A highly reactive conversion coating chemistry is used during CAVF processing of high hardness steel alloys such as AMS 6509 and AMS 6517 steel alloys. This chemistry produces a hard, thin, black conversion coating that is not fully rubbed off by the media during the CAVF process. Distressed material regions on the surface of the alloys are not susceptible to forming the conversion coating and remain white. Visual inspection for the presence of such regions is facilitated.

A highly reactive conversion coating chemistry is used during CAVF processing of high hardness steel alloys such as AMS 6509 and AMS 6517 steel alloys. This chemistry produces a hard, thin, black conversion coating that is not fully rubbed off by the media during the CAVF process. Distressed material regions on the surface of the alloys are not susceptible to forming the conversion coating and remain white. Visual inspection for the presence of such regions is facilitated.

A method for chemical processing an internal cavity of an additive manufactured (AM) metal workpiece is disclosed in which a connector is provided in fluid connection with the internal cavity and a chemical polishing solution is flowed through the connector and the internal cavity to process the internal cavity to a desired finish.

A method for chemical processing an internal cavity of an additive manufactured (AM) metal workpiece is disclosed in which a connector is provided in fluid connection with the internal cavity and a chemical polishing solution is flowed through the connector and the internal cavity to process the internal cavity to a desired finish.

A method for fabricating a pellicle for EUV lithography processes includes placing a hard mask in contact with a surface of a substrate. In some embodiments, the hard mask is configured to pattern the surface of the substrate to include a first region and a second region surrounding the first region. By way of example, while the mask in positioned in contact with the substrate, an etch process of the substrate is performed to etch the first and second regions into the substrate. Thereafter, an excess substrate region is removed so as to separate the etched first region from the excess substrate region. In various embodiments, the etched and separated first region serves as a pellicle for an extreme ultraviolet (EUV) lithography process.

Provided herein are methods and compositions for chemical mechanical polishing (CMP) of metals. The present methods and compositions involve the use of a corrosion inhibitor having the general formula C.sub.mH.sub.2m+1(OCH.sub.2CH.sub.2).sub.n-L-R in the CMP slurry composition, where m is an integer between 6 and 11, inclusive of end points, and n is an integer greater than or equal to 6, L is a bond, O, S, R.sup.1, SR.sup.1, or OR.sup.1, where R.sup.1 is a C.sub.1-4 alkylene; and R is an anionic group. The present methods and compositions can be used to achieve a high metal removal rate, while effectively inhibiting metal corrosion during CMP, and are particularly useful for CMP of cobalt (Co).

Provided herein are methods and compositions for chemical mechanical polishing (CMP) of metals. The present methods and compositions involve the use of a corrosion inhibitor having the general formula C.sub.mH.sub.2m+1(OCH.sub.2CH.sub.2).sub.n-L-R in the CMP slurry composition, where m is an integer between 6 and 11, inclusive of end points, and n is an integer greater than or equal to 6, L is a bond, O, S, R.sup.1, SR.sup.1, or OR.sup.1, where R.sup.1 is a C.sub.1-4 alkylene; and R is an anionic group. The present methods and compositions can be used to achieve a high metal removal rate, while effectively inhibiting metal corrosion during CMP, and are particularly useful for CMP of cobalt (Co).

A highly reactive conversion coating chemistry is used during CAVF processing of high hardness steel alloys such as AMS 6509 and AMS 6517 steel alloys. This chemistry produces a hard, thin, black conversion coating that is not fully rubbed off by the media during the CAVF process. Distressed material regions on the surface of the alloys are not susceptible to forming the conversion coating and remain white. Visual inspection for the presence of such regions is facilitated.

A highly reactive conversion coating chemistry is used during CAVF processing of high hardness steel alloys such as AMS 6509 and AMS 6517 steel alloys. This chemistry produces a hard, thin, black conversion coating that is not fully rubbed off by the media during the CAVF process. Distressed material regions on the surface of the alloys are not susceptible to forming the conversion coating and remain white. Visual inspection for the presence of such regions is facilitated.

Representative implementations of techniques, methods, and formulary provide repairs to processed semiconductor substrates, and associated devices, due to erosion or dishing of a surface of the substrates. The substrate surface is etched until a preselected portion of one or more embedded interconnect devices protrudes above the surface of the substrate. The interconnect devices are wet etched with a selective etchant, according to a formulary, for a preselected period of time or until the interconnect devices have a preselected height relative to the surface of the substrate. The formulary includes one or more oxidizing agents, one or more organic acids, and glycerol, where the one or more oxidizing agents and the one or more organic acids are each less than 2% of formulary and the glycerol is less than 10% of the formulary.