An assembly of a liner and a flange for a vertical furnace for processing substrates is provided. The liner being configured to extend in the interior of a process tube of the vertical furnace, and the flange is configured to at least partially close a liner opening. The liner comprising a substantially cylindrical wall delimited by the liner opening at a lower end and closed at a higher end and being substantially closed for gases above the liner opening and defining an inner space. The flange comprising:

an inlet opening configured to insert and remove a boat configured to carry substrates in the inner space of the liner;

a gas inlet to provide a gas to the inner space. The assembly is constructed and arranged with a gas exhaust opening to remove gas from the inner space and a space between the liner and the low pressure tube.

An assembly of a liner and a flange for a vertical furnace for processing substrates is provided. The liner being configured to extend in the interior of a process tube of the vertical furnace, and the flange is configured to at least partially close a liner opening. The liner comprising a substantially cylindrical wall delimited by the liner opening at a lower end and closed at a higher end and being substantially closed for gases above the liner opening and defining an inner space. The flange comprising:

an inlet opening configured to insert and remove a boat configured to carry substrates in the inner space of the liner;

a gas inlet to provide a gas to the inner space. The assembly is constructed and arranged with a gas exhaust opening to remove gas from the inner space and a space between the liner and the low pressure tube.

A cooking heater (1) of the present invention includes a cooking heater body (2) which includes a heating chamber; a drawing body (3) which is configured to be allowed to be pulled out of the cooking heater body (2) and pushed into the cooking heater body (2); a rotating tray (22) which is arranged inside the drawing body (3) and which is configured to be allowed to be mounted to the drawing body and removed from the drawing body; a rotating tray drive motor (25) which is provided in the cooking heater body (2); and a rotation transmission mechanism (29) which, with the drawing body (3) being pushed into the cooking heater body (2), transmits rotational force from the rotating tray drive motor (25) to the rotating tray (22) and, with the drawing body (3) being pulled out of the cooking heater body (2), blocks the transmission of the rotational force to the rotating tray (22).

A sample encapsulation system (10) includes a fixture, a base (12), a chamber (14) having an inlet and a chamber housing (16). The housing (16) has inner (36) and outer (38) housings. The chamber (14) is fixedly mounted in the inner housing (36). The base, chamber (14) and housing (16) are affixed relative to one another and movable relative to the fixture. The system includes a cap (78) and a first ram (80) operably mounted to the cap (78) for engaging the chamber inlet. A second ram (24) is positioned in the chamber (14) opposite the inlet and moves toward and away from the first ram (80). The second ram (24) is driven by a cylinder. A heating assembly is positioned in the inner housing (36) and a cooling assembly which includes a cooling jacket (50) defined in part by the inner housing (36) and the outer housing (38) includes a manifold (60). The chamber (14), chamber housing (16) and base (12) are movable toward the cap (78) for engaging the first ram (80) with the chamber inlet during an encapsulation cycle and away from the cap (78), disengaging the first ram (80) from the chamber inlet following an encapsulation cycle. The cooling system includes a vacuum breaker (62) to self-drain following cooling.

An apparatus, a system and a method are disclosed. An exemplary method includes providing a wafer process chamber and a plurality of radiant heat elements under the wafer process chamber, receiving a wafer holder configured to be used in the wafer process chamber, and processing a wafer located on the wafer holder in the wafer process chamber. The wafer holder includes: a wafer contact portion including an upper surface and a lower surface, an exterior portion including an upper surface and a lower surface, and a tapered region formed in the wafer contact portion.

An infrared emitter is provided. The infrared emitter includes a substrate made of an electrically insulating material. The substrate includes a surface that contacts a printed conductor made of a resistor material that is electrically conducting and generates heat when current flows through it. The electrically insulating material includes an amorphous matrix component into which an additional component is embedded that absorbs in the spectral range of infrared radiation. At least a part of the surface is configured with a cover layer made of porous glass, whereby the printed conductor is embedded, at least in part, in the cover layer.

An anti-oxidation frying device includes a frying vessel having an electrically conductive body configured to heat cooking oil carried therein by a heating unit. A removable basket, also formed of electrically conductive material, is configured to be carried within the frying vessel to enable the cooking of food in the heated oil. A rectification circuit is coupled to the heating unit, the body of the frying vessel, and the basket. During operation the rectification circuit converts AC power from an external power source into a rippled, rectified AC current signal that is supplied to the heating unit, body of the frying vessel, and the basket, so as to create a reducing environment of available electrons for absorption by the cooking oil and food as it is prepared, thus extending the life of the cooking oil.

A high temperature furnace includes features that provide for multiple heating zones for heating a specimen extending at least partially through a heating chamber defined by the furnace. In one exemplary aspect, the furnace can include multiple heating elements extending at least partially through the heating chamber. Each heating element can be configured in a rod shape, which allows for multiple heating zone capability, better control over the temperature gradient, reduced current to achieve a desired temperature output, and a streamlined furnace shell.

A cooking appliance includes an upper housing having a first heating surface, a lower housing operatively connected to the upper housing, the lower housing having a second heating surface, and a splash guard having a plurality of peripheral sidewalls. The splash guard is nestable within the lower housing and extendable therefrom to a position wherein the splash guard substantially surrounds the second heating surface.

Disclosed is heat treatment equipment and process that facilitates heat treatment process by introducing focused high intensity infrared heating to components on a conveyorized system for maximizing the throughput of heat treated components.