My desiccator comprises a plurality of chambers in series communication with each other so a desiccating gas flows from one chamber into an adjacent chamber. A desiccating purge gas is introduced through an inlet into the desiccator's chambers at a predetermined flow rate, and a one-way bleed valve allows gas within the chambers to constantly flow from the desiccator while maintaining a positive pressure within the desiccator. A fan that constantly mixes and circulates the gas between the chambers as the desiccating purge gas is introduced into the desiccator, constantly diluting the gas within the chambers with a fresh supply of the desiccating gas. My method employs my desiccator to store items, wherein a dry, pressurized desiccating gas is introduced into the desiccator's chambers in a manner that constantly circulates the gas between the chambers as gas is slowly bled from the chambers, constantly diluting the gas within the chambers with a fresh supply of the desiccating gas. In my method the dew point of the desiccating gas is from 20 to 90 F, the pressure of the desiccating gas is from 30 to 120 psi, and the average flow rate of the desiccating gas into the desiccator is from 0.25 to 4.0 cubic feet per minute.

Provided is a substrate processing apparatus including a processing container configured to receive a substrate on which a dry preventing liquid is filled and perform a supercritical processing on the substrate; a fluid supply line connected to the processing container and configured to supply a processing fluid to the processing container; a fluid discharge line connected to the processing container and configured to discharge the processing fluid in the processing container; and a first circulation line connected to an upstream side and a downstream side of the processing container, and provided independently from the fluid supply line and the fluid discharge line to circulate the processing fluid in the processing container. The first circulation line is provided with a first reservoir tank that receives the processing fluid from the processing container and has a capacity larger than that of the processing container.

Provided is a substrate processing apparatus including a processing container configured to receive a substrate on which a dry preventing liquid is filled and perform a supercritical processing on the substrate; a fluid supply line connected to the processing container and configured to supply a processing fluid to the processing container; a fluid discharge line connected to the processing container and configured to discharge the processing fluid in the processing container; and a first circulation line connected to an upstream side and a downstream side of the processing container, and provided independently from the fluid supply line and the fluid discharge line to circulate the processing fluid in the processing container. The first circulation line is provided with a first reservoir tank that receives the processing fluid from the processing container and has a capacity larger than that of the processing container.

When a substrate on which a fine pattern is formed is dried with vapor, prevention of collapse of the pattern due to water originally contained in IPA to be stored has been a problem to be solved. A mixed liquid stored in a mixed liquid storage is vaporized to generate mixed vapor containing the IPA and water (water vapor). Then, a vapor dewatering unit connected to a vapor supply pipe through which the mixed vapor is fed removes water in the mixed vapor. This can reduce the concentration of water originally contained in the IPA to be stored before the IPA is supplied to the substrate, thereby suppressing collapse of the pattern.

When a substrate on which a fine pattern is formed is dried with vapor, prevention of collapse of the pattern due to water originally contained in IPA to be stored has been a problem to be solved. A mixed liquid stored in a mixed liquid storage is vaporized to generate mixed vapor containing the IPA and water (water vapor). Then, a vapor dewatering unit connected to a vapor supply pipe through which the mixed vapor is fed removes water in the mixed vapor. This can reduce the concentration of water originally contained in the IPA to be stored before the IPA is supplied to the substrate, thereby suppressing collapse of the pattern.

A substrate treating apparatus is disclosed. The apparatus may include a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body, a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space, a fluid supplying unit configured to supply fluid into the treatment space, a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space, and an isolation plate installed between the sealing member and the supporting unit. The isolation plate may be provided to face the sealing member.

The invention provides an apparatus and method for use in the drying of substrates using a solid particulate material, the apparatus comprising: (a) housing means having mounted therein a rotatably mounted cylindrical drum; (b) access means; and (c) at least one collection means,
wherein the rotatably mounted cylindrical drum additionally comprises capturing and transferring means, adapted to facilitate collection of the solid particulate material and transfer of the material to the at least one collection means. The invention also provides a method for drying a wet substrate, the method comprising treating the substrate with a solid particulate material at ambient or elevated temperature, the treatment being carried out using the apparatus of the invention. The apparatus and method find particular application in the drying of wet textile fabrics.

The invention provides an apparatus and method for use in the drying of substrates using a solid particulate material, the apparatus comprising: (a) housing means having mounted therein a rotatably mounted cylindrical drum; (b) access means; and (c) at least one collection means,
wherein the rotatably mounted cylindrical drum additionally comprises capturing and transferring means, adapted to facilitate collection of the solid particulate material and transfer of the material to the at least one collection means. The invention also provides a method for drying a wet substrate, the method comprising treating the substrate with a solid particulate material at ambient or elevated temperature, the treatment being carried out using the apparatus of the invention. The apparatus and method find particular application in the drying of wet textile fabrics.

Seal member for a nozzle or an air bar, that is configured and can be positioned to block at least a portion of the flow of air (or gas) exiting or discharged from the nozzle or air bar into the interior of a housing such as a dryer or the like. Each seal member can be actuated externally of the housing interior, without requiring physical access to the housing interior, to move it into air flow blocking relation with a nozzle, and to move it out of air flow blocking relation with a nozzle. Each seal member can be actuated while the apparatus remains in an operating mode. Also disclosed is a method of controlling or regulating the amount of air emitted or discharged from one or more nozzles in a housing by blocking air flow discharged from the one or more nozzles with a seal member.

Methods and systems for treating tailings at an elevated pH using lime are disclosed herein. In some embodiments, the method comprises (i) providing a tailings stream comprising bicarbonates and a pH less than 9.0, (ii) adding a coagulant comprising calcium hydroxide to the tailings stream to form a mixture having a pH of at least 11.5 and a soluble calcium level no more than 800 mg/L, and (iii) dewatering the mixture to produce a product having a solids content of at least 40% by weight. In some embodiments, the pH and soluble calcium level of the mixture cause chemical modification of clay materials of the mixture via pozzolanic reactions. In some embodiments, the undrained shear strength of the product increases over a period of time of at least two days.