Device and method for injection moulding a metal alloy intended for manufacturing at least one part made of an amorphous metal alloy or metallic glass, wherein: an injection mould (2) delimits a cavity that has a receiving face (4) and a frontal moulding face (5) opposite the receiving face, at least one sacrificial shaping insert (7) is placed in said cavity and has a rear face (8), at least one contact zone of which is adjacent to at least one contact zone of said receiving face of the cavity and a front face (9) that is situated opposite said moulding face of the mould and provided with a recessed shape, and an injection piston (I I) is movable in a chamber (12) of the mould and communicates with the moulding impression.

Provided are a sputtering target that makes it possible to form a chalcogenide material film with enhanced heat resistance, a method of manufacturing the sputtering target, and a memory device manufacturing method. The sputtering target includes an alloy containing a first component containing arsenic and selenium and a second component containing at least one of boron and carbon.

A soft magnetic alloy including a compositional formula of ((Fe.sub.(1−(α+β))X1.sub.αX2.sub.β).sub.(1−(a+b+c+e))M.sub.aB.sub.bP.sub.cCu.sub.e).sub.1−fC.sub.f, wherein X1 is one or more selected from the group consisting Co and Ni, X2 is one or more selected from the group consisting of Al, Mn, Ag, Zn, Sn, As, Sb, Bi, N, O, and rare earth elements, “M” is one or more selected from the group consisting of Nb, Hf, Zr, Ta, Ti, Mo, W, and V, 0.030<a≤0.14, 0.028≤b≤0.20, 0≤c≤0.030, 0<e≤0.030, 0<f≤0.040, α≥0, β≥0, and 0≤α+β≤0.50 are satisfied.

A soft magnetic alloy including a compositional formula of ((Fe.sub.(1−(α+β))X1.sub.αX2.sub.β).sub.(1−(a+b+c+e))M.sub.aB.sub.bP.sub.cCu.sub.e).sub.1−fC.sub.f, wherein X1 is one or more selected from the group consisting Co and Ni, X2 is one or more selected from the group consisting of Al, Mn, Ag, Zn, Sn, As, Sb, Bi, N, O, and rare earth elements, “M” is one or more selected from the group consisting of Nb, Hf, Zr, Ta, Ti, Mo, W, and V, 0.030<a≤0.14, 0.028≤b≤0.20, 0≤c≤0.030, 0<e≤0.030, 0<f≤0.040, α≥0, β≥0, and 0≤α+β≤0.50 are satisfied.

Provided is a monatomic amorphous palladium, a method for preparing the same and use thereof. The method comprises a) loading a monatomic palladium powder on a silicon nitride substrate; b) heating the silicon nitride substrate loaded with the monatomic palladium powder obtained in a) up to a temperature of 800° C. to 1000° C. and keeping the temperature for at least 3 minutes; and c) cooling a system of palladium and silicon nitride obtained in b) to room temperature at an apparent cooling rate greater than 10.sup.3° C./second, thus obtaining the monatomic amorphous palladium.

An ultraflat and ultralow-friction metallic glass thin film is fabricated. The metallic glass thin film is a binary alloy, wherein a content of one metal element of the binary alloy is between 45 atomic % and 64 atomic %. The metallic glass thin film has an atomically smooth surface with a surface roughness R.sub.a less than 0.1 nm and a total height of profile R.sub.t less than 0.15 nm; the friction coefficient is below 1×10.sup.−2. Due to the metallic glass thin film being treated by ion bombardment, the metallic glass thin film is thermally ultrastable.

A magnesium-based bulk metallic glass composite includes a magnesium-based bulk metallic glass composite comprising a magnesium-based material and a TiZr alloy.

The present invention relates to an alloy which has the following composition:
Cu.sub.47at %−(x+y+z)(Ti.sub.aZr.sub.b).sub.cNi.sub.7at %+xSn.sub.1at %+ySi.sub.z
where c=43-47 at %, a=0.65-0.85, b=0.15-0.35, where a+b=1.00; x=0-7 at %; y=0-3 at %, z=0-3 at %, where y+z≤4 at %.

A soft magnetic alloy comprising a main component having a compositional formula of ((Fe.sub.(1−(α+β))X1.sub.αX2.sub.β).sub.(1−(a+b+c))M.sub.aB.sub.bCr.sub.c).sub.1−dC.sub.d, and a sub component including P, S and Ti, wherein X1 is selected from the group Co and Ni, X2 is selected from the group Al, Mn, Ag, Zn, Sn, As, Sb, Bi and rare earth elements, “M” is selected from the group Nb, Hf, Zr, Ta, Mo, W and V, 0.030≤a≤0.14, 0.005≤b≤0.20, 0<c≤0.040, 0≤d≤0.040, α≥0, β≥0, and 0≤α+β≤0.50 are satisfied, when soft magnetic alloy is 100 wt %, P is 0.001 to 0.050 wt %, S is 0.001 to 0.050 wt %, and Ti is 0.001 to 0.080 wt %, and when a value obtained by dividing P by S is P/S, then P/S satisfies 0.10≤P/S≤10.

A composition for an alloy according to an aspect of the present disclosure is a composition for an alloy having antimicrobial activity, and may contain a first component composed of Fe and Ni, a second component composed of one or more selected from the group consisting of Cr, Co, Mo, and Cu, and a third component composed of one or more selected from the group consisting of Si, B, and P.