Patent classifications
F26B5/00
WATER REACTIVE MATERIALS FOR DRYING ARTICLES
Devices and methods related to drying absorbent articles with water reactive materials are generally described.
SUBSTRATE TREATING APPARATUS
The present invention provides a substrate treating apparatus, including: a housing including a first body and a second body which are combined with each other to provide a treatment space in which a substrate is treated; an actuator which moves the second body in a vertical direction with respect to the first body to seal or open the treatment space; and a pipe which is coupled with the second body and in which a fluid flows, in which the pipe is a stretchable pipe that is stretchable and contractible according to the vertical movement of the second body.
Method of cleaning substrate processing apparatus, and substrate processing system
There is provided a method of cleaning a substrate processing apparatus in which a drying process of drying a substrate whose surface is wet with a liquid is performed by bring the substrate into contact with a supercritical fluid, the method including: diffusing a first cleaning fluid in an interior of the substrate processing apparatus, the first cleaning fluid being obtained by mixing the supercritical fluid with a solvent containing polar molecules and having a lower boiling point than a boiling point of the liquid; and discharging the first cleaning fluid from the interior of the substrate processing apparatus, that occurs after the diffusing the first cleaning fluid.
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSFER ROBOT
The present invention provides a substrate treating apparatus. The substrate treating apparatus includes: a liquid treatment chamber configured to treat a substrate with a liquid; a drying chamber configured to dry the liquid-treated substrate; a transfer robot configured to transfer the substrate between the liquid treatment chamber and the drying chamber, and including a hand which is movable along an X-axis, a Y-axis, and a Z-axis and is rotatably driven based on the Z-axis, and on which the substrate is placed; an optical system configured to photograph a form of a liquid film of the substrate, in which when the substrate is transferred from the liquid treatment chamber to the drying chamber, the substrate is wetted with a chemical liquid and is transferred by the transfer robot in a state of being formed with a liquid film formed; and a controller configured to measure the form of the liquid film photographed by the optical system.
MULTIPURPOSE DRYER
A multipurpose dryer according to an embodiment of the present disclosure allows free use of both hands during drying by adjusting the direction of a nozzle. The multipurpose dryer includes a body part including a blower inside to suck outdoor air, heat or cool it and force the heated or cooled air, and a manipulation panel outside to control the blower, a hose part including a first hose capable of freely bending and maintaining a deformed shape with one end coupled to the body part and the other end formed as a free end, and a second hose capable of freely bending and positioned inside the first hose, with one end coupled to the blower and the other end formed as a free end, and a nozzle part coupled to the other end of the second hose to spray the hot or cold air supplied from the blower.
WAFER PROCESSING EQUIPMENT AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A fluid supply device configured to supply a processing fluid to a wafer processing device that includes a chamber is provided. The fluid supply device includes a reservoir configured to change the processing fluid into a supercritical fluid state; a wafer protecting device comprising a body configured to prevent a wafer in the chamber of the wafer processing device from being damaged by the processing fluid in the supercritical fluid state by receiving the processing fluid in the supercritical fluid state and limiting a speed of the processing fluid; and a fluid supply line configured to provide a path for the processing fluid between the reservoir and the wafer protecting device and a path for the processing fluid between the wafer protecting device and the wafer processing device.
Flexible Waterproofing/Impregnation and Drying Device
The present invention relates to a flexible waterproofing/impregnation and drying de-vice and a method of drying items that have undergone a solvent-based or water-based waterproofing/impregnation process. The flexible waterproofing/impregnation and dry-ing device is configured with inlets for waterproofing/impregnation fluid for water-proofing/impregnating items and one or more heat generating units for effective drying of items, said items being for example clothes, shoes, bags, purses, blankets and garments.
Aggregate dewatering device and method
A dewatering device for aggregate product can be used to retro-fit existing aggregate product dewatering facilities in order to more efficiently capture product. The dewatering device can be movable to allow for the portability of the device relative to existing dewatering facilities. The device is adapted to receive a slurry of aggregate product and water and to vibrate to dry the aggregate product. A recycle system is included to receive any fines that may otherwise be lost by the system. The recycle system captures the fines and redirects them back towards the vibrating process of the vibrating device to direct them towards an exit of the vibrating device in order to use said fines as well as the other dewatered aggregate product. The portability of the device allows the device to be used with the existing facilities without the need to completely replace existing components for dewatering aggregate product.
Aggregate dewatering device and method
A dewatering device for aggregate product can be used to retro-fit existing aggregate product dewatering facilities in order to more efficiently capture product. The dewatering device can be movable to allow for the portability of the device relative to existing dewatering facilities. The device is adapted to receive a slurry of aggregate product and water and to vibrate to dry the aggregate product. A recycle system is included to receive any fines that may otherwise be lost by the system. The recycle system captures the fines and redirects them back towards the vibrating process of the vibrating device to direct them towards an exit of the vibrating device in order to use said fines as well as the other dewatered aggregate product. The portability of the device allows the device to be used with the existing facilities without the need to completely replace existing components for dewatering aggregate product.
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first process treating unit configured to treat a substrate in a single-type method; a second process treating unit configured to treat a substrate in a batch-type method; and a posture changing unit provided between the first process treating unit and the second process treating unit and configured to change a posture of the substrate between a vertical posture and a horizontal posture, and wherein the substrate is loaded to and unloaded from the first process treating unit.