an adhesive layer between the surface and the transparent protective film, and the polarizing film comprising, on/over the adhesion surface of the polarizer, an adhesion-improving layer interposed between the polarizer and the adhesive layer. The adhesion-improving layer preferably comprises a compound represented by the following general formula (1): ##STR00001##
wherein X is a functional group containing a reactive group, and R.sup.1 and R.sup.2 each independently represent a hydrogen atom, or an aliphatic hydrocarbon group, aryl group or heterocyclic group that may have a substituent, and the compound represented by the general formula (1) is interposed between the polarizer and the adhesive layer.

A polarizing film, comprising a polarizer, and a transparent protective film laminated on/over at least one surface of the polarizer to interpose an adhesive layer between the surface and the transparent protective film, and the polarizing film comprising, on/over the adhesion surface of the polarizer, an adhesion-improving layer interposed between the polarizer and the adhesive layer. The adhesion-improving layer preferably comprises a compound represented by the following general formula (1): ##STR00001##
wherein X is a functional group containing a reactive group, and R.sup.1 and R.sup.2 each independently represent a hydrogen atom, or an aliphatic hydrocarbon group, aryl group or heterocyclic group that may have a substituent, and the compound represented by the general formula (1) is interposed between the polarizer and the adhesive layer.

A polymetalloxane including structural units represented by formulae (1-1) and (1-2), and having a weight-average molecular weight of 30,000 or more and 2,000,000 or less;

##STR00001## wherein, M.sup.1 and M.sup.2 independently represent different metal atoms; L.sup.1 and L.sup.2 are each independently a group selected from the group consisting of an allyloxy group, an aryloxy group, and a trialkylsiloxy group; L.sup.1 and L.sup.2 may be the same or different, and at least one thereof is an allyloxy group or an aryloxy group; R.sup.1 and R.sup.2 are each independently a hydrogen atom, a C.sub.1-12 alkyl group, or a group having a metalloxane bond; m is an integer that represents the valence of the metal atom M.sup.1, and a is an integer of 1 to (m2); and n is an integer that represents the valence of the metal atom M.sup.2, and b is an integer of 1 to (n2).

A polymetalloxane including structural units represented by formulae (1-1) and (1-2), and having a weight-average molecular weight of 30,000 or more and 2,000,000 or less;

##STR00001## wherein, M.sup.1 and M.sup.2 independently represent different metal atoms; L.sup.1 and L.sup.2 are each independently a group selected from the group consisting of an allyloxy group, an aryloxy group, and a trialkylsiloxy group; L.sup.1 and L.sup.2 may be the same or different, and at least one thereof is an allyloxy group or an aryloxy group; R.sup.1 and R.sup.2 are each independently a hydrogen atom, a C.sub.1-12 alkyl group, or a group having a metalloxane bond; m is an integer that represents the valence of the metal atom M.sup.1, and a is an integer of 1 to (m2); and n is an integer that represents the valence of the metal atom M.sup.2, and b is an integer of 1 to (n2).

The present invention relates to a composition comprising; components a. c. and d; and optional component b. wherein, component a. is a metal compound having the structure (I), optional component b., is a polyol additive, having structure (VI), component c. is a high performance polymer additive, and component d. is a solvent. The present invention further relates to using this compositions in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.

##STR00001##

The present invention relates to a composition comprising; components a. c. and d; and optional component b. wherein, component a. is a metal compound having the structure (I), optional component b., is a polyol additive, having structure (VI), component c. is a high performance polymer additive, and component d. is a solvent. The present invention further relates to using this compositions in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.

##STR00001##

This gel-form composition contains (A) an organoalkoxysilane of the following formula and/or a partially hydrolyzed condensate of the organoalkoxysilane, R.sup.1.sub.aSi(OR.sup.2).sub.4-a (R.sup.1 and R.sup.2 are monovalent hydrocarbon groups, and a is 1, 2, or 3), (B) an aluminum dicarboxylate of the following formula (R.sup.3COO).sub.2Al(OH) (R.sup.3 is a monovalent hydrocarbon group), (C) a C6-24 fatty acid, (D) a C6-30 dicarboxylic acid, and (E) an aluminum oligomer and/or aluminum alkoxide selected from aluminum oxide organoxides and aluminum oxide acylates. It is thereby possible to: obtain a water absorption inhibitor that imparts an excellent water absorption-inhibiting property to the surfaces of porous materials; and provide a method for imparting a water absorption-inhibiting property by applying the water absorption inhibitor to the surface of a porous material, and a porous material that is surface-treated by the water absorption inhibitor.

This gel-form composition contains (A) an organoalkoxysilane of the following formula and/or a partially hydrolyzed condensate of the organoalkoxysilane, R.sup.1.sub.aSi(OR.sup.2).sub.4-a (R.sup.1 and R.sup.2 are monovalent hydrocarbon groups, and a is 1, 2, or 3), (B) an aluminum dicarboxylate of the following formula (R.sup.3COO).sub.2Al(OH) (R.sup.3 is a monovalent hydrocarbon group), (C) a C6-24 fatty acid, (D) a C6-30 dicarboxylic acid, and (E) an aluminum oligomer and/or aluminum alkoxide selected from aluminum oxide organoxides and aluminum oxide acylates. It is thereby possible to: obtain a water absorption inhibitor that imparts an excellent water absorption-inhibiting property to the surfaces of porous materials; and provide a method for imparting a water absorption-inhibiting property by applying the water absorption inhibitor to the surface of a porous material, and a porous material that is surface-treated by the water absorption inhibitor.

A linear titanium-oxide polymer, a nano-TiO.sub.2 coating structure, a glass fiber mat-nano-TiO.sub.2 photocatalytic coating structure and methods for preparing the same are disclosed. The linear titanium-oxide polymer has the following structural formula:

##STR00001##

The prepared materials can be used for photocatalysis, deodorizing filters, antibacterial filters, indoor air purifying filters, transport vehicle purifying filters, and household appliance purifiers and so on.

A liquid silicone-based composition for forming a coating, the composition comprising a silazane, an organometallic compound, an alkoxysilane, and an aprotic solvent, wherein when applied to a substrate the liquid composition cures to form a quasi-ceramic coating under ambient conditions.