The timing for removing granular SiOx deposits on an inner wall of a lamp sleeve is easily obtained to prevent a decrease in production efficiency and suppress an increase in power consumption for heat treatment. A heat treatment apparatus includes a plurality of lamps that heats a semiconductor substrate, a lamp sleeve that reflects irradiation light of the plurality of lamps; a power supply that applies a lamp voltage to the plurality of lamps; a temperature detector that detects a temperature of the semiconductor substrate, a controller that controls the lamp voltage or lamp current applied to the plurality of lamps, and a warning unit that makes a warning on timing for cleaning the lamp sleeve through a display or a voice. The controller causes the warning unit to issue a warning when the lamp voltage or lamp current applied to the plurality of lamps exceeds a predetermined threshold.

A furnace has a melting chamber with a periphery defined by a surrounding wall structure. The furnace is provided with a purge system configured to direct inert gas to flow downward in the melting chamber in the configuration of a curtain that adjoins the wall structure and reaches only partially around the periphery of the melting chamber.

A method of removing a blockage in a solids injection lance under normal operating conditions of a direct smelting vessel is disclosed. The direct smelting vessel contains a bath of molten metal and slag and the solids injection lance extends into the direct smelting vessel and has an outlet end that is submerged in the molten slag. The solids injection lance further has a single inlet coupled to a section of supply line that conveys gas and solid feed material to the solids injection lance. The method comprises (a) advancing a blockage-removing tool through the supply line section and through the solids injection lance to an upstream side of the blockage, (b) operating the tool under elevated gas pressure conditions to remove the blockage such that solid feed material and gas are able to flow through the solids injection lance. The method further comprises (c) retracting the tool from the solids injection lance and the supply line section. Also disclosed is an apparatus for removing a blockage in a solids injection lance extending into a direct smelting vessel.

A furnace system includes a furnace and a preheater configured to preheat material before it enters the furnace. The system further includes a duct system including a mixing chamber disposed between the furnace and preheater. The duct system further includes an exhaust duct in fluid communication with an exhaust fluid outlet of the furnace and configured to vent fluid exhausted from the furnace. The exhaust duct is in fluid communication with the mixing chamber and configured to redirect a portion of the fluid exhausted from the furnace to the mixing chamber. The duct system further includes a preheater duct in fluid communication with the mixing chamber and a fluid inlet of the preheater and configured to direct fluid from the mixing chamber to the preheater. The system further includes a duct scraper configured for movement within the mixing chamber to move particulates from the mixing chamber into the exhaust duct.

A glass batch inlet and cleaning device includes an outer tubular housing including a side inlet and an inner tubular chopper slidable within the outer tubular housing. The device also includes a cover on the outer tubular housing and an actuator carried by the cover and coupled to the inner tubular chopper to move the chopper with respect to the outer tubular housing. The actuator may be carried by the cover on top of the outer tubular housing. A method of using the device is also disclosed.

Systems and methods for reducing contamination on reflective mirrors disposed on chamber walls in a millisecond anneal system are provided. In one example implementation, the reflective mirrors can be heated by one or more of (1) heating the fluid in the closed fluid system for regulating the temperature of the reflective mirrors; (2) electrical cartridge heater(s) or heater ribbon(s) attached to the reflective mirrors; and/or (3) use of lamp light inside the chamber.

Systems and methods for reducing contamination on reflective mirrors disposed on chamber walls in a millisecond anneal system are provided. In one example implementation, the reflective mirrors can be heated by one or more of (1) heating the fluid in the closed fluid system for regulating the temperature of the reflective mirrors; (2) electrical cartridge heater(s) or heater ribbon(s) attached to the reflective mirrors; and/or (3) use of lamp light inside the chamber.

A furnace has a melting chamber with a periphery defined by a surrounding wall structure. The furnace is provided with a purge system configured to direct inert gas to flow downward in the melting chamber in the configuration of a curtain that adjoins the wall structure and reaches only partially around the periphery of the melting chamber.

After molten metal has been poured from a ladle 6 into a converter, metal 6b adhering to the ladle 6 is dropped into the ladle 6 on-line, and molten metal is poured from an electric furnace into the ladle 6 into which the metal 6b has been dropped. As a result, the metal 6b is melted and is recovered as a material.

After molten metal has been poured from a ladle 6 into a converter, metal 6b adhering to the ladle 6 is dropped into the ladle 6 on-line, and molten metal is poured from an electric furnace into the ladle 6 into which the metal 6b has been dropped. As a result, the metal 6b is melted and is recovered as a material.