Patent classifications
C25F1/00
Methods of leaching a superabrasive body and apparatuses and systems for the same
Embodiments of the invention relate to methods of removing interstitial constituents from superabrasive bodies using an ionic transfer medium, and systems and apparatuses for the same.
Methods of leaching a superabrasive body and apparatuses and systems for the same
Embodiments of the invention relate to methods of removing interstitial constituents from superabrasive bodies using an ionic transfer medium, and systems and apparatuses for the same.
Systems and methods for cleaning medical device electrodes
An electrode cleaning system includes a medical device including a plurality of electrodes, a fluid reservoir including an electrolytic solution, and a cleaning device. The cleaning device is electrically coupled to the medical device, and is configured to channel a DC current between at least one pair of electrodes of the plurality of electrodes when the plurality of electrodes are submerged in the fluid reservoir.
Systems and methods for cleaning medical device electrodes
An electrode cleaning system includes a medical device including a plurality of electrodes, a fluid reservoir including an electrolytic solution, and a cleaning device. The cleaning device is electrically coupled to the medical device, and is configured to channel a DC current between at least one pair of electrodes of the plurality of electrodes when the plurality of electrodes are submerged in the fluid reservoir.
CHAIN HAVING AN ELECTROLESS NICKEL COATING CONTAINING HARD PARTICLES
A method of applying a wear resistant surface to chain links and pins of a chain by the application of an electroless nickel coating containing hard particles. The coating reduces the friction on the chain links and associated chain components, such as pins, bushings, rockers and other components. The hard particles contained in the coating may be a carbide or nitride formed using the following elements: silicon, boron, chromium or vanadium. The coating may contain a combination of carbide or nitrides. The hard particles may additional include natural diamond and/or synthetic diamond like carbon (DLC) particles.
CHAIN HAVING AN ELECTROLESS NICKEL COATING CONTAINING HARD PARTICLES
A method of applying a wear resistant surface to chain links and pins of a chain by the application of an electroless nickel coating containing hard particles. The coating reduces the friction on the chain links and associated chain components, such as pins, bushings, rockers and other components. The hard particles contained in the coating may be a carbide or nitride formed using the following elements: silicon, boron, chromium or vanadium. The coating may contain a combination of carbide or nitrides. The hard particles may additional include natural diamond and/or synthetic diamond like carbon (DLC) particles.
METHOD OF REMOVING PARTICLES FROM AN ELECTRONIC COMPONENT
Particles are removed from electronic components, such as components of data storage devices by use of an electrochemical process. An electronic component is immersed in an electrochemical bath, and a voltage is applied across the +ve electrode and ve electrode in an amount sufficient to remove charged particles present on a surface of the electronic component.
METHOD OF REMOVING PARTICLES FROM AN ELECTRONIC COMPONENT
Particles are removed from electronic components, such as components of data storage devices by use of an electrochemical process. An electronic component is immersed in an electrochemical bath, and a voltage is applied across the +ve electrode and ve electrode in an amount sufficient to remove charged particles present on a surface of the electronic component.
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
Embodiments of the present disclosure generally relate to methods for conditioning an interior wall surface of a remote plasma generator. In one embodiment, a method for processing a substrate is provided. The method includes exposing an interior wall surface of a remote plasma source to a conditioning gas that is in excited state to passivate the interior wall surface of the remote plasma source, wherein the remote plasma source is coupled through a conduit to a processing chamber in which a substrate is disposed, and the conditioning gas comprises an oxygen-containing gas, a nitrogen-containing gas, or a combination thereof. The method has been observed to be able to improve dissociation/recombination rate and plasma coupling efficiency in the processing chamber, and therefore provides repeatable and stable plasma source performance from wafer to wafer.
Planar transformer components comprising electrophoretically deposited coating
Provided is an electrically insulated component for use in a planar transformer. The insulated component may include a planar transformer conductive component having a first surface, a second surface and a plurality of edges. The insulated component may also include a first layer including an oxidized metal coating, as well as a second layer including an electrophoretically deposited (EPD) insulating coating. The EDP coating may include a polymer and an inorganic material. The first layer and the second layer may cover at least the first surface and the plurality of edges of the conductive component and the first layer may be disposed between the conductive component and the second layer. Also provided is a method of manufacturing of the electrically insulated component.