According to the sewing system of the present embodiment, the sewing machine and the robot arm are fixedly supported at the fixed positions by the base. Therefore, when a target position of the robot arm for the sewing operation is set once, a relative positional relation between the robot arm and the sewing machine is kept by the base even though the sewing system is entirely moved. Therefore, it is not necessary to again perform a setting operation of the target position for the sewing operation, so that the burdens on the teaching operation and the other setting operations are reduced.

According to the sewing system of the present embodiment, the sewing machine and the robot arm are fixedly supported at the fixed positions by the base. Therefore, when a target position of the robot arm for the sewing operation is set once, a relative positional relation between the robot arm and the sewing machine is kept by the base even though the sewing system is entirely moved. Therefore, it is not necessary to again perform a setting operation of the target position for the sewing operation, so that the burdens on the teaching operation and the other setting operations are reduced.

A manufacturing method of a trim cover surface material, includes: providing a jig including a first frame configured to hold an outer periphery of an outer material and a second frame configured to hold an outer periphery of a wadding material by overlapping the wadding material on the outer material which is held by the first frame; holding the outer periphery of the outer material with the first frame of the jig; forming through holes at the outer material which is held by the jig; holding the outer periphery of the wadding material with the second frame of the jig while the outer material is held by the first frame of the jig; and forming stitches at the outer material and the wadding material which are overlapped and held by the jig.

The present invention provides a sewing machine enabling to sew a high-quality pattern without using an embroidery frame. In a sewing machine 1, a pattern is sewn while a fabric 100 is fed in a sewing direction by a feed dog 2a. The sewing machine 1 has a fabric guide 14. The fabric guide 14 has a guide portion 16 which extends straight in a sewing direction to serve as a basis of a cloth feed in an amplitude direction of the needle. The carriage 10 makes the fabric guide 14 slide in the amplitude direction of the needle by a predetermined distance. Thus, the guide portion 16 serves as an index of the position of the fabric 100 to be located for sewing the next pattern line. Since the fabric 100 can be accurately located for sewing the next pattern line, high-quality pattern can be sewn.

Various examples are provided related to attachment of bands such as, e.g., collar or neck bands, sleeve bands, wrist bands, waist bands and ankle bands, etc. to a garment opening. In one example, among others, a band can be attached to a garment by loading the band between rollers in a joining position, positioning an opening of a garment extending between control surface mandrels over the band, and attaching the band to the garment along the edge of the opening.

Disclosed is a guiding apparatus for use with a machine to facilitate performing an action along a self-guided path on a substrate. The guiding apparatus may include a support member configured to be attached to at least a portion of the machine. Further, the guiding apparatus may include one or more of lighting units, optical sensors, controllers, and user interface components, mounted on the support member, configured to identify an object, obtain position of the object on a substrate and perform an action along a self-guided path in association with that object on the substrate.

Disclosed is a guiding apparatus for use with a machine to facilitate performing an action along a self-guided path on a substrate. The guiding apparatus may include a support member configured to be attached to at least a portion of the machine. Further, the guiding apparatus may include one or more of lighting units, optical sensors, controllers, and user interface components, mounted on the support member, configured to identify an object, obtain position of the object on a substrate and perform an action along a self-guided path in association with that object on the substrate.

Provided is a method for preparing sewing guide patterns suitable for constructing groups of patchwork components used in quilting. A rectangular sewing guide outer perimeter exactly includes either two or four congruent instances of rectangular, right-angle triangle or isosceles triangle patchwork components. A nested series of additional sewing guide elements are placed inside the rectangle where the points of each element are placed at the midpoints of the sides of the previous element. The number of elements is selected in consideration of aesthetic objectives. Final sewing guide patterns are prepared by adding a space equal to two times a seam allowance between each of the shared sides of the contiguous instances of the patchwork components in the rectangle and added elements. The pattern is suitable for assembling a plurality of patchwork components by methods known in the art as foundation piecing. The components are released by cutting between the added spaces.

Provided is a method for preparing sewing guide patterns suitable for constructing groups of patchwork components used in quilting. A rectangular sewing guide outer perimeter exactly includes either two or four congruent instances of rectangular, right-angle triangle or isosceles triangle patchwork components. A nested series of additional sewing guide elements are placed inside the rectangle where the points of each element are placed at the midpoints of the sides of the previous element. The number of elements is selected in consideration of aesthetic objectives. Final sewing guide patterns are prepared by adding a space equal to two times a seam allowance between each of the shared sides of the contiguous instances of the patchwork components in the rectangle and added elements. The pattern is suitable for assembling a plurality of patchwork components by methods known in the art as foundation piecing. The components are released by cutting between the added spaces.

Various examples are provided related to transporting and sewing material in, e.g., automation of sewing robots. Multiple pieces of layered materials can be transported on a flat planar surface while maintaining the material layer's position and orientation relative to one another during a sewing procedure of these materials along any arbitrary seam shape. In one example, among others, a system includes a sewing machine including a sewing needle, a material holding assembly and a translation system. The material holding assembly can include mechanical fingers that can contact material on a sewing plane adjacent to the sewing needle and a structural grounding system supporting the mechanical fingers. The translation system can reposition the material on the sewing plane via the mechanical fingers. Clearance around the sewing needle can be provided by repositioning individual mechanical fingers around the sewing needle.