Methods of additive manufacturing are described herein. In one aspect, a method of printing an article comprises (a) selectively depositing an initial layer of transition metal or transition metal oxide on a substrate, and (b) at least partially replacing the initial layer of transition metal or transition metal oxide with a noble metal layer via a galvanic replacement reaction. In step (c), an additional layer of transition metal or transition metal oxide is deposited on the noble metal layer, and in step (d), the additional layer of transition metal or transition metal oxide is at least partially replaced with an additional noble metal layer via a galvanic replacement reaction. Steps (c) and (d) are repeated until the article is completed. In some embodiments, the article is subsequently separated from the substrate and can be coupled to a secondary substrate.

A method and system for electrodeposition of high-sp3 diamond/DLC by significantly increasing the sp3 carbon content of electrodeposited net-shape diamond, and use of same for manufacture of particulate and nanocrystalline diamond and composites.

Disclosed are an electrochromic element, device, and product, and a manufacturing method therefor. The electrochromic device (7) comprises: an electrochromic yarn (6), an ion storage yarn (18), and a power source (8), wherein the electrochromic yarn (6) contains a first flexible conductive yarn (5) and an electrochromic layer (4) coated on a surface layer of the first flexible conductive yarn (5); the ion storage yarn (18) contains a second flexible conductive yarn (1) and an ion storage layer (17) coated on a surface layer of the second flexible conductive yarn (1); and the first flexible conductive yarn (5) is electrically connected to a negative electrode of the power source (8), and the second flexible conductive yarn (1) is electrically connected to a positive electrode of the power source (8). The electrochromic device (7) can achieve a clear color development effect and make an electrochromic material have a good fastness. The preparation method is simple to operate and easily realizes industrial batch production.

A method of forming a cathode for hydrogen evolution reaction includes: (1) providing a substrate; (2) forming a precursor layer covering the substrate; and (3) annealing the precursor layer to form an electrocatalyst layer covering the substrate.

This Sn-plated steel sheet includes: a base plated steel sheet having a steel sheet, and a Sn-plated layer on at least one surface of the steel sheet; and a film layer which contains a zirconium oxide and a tin oxide and is positioned on the base plated steel sheet. An adhesion amount of Sn per surface of the Sn-plated steel sheet is 0.1 g/m.sup.2 or more and 15 g/m.sup.2 or less, an amount of the zirconium oxide in the film layer is in a range of 1 mg/m.sup.2 or more and 30 mg/m.sup.2 or less in terms of an amount of metal Zr, a peak position of a binding energy of Sn3d.sub.5/2 of the tin oxide by X-ray photoelectron spectroscopy in the film layer is within a range of 1.4 eV or more and less than 1.6 eV from a peak position of a binding energy of metal Sn, and a quantity of electricity required for reduction of the tin oxide is in a range of more than 5.0 mC/cm.sup.2 and 20 mC/cm.sup.2 or less.

A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.

A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.

Disclosed are an electrochromic element, device, and product, and a manufacturing method therefor. The electrochromic device (7) comprises: an electrochromic yarn (6), an ion storage yarn (18), and a power source (8), wherein the electrochromic yarn (6) contains a first flexible conductive yarn (5) and an electrochromic layer (4) coated on a surface layer of the first flexible conductive yarn (5); the ion storage yarn (18) contains a second flexible conductive yarn (1) and an ion storage layer (17) coated on a surface layer of the second flexible conductive yarn (1); and the first flexible conductive yarn (5) is electrically connected to a negative electrode of the power source (8), and the second flexible conductive yarn (1) is electrically connected to a positive electrode of the power source (8). The electrochromic device (7) can achieve a clear color development effect and make an electrochromic material have a good fastness. The preparation method is simple to operate and easily realizes industrial batch production.

A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.

A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.