Provided is a metal matrix nanocomposite comprising: (a) a metal or metal alloy as a matrix material; and (b) multiple graphene sheets that are dispersed in said matrix material, wherein said multiple graphene sheets are substantially aligned to be parallel to one another and are in an amount from 0.1% to 95% by volume based on the total nanocomposite volume; wherein the multiple graphene sheets contain single-layer or few-layer graphene sheets selected from pristine graphene, graphene oxide, reduced graphene oxide, graphene fluoride, graphene chloride, graphene bromide, graphene iodide, hydrogenated graphene, nitrogenated graphene, doped graphene, chemically functionalized graphene, or a combination thereof and wherein the chemically functionalized graphene is not graphene oxide. The metal matrix exhibits a combination of exceptional tensile strength, modulus, thermal conductivity, and/or electrical conductivity.

The substrate for a printed circuit board according to an embodiment of the present invention includes a base film having insulating properties, and a metal layer stacked on at least one surface of the base film, in which the base film includes a portion where a transition metal in group 10 of the periodic table is present. The transition metal in group 10 is preferably nickel or palladium. The portion where the transition metal in group 10 is present preferably includes a region having an average thickness of 500 nm and extending from an interface with the metal layer.

The substrate for a printed circuit board according to an embodiment of the present invention includes a base film having insulating properties, and a metal layer stacked on at least one surface of the base film, in which the base film includes a portion where a transition metal in group 10 of the periodic table is present. The transition metal in group 10 is preferably nickel or palladium. The portion where the transition metal in group 10 is present preferably includes a region having an average thickness of 500 nm and extending from an interface with the metal layer.

The disclosure provides a method for generating a metallic coating on a substrate using a mixture comprising a precursor compound typically of chromium oxide, a chemical agent typically comprising NH.sub.z, and an inert transport fluid. The precursor compound and chemical agent are generally in the form of particulates having mean diameters less than about 100 microns, and the transport fluid is present in an amount sufficient to facilitate application of the mixture to a substrate. The mixture is applied to a substrate and the coated substrate is heated to a temperature exceeding the decomposition temperature of the chemical agent, generating a reducing gas typically comprising CO, H.sub.x, and/or NH.sub.x. In a particular embodiment, the precursor compound is CrO.sub.2, Cr.sub.3O.sub.4, CrO, or mixtures thereof, the chemical agent is urea, and the coated substrate is placed in a reactor having an inert atmosphere and subjected to a temperature of about 700 C. for about 5 minutes while maintaining an inert gas flow through the reactor.

A processing system and method for depositing a film on a substrate by liquid phase ALD is disclosed in various embodiments. The method includes providing the substrate in a process chamber, spinning on the substrate a first reactant in a first liquid to form a self-limiting layer of the first reactant on the substrate, spinning on the substrate a second reactant in a second liquid, where the second reactant reacts with the self-limiting layer of the first reactant on the substrate to form a film on the substrate, and repeating the spinning steps at least once until the film has a desired thickness. Other embodiments of the invention further include rinsing the substrate to remove excess first and second reactants from the substrate, and heat-treating the substrate during and/or following the film deposition.

A processing system and method for depositing a film on a substrate by liquid phase ALD is disclosed in various embodiments. The method includes providing the substrate in a process chamber, spinning on the substrate a first reactant in a first liquid to form a self-limiting layer of the first reactant on the substrate, spinning on the substrate a second reactant in a second liquid, where the second reactant reacts with the self-limiting layer of the first reactant on the substrate to form a film on the substrate, and repeating the spinning steps at least once until the film has a desired thickness. Other embodiments of the invention further include rinsing the substrate to remove excess first and second reactants from the substrate, and heat-treating the substrate during and/or following the film deposition.

A superhydrophobic ceramic coating that is transparent and durable includes a dispersion of a multiplicity of silica nanoparticles stacked to form a topography that is rough that is infused with and conformally coated with a sol-gel glass matrix that has a fluoroalkyl silane or an alkyl silane monolayer on the surface of the coating. The silica nanoparticles do not scatter light to a large extent as they are sufficiently small and free of aggregation. The sol-gel glass is formed from a trialkoxysilane precursor and applied to the stacked silica nanoparticles to retain the rough topography of the deposited nanoparticles.

A superhydrophobic ceramic coating that is transparent and durable includes a dispersion of a multiplicity of silica nanoparticles stacked to form a topography that is rough that is infused with and conformally coated with a sol-gel glass matrix that has a fluoroalkyl silane or an alkyl silane monolayer on the surface of the coating. The silica nanoparticles do not scatter light to a large extent as they are sufficiently small and free of aggregation. The sol-gel glass is formed from a trialkoxysilane precursor and applied to the stacked silica nanoparticles to retain the rough topography of the deposited nanoparticles.

A method for creating a superhydrophobic coated nanoporous assembly includes the steps of: providing a nanoporous assembly formed of discrete and/or continuous structures that provide a morphology defining pores of less than 1 micron between neighboring discrete and continuous structures; bringing gaseous plasma precursors in the presence of the nanoporous assembly and in the presence of a plasma generator; employing the plasma generator to convert the gaseous plasma precursors to the plasma state; and permitting the plasma precursors to deposit as a coating on the nanoporous assembly through plasma polymerization techniques the deposition thereof preserving the porous structure of the nanoporous assembly, the deposited coating exhibiting a surface energy of less than 30 dynes/cm.

Disclosed are a probe sheet with a multi-layer contact tip and a method of manufacturing the same capable of improving the design freedom of a contact tip formed on a probe sheet of a probe card for testing a semiconductor device to come in contact with a pad of the semiconductor device. According to the present invention, the design freedom of a contact tip formed on a probe sheet of a probe card for testing a semiconductor device to come in contact with a pad of the semiconductor device can be improved, and since the shape of a contact surface of a contact tip is maintained the same and contact resistance is maintained in an allowable range even when a protective layer coated on the contact tip to increase durability of the contact tip is worn, test reliability of the probe card can be improved.