Provided in one embodiment is a method of identifying a stable phase of an ordering binary alloy system comprising a solute element and a solvent element, the method comprising: determining at least three thermodynamic parameters associated with grain boundary segregation, phase separation, and intermetallic compound formation of the ordering binary alloy system; and identifying the stable phase of the ordering binary alloy system based on the first thermodynamic parameter, the second thermodynamic parameter and the third thermodynamic parameter by comparing the first thermodynamic parameter, the second thermodynamic parameter and the third thermodynamic parameter with a predetermined set of respective thermodynamic parameters to identify the stable phase; wherein the stable phase is one of a stable nanocrystalline phase, a metastable nanocrystalline phase, and a non-nanocrystalline phase.

A medical device and a method and process for at least partially forming a medical device, which medical device has improved physical properties.

A medical device and a method and process for at least partially forming a medical device, which medical device has improved physical properties.

A medical device and a method and process for at least partially forming a medical device, which medical device has improved physical properties. The one or more improved physical properties of the novel metal alloy can be achieved in the medical device without having to increase the bulk, volume and/or weight of the medical device.

Provided is a master alloy for a sputtering target, wherein, when elements constituting the master alloy are following X1, X2, Y1, Y2, Y2, and Y3; specifically, where X1 is one or two types of Ta or W; X2 is at least one type of Ru, Mo, Nb or Hf; Y1 is one or two types of Cr or Mn; Y2 is one or two types of Co or Ni; and Y3 is one or two types of Ti or V, the master alloy comprises any one combination of X1-Y1, X1-Y2, X1-Y3, X2-Y1, and X2-Y2 of the foregoing constituent elements. The present invention consequently yields superior effects of being able to obtain a sintered sputtering target with few defects and having a high-density and uniform alloy composition, and, by using this target, to realize the deposition of an alloy barrier film with uniform quality and few particles at a high speed.

Provided is a master alloy for a sputtering target, wherein, when elements constituting the master alloy are following X1, X2, Y1, Y2, Y2, and Y3; specifically, where X1 is one or two types of Ta or W; X2 is at least one type of Ru, Mo, Nb or Hf; Y1 is one or two types of Cr or Mn; Y2 is one or two types of Co or Ni; and Y3 is one or two types of Ti or V, the master alloy comprises any one combination of X1-Y1, X1-Y2, X1-Y3, X2-Y1, and X2-Y2 of the foregoing constituent elements. The present invention consequently yields superior effects of being able to obtain a sintered sputtering target with few defects and having a high-density and uniform alloy composition, and, by using this target, to realize the deposition of an alloy barrier film with uniform quality and few particles at a high speed.

A collimator for x-ray, gamma, or particle radiation has a plurality of collimator elements made of a tungsten-containing material to reduce scattered radiation. At least one collimator element consists of a tungsten alloy having a tungsten content of 72 to 98 wt.-%, which contains 1 to 14 wt.-% of at least one metal of the group Mo, Ta, Nb and 1 to 14 wt.-% of at least one metal of the group Fe, Ni, Co, Cu. The collimator also has very homogeneous absorption behavior at very thin wall thicknesses of the collimator elements.

A collimator for x-ray, gamma, or particle radiation has a plurality of collimator elements made of a tungsten-containing material to reduce scattered radiation. At least one collimator element consists of a tungsten alloy having a tungsten content of 72 to 98 wt.-%, which contains 1 to 14 wt.-% of at least one metal of the group Mo, Ta, Nb and 1 to 14 wt.-% of at least one metal of the group Fe, Ni, Co, Cu. The collimator also has very homogeneous absorption behavior at very thin wall thicknesses of the collimator elements.

A method and process for at least partially forming a medical device which improves the physical properties of the medical device.

A method and process for at least partially forming a medical device which improves the physical properties of the medical device.