A drawing apparatus includes a drawing unit that forms a nail design on a nail of an object by performing a plurality of processes and a processor that extracts a feature value of the object and controls the drawing unit.

The processor acquires information on a performed process with respect to the nail of one object, whose nail is provided to be formed with the nail design, based on process management information in which the feature value with respect to each of a plurality of the objects and an information on the performed process with respect to the nail of each of the plurality of the objects are registered in association with each other and the feature value with respect to the one object, and determines a specific process to be performed to the nail of the one object, and causes the drawing unit to perform the specific process.

A drawing apparatus includes an object receiver into which an object is inserted, the object being at least one finger or toe having a nail to be drawn, an object holder that is configured to hold the object inserted into the object receiver and processor. The processor is configured to adjust a holding level by the object holder on the basis of a size of the object.

A drawing apparatus includes an object receiver into which an object is inserted, the object being at least one finger or toe having a nail to be drawn, an object holder that is configured to hold the object inserted into the object receiver and processor. The processor is configured to adjust a holding level by the object holder on the basis of a size of the object.

A drawing apparatus includes a drawing device provided with at least one pen or nozzle configured to perform a drawing on a nail, a processor which controls operations of the pen or the nozzle, and a cleaning pad provided to clean a tip of the pen or the nozzle. The processor causes the tip of the pen or the nozzle to be cleaned by bringing the tip of the pen or the nozzle into a pressed state where the tip of the pen or the nozzle is pressed against the cleaning pad.

A drawing apparatus includes a drawing device provided with at least one pen or nozzle configured to perform a drawing on a nail, a processor which controls operations of the pen or the nozzle, and a cleaning pad provided to clean a tip of the pen or the nozzle. The processor causes the tip of the pen or the nozzle to be cleaned by bringing the tip of the pen or the nozzle into a pressed state where the tip of the pen or the nozzle is pressed against the cleaning pad.

A manicure hand-rest which has an upper surface (1) that is contoured in relief with a rear apron (4) for support of either hand and with seven mutually-splayed recesses (6) extending on a forward region (5) from the apron (4) to a contoured peripheral edge (7) of the hand-rest for receiving the fingers and thumb of the respective hand. Of the seven recesses (6), three (63-65) are used by the fore, middle and third fingers of both hands in reverse orders from one another, whereas the thumb and small finger of each hand use respective pairs (61, 66; 62, 67) of the recesses. The ends of the recesses (6) may be bevelled over into the edge (7) to facilitate bending down of the fingertips.

A manicure hand-rest which has an upper surface (1) that is contoured in relief with a rear apron (4) for support of either hand and with seven mutually-splayed recesses (6) extending on a forward region (5) from the apron (4) to a contoured peripheral edge (7) of the hand-rest for receiving the fingers and thumb of the respective hand. Of the seven recesses (6), three (63-65) are used by the fore, middle and third fingers of both hands in reverse orders from one another, whereas the thumb and small finger of each hand use respective pairs (61, 66; 62, 67) of the recesses. The ends of the recesses (6) may be bevelled over into the edge (7) to facilitate bending down of the fingertips.

Provided is a gel polish composition comprising (A) a multifunctional silicone urethane (meth)acrylate oligomer, (B) a reactive monomer, and (C) a photoinitiator. The multifunctional silicone urethane (meth)acrylate oligomer (A) consists of siloxane moieties, urethane moieties, and (meth)acrylate moieties. Also provided is a method of using the gel polish composition.

Provided is a gel polish composition comprising (A) a multifunctional silicone urethane (meth)acrylate oligomer, (B) a reactive monomer, and (C) a photoinitiator. The multifunctional silicone urethane (meth)acrylate oligomer (A) consists of siloxane moieties, urethane moieties, and (meth)acrylate moieties. Also provided is a method of using the gel polish composition.

A method for manufacturing a liquid encapsulation apparatus includes deforming waterproof film to create a plurality of chambers therein, filling each of the plurality of chambers with liquid, sealing the plurality of chambers with a protective layer to create a plurality of capsules, cutting the plurality of capsules into a predetermined grouping, and forming the liquid encapsulation apparatus by placing the predetermined grouping in a porous sleeve comprising a plurality of holes and placing the porous sleeve with a substrate in which the substrate is in contact with the porous sleeve.