A description is provided of an apparatus for dyeing a textile support comprising a single tank which is provided in its interior, in sequence, with: one first shaped cavity having a watertight function between the surrounding environment and the tank; one first internal partition wall, which is immersed in the lower part in the dye bath of the first shaped cavity for helping the watertight function; one first dyeing compartment and at least one second dyeing compartment which each comprise at least one return roller for the textile support, at least one dispensing device to dispense the dye bath on the textile support, and at least one squeezing device; a second shaped cavity containing the dye bath having a watertight function between the tank and the surrounding environment; and a second internal partition wall, which is immersed in the lower part in the dye bath of the second shaped cavity for helping the watertight

A description is provided of an apparatus for dyeing a textile support comprising a single tank which is provided in its interior, in sequence, with: one first shaped cavity having a watertight function between the surrounding environment and the tank; one first internal partition wall, which is immersed in the lower part in the dye bath of the first shaped cavity for helping the watertight function; one first dyeing compartment and at least one second dyeing compartment which each comprise at least one return roller for the textile support, at least one dispensing device to dispense the dye bath on the textile support, and at least one squeezing device; a second shaped cavity containing the dye bath having a watertight function between the tank and the surrounding environment; and a second internal partition wall, which is immersed in the lower part in the dye bath of the second shaped cavity for helping the watertight

An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.

Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.

Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.

Ultrasonic wash boxes, processing lines, and related methods are provided herein. A wash box can include a housing having a first side wall, a second side wall, a first end wall and a second end wall. The housing can have an opening formed between the side wall and the end walls. The wash box can include a first ultrasonic field generator secured to a first side wall of the housing and a second ultrasonic field generator secured to the second side wall of the housing. The wash box can also include a fabric guide carriage insertable within the opening of the housing between the first and second side walls.

Ultrasonic wash boxes, processing lines, and related methods are provided herein. A wash box can include a housing having a first side wall, a second side wall, a first end wall and a second end wall. The housing can have an opening formed between the side wall and the end walls. The wash box can include a first ultrasonic field generator secured to a first side wall of the housing and a second ultrasonic field generator secured to the second side wall of the housing. The wash box can also include a fabric guide carriage insertable within the opening of the housing between the first and second side walls.

Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.

Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.

The invention relates to a method for producing an antimicrobial fabric or yarn, said method comprising the steps of immersing a fabric or yarn in an aqueous solution of a metal salt while simultaneously subjecting said solution to ultrasonic radiation; and removing the fabric or yarn from said solution and subsequently converting the metal salt in situ in the fabric or yarn into metal oxide nanoparticles, preferably via chemical and heat treatment. Fabrics and yarns obtained or obtainable by such method are also provided. In a further aspect the invention provides an apparatus for performing such method.