F26B5/00

Substrate drying apparatus, facility of manufacturing semiconductor device, and method of drying substrate

Disclosed are a substrate drying apparatus, a facility of manufacturing a semiconductor device, and a method of drying a substrate. The substrate drying apparatus includes a chamber that is configured to dry a substrate at a first temperature, a first reservoir that is configured to store a first supercritical fluid at a second temperature that is less than the first temperature, a second reservoir that is configured to store a second supercritical fluid at a third temperature that is greater than the first temperature, and a supply unit connected between the chamber and the first reservoir and/or second reservoir. The supply unit is configured to supply the chamber with the first supercritical fluid and second supercritical fluid.

DUAL TUMBLE DRYER UNIT AND SYSTEM
20200333073 · 2020-10-22 · ·

A dual tumble dryer unit that includes a housing that defines an interior, a divider that extends between first and second side walls and divides the interior into first and second sections, and first and second dryer assemblies that are positioned in the first and second sections. The first and second dryer assemblies each include a basket positioned to rotate about a horizontal axis, and a blower disposed positioned to blow air on the basket. A first drying path is defined between a first entry opening defined in the first side wall, the first basket and a first exit opening defined in the second side wall, and a second drying path is defined between a second entry opening defined in the first side wall, the second basket and a second exit opening defined in the second side wall.

DUAL TUMBLE DRYER UNIT AND SYSTEM
20200333073 · 2020-10-22 · ·

A dual tumble dryer unit that includes a housing that defines an interior, a divider that extends between first and second side walls and divides the interior into first and second sections, and first and second dryer assemblies that are positioned in the first and second sections. The first and second dryer assemblies each include a basket positioned to rotate about a horizontal axis, and a blower disposed positioned to blow air on the basket. A first drying path is defined between a first entry opening defined in the first side wall, the first basket and a first exit opening defined in the second side wall, and a second drying path is defined between a second entry opening defined in the first side wall, the second basket and a second exit opening defined in the second side wall.

Washing device

A washing device includes a main body, a water system, and a drying system. The main body includes a first washing zone, a second washing zone, and a drying zone. A transporting device transports an object to make it pass through the first washing zone, the second washing zone, and the drying zone. The first washing zone has a first water outlet, and the second washing zone has a second water outlet. The water system includes a heater for heating water and a tank. A first pipe connects the heater and the first water outlet, and a second pipe connects the heater and the tank. An outlet pipe connects the tank and the second water outlet. A collecting structure collects waste water and injects into the tank. The drying system is adapted to supply air flow to the drying zone for drying the object.

Supercritical fluid producing apparatus and substrate processing apparatus
10796897 · 2020-10-06 · ·

A supercritical fluid producing apparatus according to the present disclosure includes a gas supply line, a cooler, a pump, a buffer tank, a heating device, and a supercritical fluid supply line. An inlet port into which a processing fluid from the pump flows is formed at a predetermined position on the buffer tank, and an outlet port through which the processing fluid flows out is formed at a different position from the inlet port. The buffer tank includes a buffer tank body that stores the processing fluid from the pump, and a heater that heats the processing fluid sent into the buffer tank body.

HEATING VALUES OF CELLULOSIC WASTE
20200300462 · 2020-09-24 ·

Provided herein is a process for improving the heating value of a cellulosic waste material. The process includes the steps of treating the cellulosic waste material with an acid solution, recovering heat produced by treating the cellulosic waste material, and filtering the treated cellulosic waste material to produce a filter cake. The disclosure also relates to a system for implementing the process.

Method for dehydration and critical point drying

A method for dehydration and critical point drying of a sample in a single chamber is introduced, comprising the steps of (a) dehydrating the sample by replacing water by an intermediate fluid, (b) replacing the intermediate fluid by a transitional fluid, (c) pressurising the transitional fluid to or beyond its critical pressure and/or heating the transitional fluid (4 to or beyond its critical temperature, and (d) in response to gradually releasing the pressure, letting the transitional fluid gasify and escape from the sample. In step (a) and/or step (b), a ratio of the fluid to-be-replaced to the replacing fluid is measured and used to control a supply of the replacing fluid. The method reduces consumption of intermediate fluid and/or transitional fluid, making the process more efficient in terms of duration and user interaction while ensuring a high degree of dryness and the integrity of the sample.

Method of Drying Frac Sand Without Heat
20200217586 · 2020-07-09 ·

A method of drying frac sand without heat is comprised of constructing a drainage system and placing sand on top of a perforated top layer thereon. The drainage system has multiple layers through which liquid passes to dewater sand resting thereon. At the bottom of the drainage system, perforated collection pipes, at least partially surrounded by rocks, collect and carry the liquid to a collection pond for reuse. A cellular confinement layer has sections of panels which, upon expansion, have cells filled with rocks. A woven monofilament geotextile fabric layer comprising woven monofilament geotextile fabric sheets sewn together has sized openings which allow fluid, but prevent sand from passing through the openings. The top layer comprises high density polyethylene perforated sheets welded together. A watertight liner sits below the collection pipes and the cellular confinement layer. Protective layers above and below the watertight liner prevent rocks from damaging same.

Method of Drying Frac Sand Without Heat
20200217586 · 2020-07-09 ·

A method of drying frac sand without heat is comprised of constructing a drainage system and placing sand on top of a perforated top layer thereon. The drainage system has multiple layers through which liquid passes to dewater sand resting thereon. At the bottom of the drainage system, perforated collection pipes, at least partially surrounded by rocks, collect and carry the liquid to a collection pond for reuse. A cellular confinement layer has sections of panels which, upon expansion, have cells filled with rocks. A woven monofilament geotextile fabric layer comprising woven monofilament geotextile fabric sheets sewn together has sized openings which allow fluid, but prevent sand from passing through the openings. The top layer comprises high density polyethylene perforated sheets welded together. A watertight liner sits below the collection pipes and the cellular confinement layer. Protective layers above and below the watertight liner prevent rocks from damaging same.

Substrate processing apparatus

A substrate processing apparatus according to an exemplary embodiment to the present disclosure includes: a main body which has therein a processing space capable of accommodating the substrate; a holding unit which holds the substrate in the main body; a supply unit which is provided at a side of the substrate held by the holding unit and supplies the processing fluid into the processing space; a discharge unit which discharges the processing fluid from an inside of the processing space; and a flow path limiting unit which limits a lower end of a flow path at an upstream side which is formed while the processing fluid flows from the supply unit to the discharge unit. Further, an upper end of the flow path limiting unit is disposed at a position higher than the upper surface of the substrate held by the holding unit.