A semiconductor manufacturing apparatus includes a process chamber. An insulating plate divides an interior space of the process chamber into a first space and a second space and thermally isolates the first space from the second space. A gas supplier is configured to supply a process gas to the first space. A radiator is configured to heat the first space. A stage is disposed within the second space and the stage is configured to support a substrate.

Methods and systems for forming films on substrates in semiconductor processes are disclosed. The method includes providing different materials each contained in separate ampoules. Material is flowed from each ampoule into a separate portion of a showerhead contained within a process chamber via a heated gas line. From the showerhead, each material is flowed on to a substrate that sits on the surface of a rotating pedestal. Controlling the mass flow rate out of the showerhead and the rotation rate of the pedestal helps result in films with desirable material domain sizes to be deposited on the substrate.

Methods and systems for forming films on substrates in semiconductor processes are disclosed. The method includes providing different materials each contained in separate ampoules. Material is flowed from each ampoule into a separate portion of a showerhead contained within a process chamber via a heated gas line. From the showerhead, each material is flowed on to a substrate that sits on the surface of a rotating pedestal. Controlling the mass flow rate out of the showerhead and the rotation rate of the pedestal helps result in films with desirable material domain sizes to be deposited on the substrate.

An ophthalmic substrate conveyor and method of conveying ophthalmic substrates for vacuum deposition utilizes gravity and impulse action energy to convey an ophthalmic substrate to an adjacent vacuum deposition machine, for coating the ophthalmic substrate with an ophthalmic substance through physical vapor deposition. The conveyor provides a spring-loaded lens wheel that selectively retains the ophthalmic substrate during coating. The lens wheel rides a pair of inclined rails, urged by gravity, to a vacuum deposition machine that coats HEV absorbing material onto ophthalmic substrate. An escapement mechanism subassembly transfers impulse action energy to the lens wheel to regulate the speed and direction of the lens wheel across the inclined rails. A rotation servomechanism senses and rotates the lens wheel to the desired orientation during coating. A ring spreader actuator engages springs in the lens wheel to clamp and release the ophthalmic substrate. A control unit regulates servomechanism and ring spreader actuator.

An ophthalmic substrate conveyor and method of conveying ophthalmic substrates for vacuum deposition utilizes gravity and impulse action energy to convey an ophthalmic substrate to an adjacent vacuum deposition machine, for coating the ophthalmic substrate with an ophthalmic substance through physical vapor deposition. The conveyor provides a spring-loaded lens wheel that selectively retains the ophthalmic substrate during coating. The lens wheel rides a pair of inclined rails, urged by gravity, to a vacuum deposition machine that coats HEV absorbing material onto ophthalmic substrate. An escapement mechanism subassembly transfers impulse action energy to the lens wheel to regulate the speed and direction of the lens wheel across the inclined rails. A rotation servomechanism senses and rotates the lens wheel to the desired orientation during coating. A ring spreader actuator engages springs in the lens wheel to clamp and release the ophthalmic substrate. A control unit regulates servomechanism and ring spreader actuator.

The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.

Provided are a substrate processing apparatus and a substrate processing method capable of achieving uniform trimming throughout an entire surface of a substrate. The substrate processing apparatus includes a gas channel including a center gas inlet and an additional gas inlet spaced apart from the center gas inlet, and a shower plate including a plurality of holes connected to the center gas inlet and the additional gas inlet, wherein a gas flow channel is formed having a clearance defined by a lower surface of the gas channel and an upper surface of the shower plate, the lower surface and the upper surface being substantially parallel.

Provided are a substrate processing apparatus and a substrate processing method capable of achieving uniform trimming throughout an entire surface of a substrate. The substrate processing apparatus includes a gas channel including a center gas inlet and an additional gas inlet spaced apart from the center gas inlet, and a shower plate including a plurality of holes connected to the center gas inlet and the additional gas inlet, wherein a gas flow channel is formed having a clearance defined by a lower surface of the gas channel and an upper surface of the shower plate, the lower surface and the upper surface being substantially parallel.

A device comprising: a substrate; a first coating deposited on the substrate; an intermediate coating deposited on the first coating, wherein the first coating is interposed between the substrate and the intermediate coating; and a second coating deposited on the intermediate coating, wherein the intermediate coating is interposed between the first coating and the second coating, and the second coating is outermost and black. The substrate, the first coating, the intermediate coating and the second coating define at least one of a jewelry item and a component of a jewelry item.

A device comprising: a substrate; a first coating deposited on the substrate; an intermediate coating deposited on the first coating, wherein the first coating is interposed between the substrate and the intermediate coating; and a second coating deposited on the intermediate coating, wherein the intermediate coating is interposed between the first coating and the second coating, and the second coating is outermost and black. The substrate, the first coating, the intermediate coating and the second coating define at least one of a jewelry item and a component of a jewelry item.