A magnet coil for magnetic Czochralski single crystal growth includes: a first coil a second coil, and an auxiliary coil arranged between the first coil and the second coil. A distance between the first coil and a first edge of the auxiliary coil close to the first coil is equal to a distance between the second coil and a second edge of the auxiliary coil close to the second coil. The auxiliary coil, the first coil and the second coil have a common. When being energized, a direction of a current in the first coil is opposite to a direction of a current in the second coil, and a magnetic field generated by a current in the auxiliary coil is used for enhancing the a cusp magnetic field between the first coil and the second coil.

A method for manufacturing an ingot block in which an ingot of a silicon single crystal pulled up by a Czochralski process is cut and subjected to outer periphery grinding to manufacture an ingot block of the silicon single crystal, the method including: a step of measuring a radial center position of the ingot at one or more locations along a longitudinal direction of the ingot, a step of setting a reference position at which an offset amount of the measured radial center position of the ingot is equal to or less than a predetermined eccentricity amount, a step of cutting the ingot into the ingot blocks based on the set reference position, and a step of performing outer periphery grinding on each of the cut ingot blocks.

A single crystal silicon plate-shaped body as cut out from an upper portion of a straight body portion of a CZ method single crystal silicon ingot has an interstitial oxygen concentration in a crystal is 25 ppma to 45 ppma and a substitutional carbon concentration is 0.5 ppma or less in a radial center. In the radial center, oxygen precipitates are not observed in a bulk in an image of 200,000 times by a transmission electron microscope, and after heating the single crystal silicon plate-shaped body at 950° C. for 60 minutes, oxygen precipitates are observed in an image of the 200,000 times, and a shape of the oxygen precipitates is observed in a polyhedral structure in an image of 2,000,000 times.

A single crystal silicon plate-shaped body as cut out from an upper portion of a straight body portion of a CZ method single crystal silicon ingot has an interstitial oxygen concentration in a crystal is 25 ppma to 45 ppma and a substitutional carbon concentration is 0.5 ppma or less in a radial center. In the radial center, oxygen precipitates are not observed in a bulk in an image of 200,000 times by a transmission electron microscope, and after heating the single crystal silicon plate-shaped body at 950° C. for 60 minutes, oxygen precipitates are observed in an image of the 200,000 times, and a shape of the oxygen precipitates is observed in a polyhedral structure in an image of 2,000,000 times.

The present disclosure discloses a method for growing a crystal for detecting neutrons, gamma rays, and/or x rays. The method may include weighting reactants based on a molar ratio of the reactants according to a reaction equation (1-x-z)X.sub.2O.sub.3+SiO.sub.2+2xCeO.sub.2+zZ.sub.2O.sub.3.fwdarw.X.sub.2(1-x-z)Ce.sub.2xZ.sub.2zSiO.sub.5+x/2O.sub.2 or (1-x-y-z)X.sub.2O.sub.3+yY.sub.2O.sub.3+SiO.sub.2+2xCeO.sub.2+zZ.sub.2O.sub.3.fwdarw.X.sub.2(1-x-y-z)Y.sub.2yCe.sub.2xZ.sub.2zSiO.sub.5+x/2O.sub.2; placing the reactants on which a second preprocessing operation has been performed into a crystal growth device after an assembly processing operation is performed on at least one component of the crystal growth device; introducing a flowing gas into the crystal growth device after sealing the crystal growth device; and activating the crystal growth device to grow the crystal based on the Czochralski technique.

The present disclosure discloses a method for growing a crystal for detecting neutrons, gamma rays, and/or x rays. The method may include weighting reactants based on a molar ratio of the reactants according to a reaction equation (1-x-z)X.sub.2O.sub.3+SiO.sub.2+2xCeO.sub.2+zZ.sub.2O.sub.3.fwdarw.X.sub.2(1-x-z)Ce.sub.2xZ.sub.2zSiO.sub.5+x/2O.sub.2 or (1-x-y-z)X.sub.2O.sub.3+yY.sub.2O.sub.3+SiO.sub.2+2xCeO.sub.2+zZ.sub.2O.sub.3.fwdarw.X.sub.2(1-x-y-z)Y.sub.2yCe.sub.2xZ.sub.2zSiO.sub.5+x/2O.sub.2; placing the reactants on which a second preprocessing operation has been performed into a crystal growth device after an assembly processing operation is performed on at least one component of the crystal growth device; introducing a flowing gas into the crystal growth device after sealing the crystal growth device; and activating the crystal growth device to grow the crystal based on the Czochralski technique.

The present disclosure discloses a method for growing a crystal with a short decay time. According to the method, a new single crystal furnace and a temperature field device are adapted and a process, a ration of reactants, and growth parameters are adjusted and/or optimized, accordingly, a crystal with a short decay time, a high luminous intensity, and a high luminous efficiency can be grown without a co-doping operation.

A method may include bonding a deformable bounding element to a structural support element in which the deformable bounding element and a cavity-adjacent side of the structural support element define a cavity. The method may further include filling the cavity with a deformable medium by injecting the deformable medium past a cavity-opposite side of the structural support element and toward the cavity-adjacent side of the structural support element. The method may additionally include sealing an entry point of the injection of the deformable medium into the cavity. Various other apparatuses, systems, and methods are also disclosed.

The present invention relates to an apparatus for continuously growing an ingot, and more particularly to an apparatus for continuously growing an ingot which is capable of melting a silicon material in a solid state by means of an induction heating method, and supplying the molten silicon material to a main crucible. The apparatus for continuously growing an ingot according to an aspect of the present invention for this purpose includes a growth furnace in which a main crucible where silicon in a molten state is accommodated is located therein to form an ingot; a material supply part for supplying a silicon material in a solid state before the silicon in a molten state is melted; and a preliminary melting part including a preliminary crucible for melting the silicon material in a solid state which is supplied from the material supply part, a heating space in which the preliminary crucible can be heated, and a preliminary crucible heating module for heating the preliminary crucible by an induction heating method, wherein the silicon in a molten state in the preliminary crucible can be directly supplied to the main crucible.

A system for extracting liquid is provided. The system includes a vacuum source and a nozzle having a wettable plunger and a vacuum tube connected in flow communication with the vacuum source. When the plunger is partly submerged in the liquid and the vacuum source is actuated to initiate a flow of gas through the vacuum tube, droplets of the liquid separate from at least a portion of the unsubmerged part of the plunger and become suspended in the gas flow. The system also includes a cooling structure positioned adjacent to the vacuum tube to facilitate solidifying the droplets suspended in the gas flowing through the vacuum tube.