F27D7/00

Fiber oxidation oven with multiple independently controllable heating systems
09598795 · 2017-03-21 · ·

One embodiment is directed to an oven for heating fibers. The oven comprises a plurality of walls forming a chamber and a supply structure disposed within the chamber between first and second ends of the chamber. The supply structure is in communication with a first heating system and is configured to direct heated gas from the first heating system into a first portion of the chamber. The supply structure is in communication with a second heating system and is configured to direct heated gas from the second heating system into a second portion of the chamber.

OVENS, DISCHARGE NOZZLE PLATES FOR DISTRIBUTION OF GAS THROUGH AN OVEN, AND METHODS TO OPERATE AN OVEN

Ovens, discharge nozzle plates for distribution of gas through an oven, and methods to operate an oven are disclosed. Example ovens include a heating system to heat gas, a substrate heating volume, and a plenum comprising a side wall having a plurality of passages formed therein, the plenum configured to direct heated gas into the substrate heating volume from the plurality of passages, each of the plurality of passages formed in the plenum having a respective tapered cross-sectional shape.

GAS MANAGEMENT ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS

A gas management assembly for a substrate processing apparatus includes: an exhaust module including a basic exhaust line that is formed to exhaust a chamber gas containing a process gas supplied to a chamber of the substrate processing apparatus to a discharge system; a recovery connection module including a recovery exhaust line that is branched from the basic exhaust line and formed to exhaust the chamber gas to a recovery system; and a control module configured to perform automatic switching of an exhaust path of the chamber gas from one of the basic exhaust line and the recovery exhaust line to the other based on at least one of an operation mode of the substrate processing apparatus, a pressure of the chamber, or a pressure of the recovery exhaust line.

GAS MANAGEMENT ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS

A gas management assembly for a substrate processing apparatus includes: an exhaust module including a basic exhaust line that is formed to exhaust a chamber gas containing a process gas supplied to a chamber of the substrate processing apparatus to a discharge system; a recovery connection module including a recovery exhaust line that is branched from the basic exhaust line and formed to exhaust the chamber gas to a recovery system; and a control module configured to perform automatic switching of an exhaust path of the chamber gas from one of the basic exhaust line and the recovery exhaust line to the other based on at least one of an operation mode of the substrate processing apparatus, a pressure of the chamber, or a pressure of the recovery exhaust line.