A film cleaning solution that contains a solvent and a metal removing agent, in which two or more kinds of the solvents are contained, and a distance between a Hansen solubility parameter of the film cleaning solution and a Hansen solubility parameter of dimethylacetamide is 1.0 or less.

An aqueous cleaning liquid including hydrofluoric acid and tetradecylphosphonic acid, and a method of cleaning an electronic device, contacting the electronic device with the aqueous cleaning liquid.

A novel hydrochlorofluoroolefin-based composition contains Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water. In the composition, the proportions of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water are 55.00 mass % to 99.98 mass %, 0.01 mass % to 44.99 mass %, and 0.01 mass % to 10.00 mass %, respectively, with respect to the total amount of Z-1-chloro-3,3,3-trifluoropropene, 1-chloro-1,3,3,3-tetrafluoropropane, and water.

A means capable of sufficiently removing residues remaining on the surface of a polished object is to be provided. The present invention relates to a surface treatment composition, containing a component (A) and a component (B) and having pH of 8.0 or more: component (A): a polymer having a constituent unit having a quaternary nitrogen-containing onium salt or a constituent unit of a structure (X) below, ##STR00001## component (B): a buffer represented by a formula: RCOONH.sub.4.sup.+.