Patent classifications
F27D5/00
RACKS FOR HIGH-TEMPERATURE METAL PROCESSING
In various embodiments, apparatuses for receiving and supporting one or more components during processing thereof at process temperatures greater than approximately 1000° C. feature refractory metal shelves separated by refractory metal support posts.
CONTAINER, FURANCE AND METHOD FOR HEAT TREATMENT OF A POWDER MIXTURE
A container for storing a powder mixture during heat treatment in a furnace, a furnace and a method for heat treatment of a powder mixture. The aim of the invention is to specify a container by means of which in particular the throughput per unit of time can be increased and an automatic removal of the container is simplified. This aim is achieved by a plurality of receptacles for releasable fastening of spacers which in the installed state allow contactless stacking of a plurality of containers one above the other.
MULTI-PART SUPPORT ELEMENT FOR SPACING CARRIER ELEMENTS
A multi-part support element for spacing carrier elements, includes an upper part and a lower part, wherein the upper part can be detachably axially connected to the lower part by a rotary connection in order to fix a carrier element between the upper part and the lower part, the rotary connection is formed by a stud provided on the lower part and an opening provided on the upper part, into which the stud can be screwed, and the rotary connection is implemented such that the rotary connection is released again after defined screwing of the stud into the opening, such that the stud is locked in the opening with axial play, and wherein the lower part has a disk-shaped attachment, whose layer thickness decreases toward the edge.
Charging device for the heat treatment of workpieces having a hub
A charging device for the heat treatment of workpieces being provided with a hub, comprising a charging support, a shaft and at least one auxiliary hub, wherein the workpiece can be vertically supported on the shaft by auxiliary hub(s) precisely fitted into the hub, and the shaft being supported by the charging support as well as use of auxiliary hubs for the dimensionally stable hardening of gear-wheels in vertical position.
Charging device for the heat treatment of workpieces having a hub
A charging device for the heat treatment of workpieces being provided with a hub, comprising a charging support, a shaft and at least one auxiliary hub, wherein the workpiece can be vertically supported on the shaft by auxiliary hub(s) precisely fitted into the hub, and the shaft being supported by the charging support as well as use of auxiliary hubs for the dimensionally stable hardening of gear-wheels in vertical position.
Racks for high-temperature metal processing
In various embodiments, apparatuses for receiving and supporting one or more components during processing thereof at process temperatures greater than approximately 1000° C. feature refractory metal shelves separated by refractory metal support posts.
Substrate processing apparatus for processing substrates
The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.
FAST RESPONSE DUAL-ZONE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.
Spot heating by moving a beam with horizontal rotary motion
Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.
METHOD AND SYSTEM FOR HEATING DIRECT REDUCED IRON (DRI) BETWEEN A DRI SOURCE AND PROCESSING EQUIPMENT FOR THE DRI
A method of heating direct reduced iron between a direct reduced iron source and processing equipment for the direct reduced iron, comprises providing a conduit heater assembly between the direct reduced iron source and the processing equipment, wherein the conduit heater assembly receives a flow of the direct reduced iron from the direct reduced iron source and heats the direct reduced iron as the direct reduced iron flows through the conduit heater assembly and to the processing equipment.