A method of manufacturing a permanent magnet comprises a solution heat treatment. The solution heat treatment includes: performing a heat treatment at a temperature T.sub.ST; placing a cooling member including a first layer and a second layer on the first layer between the heater and the treatment object so that the first layer faces the treatment object; and transferring the treatment object together with the cooling member to the outside of a heating chamber, and cooling the treatment object until a temperature of the treatment object becomes a temperature lower than a temperature T.sub.ST200 C. In the step of cooling the treatment object, a cooling rate until the temperature of the treatment object becomes the temperature T.sub.ST200 C. is 5 C./s or more.

A device for aligning a metal blank for a temperature control system which has at least one temperature control unit for heating or cooling the metal blank includes at least two support rollers on which the metal blank can be placed and conveyed through the temperature control system by rotation of the support rollers in the throughput direction and within a conveying plane. The support rollers are arranged spaced apart in the throughput direction. The device further includes a first centering unit having at least one centering finger which is movably arranged within the conveying plane such that the centering finger is movable transversely to the throughput direction in order to align the metal blank in a predetermined orientation.

A device for aligning a metal blank for a temperature control system which has at least one temperature control unit for heating or cooling the metal blank includes at least two support rollers on which the metal blank can be placed and conveyed through the temperature control system by rotation of the support rollers in the throughput direction and within a conveying plane. The support rollers are arranged spaced apart in the throughput direction. The device further includes a first centering unit having at least one centering finger which is movably arranged within the conveying plane such that the centering finger is movable transversely to the throughput direction in order to align the metal blank in a predetermined orientation.

A heat treatment apparatus for heating, in a treatment container, a substrate on which a coating film is formed, the heat treatment apparatus includes: a mount provided in the treatment container and configured to mount the substrate thereon; a heating part configured to heat the substrate mounted on the mount; a suction pipe leading to a suction port formed in the mount, penetrating the mount, and extending directly downward; and a collection container provided on a suction path between the suction pipe and a suction mechanism, wherein the collection container is provided directly below the mount in plan view and connected to the suction pipe to collect a sublimate in the treatment container.

The present invention relates to a plasma furnace which can efficiently treat various types of waste in large amounts. The plasma furnace comprises a melting chamber 101 for accommodating a melt, an upper surface forming the upper portion of the melting chamber 101 with a horizontal upper surface 111 and an inclined upper surface 112 having a slope with respect to the horizontal upper surface 111, a melt discharge portion 130 formed through a bottom surface of the melting chamber for discharging molten material therethrough, and an input apparatus 120 having a slope for inputting waste into the melting chamber 101, and the mixed type plasma torch 191, 192 provided on the inclined upper surface 112 with a slope for generating melting heat in the melting chamber 101.

The invention relates to a method for controlling suspension in a suspension smelting furnace. The method comprises feeding additionally to pulverous solid matter and additionally to reaction gas reducing agent into the suspension smelting furnace, wherein reducing agent is fed in the form of a concentrated stream of reducing agent through the suspension in the reaction shaft onto the surface of the melt to form a reducing zone containing reducing agent within the collection zone of the melt.

In a known method for treating pourable, inorganic grain, a heated rotary tube is used that rotates about an axis of rotation and surrounds a treatment chamber that is divided into a plurality of treatment zones by means of separating elements. The grain is supplied to the treatment chamber at a grain inlet side and is transported, in a grain transport direction, to a grain outlet side and is exposed to a treatment gas in the process. In order, proceeding herefrom, to allow for reliable and reproducible thermal treatment of pourable inorganic grain, in particular SiO.sub.2 grain in the rotary kiln, in a manner having low and effective consumption of treatment gas, it is proposed for spent treatment gas to be suctioned out of a reaction zone of the treatment chamber, by a gas manifold that rotates about the longitudinal axis thereof.

Wafer boat handling device, configured to be positioned under a process chamber of a vertical batch furnace, and comprising a rotatable table comprising a first and a second wafer boat support surface. Each wafer boat support surface is configured for supporting a wafer boat. The rotatable table is rotatable by an actuator to rotate both the first and the second wafer support surfaces to a load/receive position in which the wafer boat handling device is configured to load a wafer boat vertically from the rotatable table into the process chamber and to receive the wafer boat from the process chamber onto the rotatable table, a cooldown position in which the wafer boat handling device is configured to cool down a wafer boat, and a transfer position for transferring wafers to and/or from the wafer boat.

A wafer boat handling device, configured to be positioned under a process chamber of a vertical batch furnace. The wafer boat handling device comprises a main housing having a wall defining and bounding a wafer boat handling space, and a boat transporter comprising a wafer boat support for supporting a wafer boat and configured to transport the wafer boat to a cooldown position within the wafer boat handling space. A part of the wall adjacent the cooldown position is a wall part with a heat radiation surface absorptance of at least 0.60 so as to withdraw heat from the wafer boat which is in the cooldown position by means of heat radiation absorption.

A furnace system includes a mixing chamber that receives separate streams of raw material and cullet mix and discharges a combined stream. The mixing chamber tapers from an inlet end to an outlet end. One inlet in the inlet end is configured to receive one of the material and mix and is aligned with an outlet in the outlet end along a vertical axis. Another inlet is configured to receive the other of the material and mix and is offset from the outlet relative to the vertical axis such the material or mix is deposited on a sidewall of the tapered chamber before reaching the outlet. A charger receives the combined stream from the mixing chamber and discharges the mixture into a molten bath in a furnace. A duct system may be used to mix exhaust from the furnace with exhaust from the mixing chamber and charger.