This invention relates to a replacement end time determination method in a process of replacing a liquid to be replaced by a processing fluid in a supercritical state and a substrate. In the invention, a density profile is obtained at each of a dry state where the liquid to be replaced is not present in a chamber and a wet state where the liquid to be replaced is present in the chamber by supplying and discharging the processing fluid into and from the chamber in accordance with a predetermined supply/discharge recipe while maintaining the processing fluid in a supercritical state. When both densities become substantially equal to each other after the density at the wet state becomes larger than the density at the dry state, the replacement of the liquid to be replaced by the processing liquid is regarded to be finished.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first chamber having a supply port for supplying a treating fluid; a second chamber in combination with the first chamber defining a treating space; a support member configured to support a substrate in the treating space; and a baffle unit installed in the first chamber to face the support port, and wherein the baffle unit includes: a first baffle assembly including a first baffle having first holes through which the treating fluid flow; and a second baffle assembly installed at a position farther from the support port than the first baffle assembly, and including a second baffle having second holes through which the treating fluid flow.

A laundry treating apparatus is disclosed. The laundry treating apparatus includes a cabinet configured to define a receiving space for receiving laundry, the cabinet having an open surface, a door hingedly provided at the cabinet for opening and closing the open surface of the cabinet, a laundry support unit provided in the receiving space for supporting laundry, and a machinery compartment provided in the cabinet for defining a space that is separate from the receiving space, the machinery compartment being provided therein with an air supply unit for dehumidifying or heating air in the receiving space and supplying the dehumidified or heated air into the receiving space. The air supply unit dehumidifies air in a room that communicates with the receiving space in the state in which the door is open.

A dewatering device for aggregate product can be used to retro-fit existing aggregate product dewatering facilities in order to more efficiently capture product. The dewatering device can be movable to allow for the portability of the device relative to existing dewatering facilities. The device is adapted to receive a slurry of aggregate product and water and to vibrate to dry the aggregate product. A recycle system is included to receive any fines that may otherwise be lost by the system. The recycle system captures the fines and redirects them back towards the vibrating process of the vibrating device to direct them towards an exit of the vibrating device in order to use said fines as well as the other dewatered aggregate product. The portability of the device allows the device to be used with the existing facilities without the need to completely replace existing components for dewatering aggregate product.

A dewatering device for aggregate product can be used to retro-fit existing aggregate product dewatering facilities in order to more efficiently capture product. The dewatering device can be movable to allow for the portability of the device relative to existing dewatering facilities. The device is adapted to receive a slurry of aggregate product and water and to vibrate to dry the aggregate product. A recycle system is included to receive any fines that may otherwise be lost by the system. The recycle system captures the fines and redirects them back towards the vibrating process of the vibrating device to direct them towards an exit of the vibrating device in order to use said fines as well as the other dewatered aggregate product. The portability of the device allows the device to be used with the existing facilities without the need to completely replace existing components for dewatering aggregate product.

A dryer device for drying plastics pouches, the device comprising a main air admission pipe having a plurality of dryer heads including outlet orifices, each outlet orifice forming an air knife, the dryer heads being associated in pairs so as to define a plurality of passages for plastics pouches, each passage being adapted to dry plastics pouches passing therethrough by applying two opposing air knives.

A dryer device for drying plastics pouches, the device comprising a main air admission pipe having a plurality of dryer heads including outlet orifices, each outlet orifice forming an air knife, the dryer heads being associated in pairs so as to define a plurality of passages for plastics pouches, each passage being adapted to dry plastics pouches passing therethrough by applying two opposing air knives.

Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.