Patent classifications
D05B21/00
3-dimensional vision system for stitching along a predetermined path
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate 3-dimensional vision systems that may enable operations on non-flat objects and paths. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
3-dimensional vision system for stitching along a predetermined path
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate 3-dimensional vision systems that may enable operations on non-flat objects and paths. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Adaptive apparatus for transporting and sewing material along arbitrary seam shapes
Various examples are provided related to transporting and sewing material in, e.g., automation of sewing robots. Multiple pieces of layered materials can be transported on a flat planar surface while maintaining the material layer's position and orientation relative to one another during a sewing procedure of these materials along any arbitrary seam shape. In one example, among others, a system includes a sewing machine including a sewing needle, a material holding assembly and a translation system. The material holding assembly can include mechanical fingers that can contact material on a sewing plane adjacent to the sewing needle and a structural grounding system supporting the mechanical fingers. The translation system can reposition the material on the sewing plane via the mechanical fingers. Clearance around the sewing needle can be provided by repositioning individual mechanical fingers around the sewing needle.
Adaptive apparatus for transporting and sewing material along arbitrary seam shapes
Various examples are provided related to transporting and sewing material in, e.g., automation of sewing robots. Multiple pieces of layered materials can be transported on a flat planar surface while maintaining the material layer's position and orientation relative to one another during a sewing procedure of these materials along any arbitrary seam shape. In one example, among others, a system includes a sewing machine including a sewing needle, a material holding assembly and a translation system. The material holding assembly can include mechanical fingers that can contact material on a sewing plane adjacent to the sewing needle and a structural grounding system supporting the mechanical fingers. The translation system can reposition the material on the sewing plane via the mechanical fingers. Clearance around the sewing needle can be provided by repositioning individual mechanical fingers around the sewing needle.
Tacking system for stitching along a predetermined path
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate tacking operations that may aid in the securing of objects to substrates prior to subsequent operations. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Tacking system for stitching along a predetermined path
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate tacking operations that may aid in the securing of objects to substrates prior to subsequent operations. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Method for controlling the position of a seam profile relative to structures of a sewing material
The present disclosure relates to a method for controlling the position of a seam contour and a device for carrying out the method, wherein the position control of a seam contour relative to structures of a sewing material is based on comparison data of a structure of a reference sewing material and a structure of a working sewing material.
Method for controlling the position of a seam profile relative to structures of a sewing material
The present disclosure relates to a method for controlling the position of a seam contour and a device for carrying out the method, wherein the position control of a seam contour relative to structures of a sewing material is based on comparison data of a structure of a reference sewing material and a structure of a working sewing material.
Sewing machine and method for operating the sewing machine
A sewing machine includes a support surface for two plies of material to be sewn together and a sewing mechanism that is attached to the support surface and is in operative connection with a machine controller, wherein a plate element positioned between the two material plies is arranged in the material feed area thereof. A vertical adjustment device for the plate element that is actuatable by the machine controller adjusts a vertical distance between the support surface and the plate element, and thus also influences the feed of material to the sewing mechanism. The vertical adjustment device is equipped with an electromagnet for adjusting the position of the plate element. The plate element is equipped with a magnet, which cooperates with the electromagnet.
Sewing machine and method for operating the sewing machine
A sewing machine includes a support surface for two plies of material to be sewn together and a sewing mechanism that is attached to the support surface and is in operative connection with a machine controller, wherein a plate element positioned between the two material plies is arranged in the material feed area thereof. A vertical adjustment device for the plate element that is actuatable by the machine controller adjusts a vertical distance between the support surface and the plate element, and thus also influences the feed of material to the sewing mechanism. The vertical adjustment device is equipped with an electromagnet for adjusting the position of the plate element. The plate element is equipped with a magnet, which cooperates with the electromagnet.