The present invention provides an automated system (100) for performing a cooling curve analysis for a plurality of quenchants wherein the system (100) comprises a quench probe (101) which is heated up to a maximum pre-defined temperature by an electric resistance furnace (102). Further, the quench probe (101) is automatically transferred and inserted into a quench vessel (107) after being heated to a maximum pre-defined temperature. The quench probe (101) is retained in the quench vessel (107) till the temperature of the quench probe (101) gradually decreases to a pre-defined minimum temperature as indicated by a Universal Serial Bus (USB) data logger (106) which logs the temperature of the quench probe (101) and indicates a graphical representation of the cooling curve analysis through the process automation tool installed on a computer hardware device.

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

An apparatus for thermally-stabilizing a carbon material precursor having a heating apparatus which thermally-stabilizes a carbon material precursor, a thermometer for measuring a temperature in the heating apparatus, a water vapor concentration meter for measuring a concentration of water vapor in the heating apparatus, and a batch type thermal-stabilization apparatus for feedback-controlling the temperature in the heating apparatus by using the concentration of water vapor as an index such that generation of water vapor in a thermal-stabilization reaction of the carbon material precursor is completed and generation of water vapor in a partial oxidation reaction of the carbon material precursor is suppressed in a temperature range between a temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction and a temperature range where the generation of water vapor is accelerated in the partial oxidation reaction.

An apparatus for thermally-stabilizing a carbon material precursor having a heating apparatus which thermally-stabilizes a carbon material precursor, a thermometer for measuring a temperature in the heating apparatus, a water vapor concentration meter for measuring a concentration of water vapor in the heating apparatus, and a batch type thermal-stabilization apparatus for feedback-controlling the temperature in the heating apparatus by using the concentration of water vapor as an index such that generation of water vapor in a thermal-stabilization reaction of the carbon material precursor is completed and generation of water vapor in a partial oxidation reaction of the carbon material precursor is suppressed in a temperature range between a temperature range where the generation of water vapor is accelerated in the thermal-stabilization reaction and a temperature range where the generation of water vapor is accelerated in the partial oxidation reaction.

Real-time monitoring of a multi-zone vertical furnace with early detection of a failure of a heating zone element is disclosed. For example, a continuously provided measurement of a resistance value (R.sub.1) of a resistance (1) in at least one heating zone (1) of several heating zones (1, 2, 3, 4, 5) takes place in the thermal device (100), each currently measured value (R.sub.1(i)) of the resistance (1) in the related heating zone (1) is compared with a previously measured value (R.sub.1(i1)) of the same resistance (1), and a warning or an alarm (90) for the thermal device (100) is generated when a deviation (310, R.sub.1) is detected by a comparison of the two resistance values from the same heating zone (1) before a failure of a complete heating zone (1) in the thermal device (100) takes place.

First irradiation which causes an emission output from a flash lamp to reach its maximum value over a time period in the range of 1 to 20 milliseconds is performed to increase the temperature of a front surface of a semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 1 to 20 milliseconds. This achieves the activation of the impurities. Subsequently, second irradiation which gradually decreases the emission output from the maximum value over a time period in the range of 3 to 50 milliseconds is performed to maintain the temperature of the front surface within a 25 C. range around the target temperature for a time period in the range of 3 to 50 milliseconds. This prevents the occurrence of process-induced damage while suppressing the diffusion of the impurities.

The present invention relates to a sealed plasma melting furnace for treating low- and intermediate-level radioactive waste, which allows the secondary pollutants to be minimized. The sealed plasma melting furnace includes: a waste supply chamber communicatively provided with a hopper; a pyrolysis chamber channel communicatively coupled with the waste supply chamber; a pyrolysis chamber having a burner mounted thereon; a melting chamber channel guiding the waste transferred from the pyrolysis chamber communicatively provided therewith to fall down; a melting chamber provided with a furnace interior portion accommodating a molten substance on a bottom surface thereof; a processed molten substance discharge channel discharging the processed molten substance generated in the melting chamber; a secondary combustion chamber channel inducing and exhausting an off-gas flow generated in the melting chamber; and a secondary combustion chamber inducing complete combustion of the off-gas input from the secondary combustion chamber channel.

The present invention relates to a sealed plasma melting furnace for treating low- and intermediate-level radioactive waste, which allows the secondary pollutants to be minimized. The sealed plasma melting furnace includes: a waste supply chamber communicatively provided with a hopper; a pyrolysis chamber channel communicatively coupled with the waste supply chamber; a pyrolysis chamber having a burner mounted thereon; a melting chamber channel guiding the waste transferred from the pyrolysis chamber communicatively provided therewith to fall down; a melting chamber provided with a furnace interior portion accommodating a molten substance on a bottom surface thereof; a processed molten substance discharge channel discharging the processed molten substance generated in the melting chamber; a secondary combustion chamber channel inducing and exhausting an off-gas flow generated in the melting chamber; and a secondary combustion chamber inducing complete combustion of the off-gas input from the secondary combustion chamber channel.

There is provided a technique that includes: a heat generator installed for each of control zones and configured to raise an internal temperature of a reaction tube by heat generation; a circuit configured to equalize resistance values in the respective control zones, wherein the circuit is a parallel circuit and is configured such that an output variable element is installed in one or more of output circuits constituting the parallel circuit.

The present invention relates to a plasma furnace which can efficiently treat various types of waste in large amounts. The plasma furnace comprises a melting chamber 101 for accommodating a melt, an upper surface forming the upper portion of the melting chamber 101 with a horizontal upper surface 111 and an inclined upper surface 112 having a slope with respect to the horizontal upper surface 111, a melt discharge portion 130 formed through a bottom surface of the melting chamber for discharging molten material therethrough, and an input apparatus 120 having a slope for inputting waste into the melting chamber 101, and the mixed type plasma torch 191, 192 provided on the inclined upper surface 112 with a slope for generating melting heat in the melting chamber 101.