A substrate in which a high-dielectric-constant gate insulator is formed on a silicon substrate with an interface layer film sandwiched in between is housed in a chamber. A mixed gas of ammonia and nitrogen gas is supplied to the chamber to form an ammonia atmosphere, and flash light is applied in the ammonia atmosphere from flash lamps to the surface of the substrate for an emission time of 0.2 milliseconds to one second. This allows the high-dielectric-constant gate insulator to be heated in the ammonia atmosphere and accelerates nitriding of the high-dielectric-constant gate insulator. Since the time for which flash light is applied is an extremely short time, nitrogen will not reach and nitride the interface layer film, which is formed as a base of the high-dielectric-constant gate insulator.

A substrate in which a high-dielectric-constant gate insulator is formed on a silicon substrate with an interface layer film sandwiched in between is housed in a chamber. A mixed gas of ammonia and nitrogen gas is supplied to the chamber to form an ammonia atmosphere, and flash light is applied in the ammonia atmosphere from flash lamps to the surface of the substrate for an emission time of 0.2 milliseconds to one second. This allows the high-dielectric-constant gate insulator to be heated in the ammonia atmosphere and accelerates nitriding of the high-dielectric-constant gate insulator. Since the time for which flash light is applied is an extremely short time, nitrogen will not reach and nitride the interface layer film, which is formed as a base of the high-dielectric-constant gate insulator.

A heating apparatus (10) for heating materials used in dental treatment is provided. The heating apparatus (10) comprises a heating compartment (33) with a heating element (35) for heating air inside the heating compartment (33), at least one socket for receiving and holding at least a part of the materials used in dental treatment inside the heating compartment (33), and an airflow generator (32, 34) for generating an airflow in the heating compartment (33).

A thermal processing system for performing thermal processing can include a workpiece support plate configured to support a workpiece and heat source(s) configured to heat the workpiece. The thermal processing system can include one or more domed window(s) disposed between the workpiece support plate and the one or more heat sources. The system includes a temperature measurement configured to generate data indicative of a temperature of the workpiece. The system includes a gas delivery system configured to flow a process gas over the workpiece.

A thermal processing system for performing thermal processing can include a workpiece support plate configured to support a workpiece and heat source(s) configured to heat the workpiece. The thermal processing system can include one or more domed window(s) disposed between the workpiece support plate and the one or more heat sources. The system includes a temperature measurement configured to generate data indicative of a temperature of the workpiece. The system includes a gas delivery system configured to flow a process gas over the workpiece.

The present description concerns a holder (60) for high-intensity lamps (24) comprising a first part (62) made of a first material, intended to support the high-intensity lamps and comprising a surface (70) intended to face the high-intensity lamps, a second part (64) made of a second material different from the first material, covering the first part and attached to the first part, and a sheet (90), made of a third material different from the first material, interposed between the first part and the second part and delimiting with the second part at least one cavity (72) intended to contain a coolant.

A hydrogen decrepitating furnace for shortening of feeding and discharging time capable of feeding and discharging materials easily comprises a main frame, a heating furnace, electric furnace stands and electric furnaces, wherein the heating furnace and a driving mechanism for driving the electric furnaces to rotate are arranged on the main frame, the heating furnace is provided with a feed and discharge port and a valve for opening or closing the feed and discharge port, a gas control device is connected to a side corresponding to the feed and discharge port of the heating furnace, the lifting mechanism is able to lift the heating furnace to allow materials to be easily discharged from the hydrogen decrepitation furnace, the electric furnaces are correspondingly arranged on the electric furnace stands, and moving mechanisms for driving the electric furnaces to be opened or closed are arranged on the two electric furnace stands.

A hydrogen decrepitating furnace for shortening of feeding and discharging time capable of feeding and discharging materials easily comprises a main frame, a heating furnace, electric furnace stands and electric furnaces, wherein the heating furnace and a driving mechanism for driving the electric furnaces to rotate are arranged on the main frame, the heating furnace is provided with a feed and discharge port and a valve for opening or closing the feed and discharge port, a gas control device is connected to a side corresponding to the feed and discharge port of the heating furnace, the lifting mechanism is able to lift the heating furnace to allow materials to be easily discharged from the hydrogen decrepitation furnace, the electric furnaces are correspondingly arranged on the electric furnace stands, and moving mechanisms for driving the electric furnaces to be opened or closed are arranged on the two electric furnace stands.

An indirectly heated electrical rotary kiln including a longitudinal inner shell for conveying process material therethrough, the inner shell being rotatable about its longitudinal axis. The rotary kiln further includes a stationary shroud arranged along the length and around the cross-sectional perimeter of the inner shell, thereby surrounding said inner shell, and a shroud module detachable from the remaining shroud, and formed as a longitudinal section and a cross-sectional perimeter segment of the shroud. The rotary kiln further includes an electrical heating element provided on the shroud module on an inside of the shroud, said heating element being configured to heat the inner shell, when in use. Methods for replacing a heating element of the rotary kiln are also disclosed.

An indirectly heated electrical rotary kiln including a longitudinal inner shell for conveying process material therethrough, the inner shell being rotatable about its longitudinal axis. The rotary kiln further includes a stationary shroud arranged along the length and around the cross-sectional perimeter of the inner shell, thereby surrounding said inner shell, and a shroud module detachable from the remaining shroud, and formed as a longitudinal section and a cross-sectional perimeter segment of the shroud. The rotary kiln further includes an electrical heating element provided on the shroud module on an inside of the shroud, said heating element being configured to heat the inner shell, when in use. Methods for replacing a heating element of the rotary kiln are also disclosed.